Double patterning method for semiconductor devices

1. A method of forming a semiconductor device, comprising:

forming a device layer over a substrate and a sacrificial layer over the device layer;

patterning the sacrificial layer thereby defining a cut pattern, the cut pattern of the sacrificial layer having an initial width;

depositing a mask layer over the device layer and over the cut pattern of the sacrificial layer, the mask layer and the cut pattern of the sacrificial layer having at least a top surface in the same plane;

patterning the mask layer thereby defining a pattern including first and second portions interposed by the cut pattern of the sacrificial layer;

removing the cut pattern of the sacrificial layer thereby forming a gap that separates the first and second portions of the pattern of the mask layer; and

patterning the device layer using the first and second portions of the pattern of the mask layer.

2. The method of claim 1 further comprising:

after patterning the sacrificial layer and before depositing the mask layer, performing a critical dimension trim process thereby reducing the initial width of the cut pattern of the sacrificial layer to a final width.

3. The method of claim 2 wherein performing the critical dimension trim process includes a wet etching process.

4. The method of claim 3 wherein the final width is less than about 22 nm.

5. The method of claim 2 wherein the device layer is a gate stack layer.

6. The method of claim 5 wherein patterning the device layer includes forming a first gate stack feature and a second gate stack feature,

wherein the first and second gate stack features are separated by another gap having a dimension that is substantially the same as the final width of the cut pattern of the sacrificial layer.

7. The method of claim 1 wherein patterning the sacrificial layer includes:

depositing a photoresist layer over the sacrificial layer;

patterning the photoresist layer; and

using the patterned photoresist layer to pattern the sacrificial layer.

8. The method of claim 1 wherein patterning the mask layer includes:

depositing a photoresist layer over the mask layer;

patterning the photoresist layer; and

using the patterned photoresist layer to pattern the mask layer.

9. The method of claim 1 wherein the sacrificial layer includes a first type of dielectric material,

wherein the mask layer includes a second type of dielectric material, and

wherein the first and second type of dielectric materials are different.

10. A method of forming a semiconductor device, comprising:

forming a device layer over a substrate;

forming sacrificial layer over the device layer;

patterning the sacrificial layer thereby defining a cut pattern, the cut pattern of the sacrificial layer having an initial width defined from a first sidewall and an opposing second sidewall;

depositing a mask layer over the device layer and bounding the first and second sidewalls of the cut pattern of the sacrificial layer;

patterning the mask layer thereby defining a plurality of device patterns, wherein end portions of the plurality of device patterns of the mask layer are separated by the cut pattern of the sacrificial layer;

removing the cut pattern of the sacrificial layer thereby forming a separation between each of the plurality of device patterns of the mask layer; and

patterning the device layer using the plurality of device patterns of the mask layer thereby defining a plurality of device features.

11. The method of claim 10 further comprising:

after patterning the sacrificial layer and before depositing the mask layer, performing a critical dimension trim process thereby reducing the initial width of the cut pattern of the sacrificial layer to a final width.

12. The method of claim 10 further comprising:

after depositing the mask layer and before patterning the mask layer, performing a chemical mechanical polishing (CMP) process to remove excess material of the mask layer thereby uncovering a top surface of the cut pattern of the sacrificial layer.

13. The method of claim 10 wherein depositing the mask layer includes depositing the mask layer such that a top surface of the cut pattern of the sacrificial layer remains uncovered.

14. The method of claim 10 wherein the sacrificial layer includes a first type of dielectric material,

wherein the mask layer includes a second type of dielectric material, and

wherein the first and second type of dielectric materials are different.

15. A method of forming a semiconductor device, comprising:

providing a substrate;

forming a gate stack layer over the substrate;

forming a sacrificial layer over the gate stack layer;

forming a first patterned photoresist layer over the sacrificial layer;

patterning the sacrificial layer using the first patterned photoresist layer;

depositing a hard mask layer over the patterned sacrificial layer;

forming a second patterned photoresist layer over the hard mask layer and over the sacrificial layer;

patterning the hard mask layer using the second patterned photoresist layer thereby defining a plurality of gate stack patterns, wherein end portions of the plurality of gate stack patterns are separated by the patterned sacrificial layer;

selectively etching the patterned sacrificial layer thereby forming a gap that separates the end portions of the plurality of gate stack patterns; and

patterning the gate stack layer using the plurality of gate stack patterns thereby defining a plurality of gate stack features.

16. The method of claim 15 further comprising:

after patterning the sacrificial layer and before depositing the hard mask layer, performing a critical dimension trim process on the patterned sacrificial layer.

17. The method of claim 15 further comprising:

after depositing the hard mask layer and before forming a second patterned photoresist layer, performing a chemical mechanical polishing (CMP) process to remove excess material of the hard mask layer thereby uncovering a top surface of the patterned sacrificial layer.

18. The method of claim 15 wherein depositing the hard mask layer includes depositing the hard mask layer such that a top surface of the patterned sacrificial layer remains uncovered.

19. The method of claim 15 wherein the gap is less then about 22 nm wide.

20. The method of claim 15 wherein the sacrificial layer includes a first type of dielectric material,

wherein the hard mask layer includes a second type of dielectric material, and

wherein the first and second type of dielectric materials are different.