Method of manufacturing display apparatus
Provided is a method of manufacturing a display apparatus, including forming a drive circuit and a light-emitting portion on a substrate in which the forming the light-emitting portion includes forming a transparent anode electrode for applying a charge to an emission layer, forming a first coating layer and a second coating layer on the transparent anode electrode, removing the first coating layer by etching using the second coating layer as a mask, and forming a layer including the emission layer on a part of the transparent anode electrode from which the first coating layer is removed. A surface of the transparent anode electrode becomes as clean as a surface cleaned with ultraviolet irradiation.
1. A method of manufacturing a display apparatus comprising forming a drive circuit having a semiconductor layer and a light-emitting portion on a substrate, the method comprising the steps of:
forming an anode electrode of the light-emitting portion and a gate electrode of the drive circuit on a surface of the substrate;
forming a first insulating layer on the anode electrode and the gate electrode;
forming the semiconductor layer on the first insulating layer;
forming a source electrode and a drain electrode on the semiconductor layer;
forming a second insulating layer on the source and the drain electrodes;
removing at least a part of the first insulating layer so that an opening portion is formed on a part of the anode electrode; and
forming an emission layer on the part of the anode electrode and into the opening portion,
wherein the removing of at least a part of the first insulating layer is performed by using the second insulating layer as a mask.
2. The method of manufacturing a display apparatus according to claim 1 , wherein the first insulating layer is formed by sputtering.
3. The method of manufacturing a display apparatus according to claim 1 , wherein the removing the at least a part of the first insulating layer comprises one of wet etching and dry etching.
4. The method of manufacturing a display apparatus according to claim 3 , wherein an etching rate of the anode electrode with respect to an etchant for etching the first insulating layer is smaller than an etching rate of the first insulating layer.
5. The method of manufacturing a display apparatus according to claim 1 , wherein the first insulating layer is formed simultaneously with any one of the gate electrode, a gate insulating layer, the semiconductor layer, the source electrode, the drain electrode and a protective layer of a thin film transistor serving as the drive circuit.
6. The method of manufacturing a display apparatus according to claim 1 , wherein an etching rate of the second insulating layer with respect to an etchant for etching the first insulating layer is smaller than an etching rate of the first insulating layer.
7. The method of manufacturing a display apparatus according to claim 1 , wherein the light-emitting portion is arranged on the substrate together with the drive circuit.
8. The method of manufacturing a display apparatus according to claim 1 , wherein the light-emitting portion comprises an organic electroluminescence device.