IP Library Granted Patent US 8,715,773
Granted Patent B2
US 8,715,773 · App. 13/146,228 · Granted May 6, 2014

Method of making a filter

Inventor: Chun-ming Wu (Shenzhen, CN)
Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd.
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Quick Facts
Patent No.
US 8,715,773
App. No.
13/146,228
Granted
May 6, 2014
Kind
B2
Abstract

A method of making a filter adjusts the bottom heights of the color-resisting colors to make the top ends of the color-resisting blocks be in a same level by disposing the foundation layer between the transparent substrate and the light-shielding layer and disposing the groove in the foundation layer, so that ensuring that surfaces of the filter have a good evenness and the alignment of liquid crystals is normal for enhancing the displaying effect of the liquid crystal display. The present invention improves the bottom evenness of the through holes by disposing the foundation layer on the bottoms of the through holes, thereby eliminating the “ox horn-shaped segment difference” of the protruding edges of the color-resisting blocks formed later.

Claims (33)

1. A method of making a filter, characterized in that: the method including the following steps:

providing a transparent substrate;

calculating a thickness difference between different color-resisting blocks;

forming a patterned foundation layer and a patterned light-shielding layer on a surface of the transparent substrate, wherein the patterned light-shielding layer including a first through hole, a second through hole and a third through hole, the foundation layer under at least one of the first, second and third through holes having a groove, and the depth of the groove being determined by the thickness difference of the color-resisting blocks obtained by calculating;

forming a first color-resisting block on the position of the first through hole; and

orderly forming a second and third color-resisting blocks on the positions of the second and third through holes according to the previous step.

2. The method of making the filter as claimed in claim 1 , characterized in that: the step of forming the patterned foundation layer and the patterned light-shielding layer on the surface of the transparent substrate further includes:

forming a continuous foundation layer on the surface of the transparent substrate;

patterning the foundation layer to form at least one groove therein corresponding to the position of the through hole in the light-shielding layer according to the thickness difference of the color-resisting blocks obtained by calculating;

forming a continuous light-shielding layer on a surface of the foundation layer; and

patterning the light-shielding layer to form the first, second and third through holes.

3. The method of making the filter as claimed in claim 1 , characterized in that: the step of forming the patterned foundation layer and the patterned light-shielding layer on the surface of the transparent substrate further includes:

forming a continuous foundation layer on the surface of the transparent substrate;

forming a continuous light-shielding layer on a surface of the foundation layer;

patterning the light-shielding layer to form the first, second and third through holes; and

patterning the foundation layer to form at least one groove therein corresponding to the position of the through hole in the light-shielding layer according to the thickness difference of the color-resisting blocks obtained by calculating.

4. The method of making the filter as claimed in claim 1 , characterized in that: the first, second and third color-resisting blocks are orderly a red resister, a green resister and a blue resister.

5. The method of making the filter as claimed in claim 1 , characterized in that: the first, second and third color-resisting blocks are orderly formed by a pigment disperse method.

6. The method of making the filter as claimed in claim 1 , characterized in that: in the step of calculating the thickness difference between the different color-resisting blocks, the obtained thicknesses of the second and third color-resisting blocks by calculating are same and both less than that of the first color-resisting block; so in the step of forming the patterned foundation layer and the patterned light-shielding layer on the surface of the transparent substrate, the groove is formed on the foundation layer only under the first through hole, and the depth of the groove is equal to the thickness difference between the first and second color-resisting blocks.

7. The method of making the filter as claimed in claim 1 , characterized in that: in the step of calculating the thickness difference between the different color-resisting blocks, the obtained thickness of the third color-resisting block by calculating is less than that of the second color-resisting block, and the thickness of the second color-resisting block is less than that of the first color-resisting block; so in the step of forming the patterned foundation layer and the patterned light-shielding layer on the surface of the transparent substrate, the foundation layer forms a first groove and a second groove separately located under the first through hole and the second through hole, the depth of the first groove is equal to the thickness difference between the first and third color-resisting blocks, and the depth of the second groove is equal to the thickness difference between the second and third color-resisting blocks.

8. The method of making the filter as claimed in claim 1 , characterized in that:

the method further includes a step of forming ITO on the surfaces of the first, second and third color-resisting blocks.

9. A method of making a filter, characterized in that: the filter including a first, second and third color-resisting blocks, the thicknesses of the second and third color-resisting blocks being same and both less than that of the first color-resisting block, the method including the following steps:

providing a transparent substrate;

calculating a thickness difference between the second color-resisting block and the first color-resisting block;

forming a continuous foundation layer on a surface of the transparent substrate;

patterning the foundation layer, and according to the thickness difference of the color-resisting blocks obtained by calculating to form a groove on the foundation layer under the position of a first through hole, which will be formed soon, wherein the depth of the groove being equal to the thickness difference of the first and second color-resisting blocks;

forming a continuous light-shielding layer on a surface of the foundation layer;

patterning the light-shielding layer to form the first through hole, a second through hole and a third through hole;

forming the first color-resisting block on the position of the first through hole; and

orderly forming the second and third color-resisting blocks on the positions of the second and third through holes according to the previous step.

10. The method of making the filter as claimed in claim 9 , characterized in that: the first, second and third color-resisting blocks are orderly a red resister, a green resister and a blue resister.

11. The method of making the filter as claimed in claim 9 , characterized in that: the first, second and third color-resisting blocks are orderly formed by a pigment disperse method.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 28, 2021
From: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
To: CHANGSHA HKC OPTOELECTRONICS CO., LTD.
Reel/Frame 055058/0421 →
CHANGE OF NAME Recorded Nov 9, 2020
From: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
To: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
Reel/Frame 054359/0166 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 26, 2011
From: WU, CHUN-MING
To: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
Reel/Frame 026647/0187 →
Continuity (1)
Related Publication 20120288624A1 · Nov 15, 2012