Lithographic apparatus and device manufacturing method
In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
1. A lithographic apparatus, comprising:
a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate, the projection system having an optical axis along which the patterned beam is focused;
a liquid supply system configured to fill a space between the projection system and the substrate with a liquid; and
a controller configured to move the substrate, the patterning device, or both the patterning device and substrate in a direction other than orthogonal to the optical axis during projection of the patterned beam, through the liquid, onto the target portion of the substrate.
2. The apparatus of claim 1 , wherein the patterned beam is focused at a plurality of positions relative to the substrate during projection of the patterned beam by action of the liquid.
3. The apparatus of claim 1 , wherein the controller is configured to move the substrate to achieve a tilt of up to 1 micrometer difference in vertical height between ends of the substrate.
4. A device manufacturing method, comprising:
providing a liquid to a space between a projection system of a lithographic apparatus and a substrate;
patterning a radiation beam with a patterning device;
projecting the patterned beam of radiation, using the projection system, through the liquid along an optical axis onto a target portion of the substrate; and
moving the substrate, the patterning device, or both the patterning device and substrate in a direction other than orthogonal to the optical axis during projecting of the patterned beam, through the liquid, onto the target portion of the substrate.
5. The method of claim 4 , wherein the patterned beam is focused at a plurality of positions relative to the substrate during projecting of the patterned beam by action of the liquid.
6. The method of claim 4 , comprising moving the substrate to achieve a tilt of up to about 1 micrometer difference in vertical height between ends of the substrate.
7. A lithographic apparatus, comprising:
a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate, the projection system having an optical axis along which the patterned beam is focused;
a liquid supply system configured to fill a space between the projection system and the substrate with a liquid; and
a controller configured to vibrate the substrate up and down in a direction substantially parallel to the optical axis at a frequency less than the laser frequency of the patterned beam throughout projection of the target portion through the liquid.
8. The apparatus of claim 7 , wherein controller is configured to vibrate the substrate by up to about 1 micrometer in the direction substantially parallel to the optical axis.
9. The apparatus of claim 7 , wherein the frequency is less than 4 kHz.
10. A device manufacturing method, comprising:
providing a liquid to a space between a projection system of a lithographic apparatus and a substrate;
projecting the patterned beam of radiation, using the projection system, through the liquid along an optical axis onto a target portion of the substrate; and
vibrating the substrate up and down in a direction substantially parallel to the optical axis at a frequency less than the laser frequency of the patterned beam throughout projecting of the target portion through the liquid.
11. The method of claim 10 , comprising vibrating the substrate by up to about 1 micrometer in the direction substantially parallel to the optical axis.
12. The method of claim 10 , wherein the frequency is less than 4 kHz.
13. The apparatus of claim 1 , wherein the controller is further configured to move the substrate, the patterning device, or both the patterning device and substrate in the direction other than orthogonal to the optical axis throughout the projection of the patterned beam, through the liquid, onto the target portion of the substrate.
14. The method of claim 4 , wherein the moving the substrate, the patterning device, or both the patterning device and substrate further comprises moving the substrate, the patterning device, or both the patterning device and substrate in the direction other than orthogonal to the optical axis throughout the projecting of the patterned beam, through the liquid, onto the target portion of the substrate.