IP Library › Granted Patent US 8,735,849
Granted Patent B2
US 8,735,849 · App. 13/396,171 · Granted May 27, 2014

Detector for use in charged-particle microscopy

Inventors: Petr Hlavenka (Brno, CZ); Marek Uncovsky (Brno, CZ)
Assignee: FEI Company
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Quick Facts
Patent No.
US 8,735,849
App. No.
13/396,171
Granted
May 27, 2014
Kind
B2
Abstract

A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.

Claims (52)

1. A method of investigating a sample using a charged-particle microscope, comprising the steps of:

providing a charged-particle microscope having a particle-optical column;

using the particle-optical column to direct an imaging beam of charged particles at the sample;

irradiating the sample with the imaging beam causing a flux of output radiation to emanate from the sample;

examining at least a portion of the output radiation using a detector; wherein

the detector comprises a Solid State Photo-Multiplier that is connected to a power supply providing an adjustable electrical bias, the bias being altered to adjust a gain value of the Solid State Photo-Multiplier that matches the magnitude of the flux causing the Solid State Photo-Multiplier to operate below its saturation threshold to measure the flux without being impeded by saturation effects.

2. A method according to claim 1 , wherein:

the portion of the output radiation comprises particulate radiation; the method further comprising the step of:

providing a scintillator to convert at least some of the particulate radiation into photonic radiation and to direct the photonic radiation to the Solid State Photo-Multiplier.

3. A method according to claim 2 , wherein:

the scintillator and Solid State Photo-Multiplier are sandwiched in a stacked structure with an interposed optically transparent separator layer;

the stacked structure being partially encapsulated in a jacket of electrically insulating material leaving at least a portion of the scintillator exposed.

4. A method according to claim 1 , wherein the detector is a spatially distributed structure comprising a plurality of Solid State Photo-Multipliers disposed about a point of intersection of the imaging beam and the sample.

5. A method according to claim 1 , wherein the detector is located within the particle-optical column.

6. A method according to claim 5 , wherein the sample holder is embodied so as to position the sample within an electromagnetic field of the particle-optical column.

7. A method according to claim 1 , wherein the charged-particle microscope is selected from the group comprising a scanning electron microscope, a transmission electron microscope, a scanning transmission electron microscope, a focused ion beam tool, an electron-beam-induced deposition tool, an ion-beam-induced deposition tool, a dual-beam charged-particle microscope, a critical dimension microscope, a lithography tool, and hybrids hereof.

8. A method according to claim 1 , wherein the detector is selected from the group comprising:

a Solid-State Photo-Multiplier;

an on-chip pixelated array of avalanche photodiodes with shared detection circuitry;

a Multi-Pixel Photon Counter, and combinations hereof.

9. A charged-particle microscope constructed and arranged to perform a method as claimed in claim 1 .

10. A method of investigating a sample using a charged-particle microscope, comprising the steps of:

irradiating the sample with a charged particle imaging beam causing a flux of output radiation to emanate from the sample;

examining at least a portion of said output radiation using a detector, said detector comprising a Solid State Photo-Multiplier that is connected to a power supply providing an adjustable electrical bias;

adjusting said bias so as to adjust a gain value of the Solid State Photo-Multiplier; and

matching said gain value to the magnitude of said flux, so as to cause the Solid State Photo-Multiplier to operate below its saturation threshold to measure said flux without being impeded by saturation effects.

11. The method according to claim 10 , wherein:

said portion of the output radiation comprises particulate radiation;

a scintillator is employed to convert at least some of said particulate radiation into photonic radiation; and

said photonic radiation is directed to said Solid State Photo-Multiplier.

12. The method according to claim 11 , wherein:

the scintillator and Solid State Photo-Multiplier are sandwiched in a stacked structure, with an interposed optically transparent separator layer; and

the stacked structure is partially encapsulated in a jacket of electrically insulating material, leaving at least a portion of the scintillator exposed.

13. The method according to claim 10 , wherein the detector comprises a spatially distributed structure comprising a plurality of Solid State Photo-Multipliers disposed about a point of intersection of the imaging beam and the sample.

14. The method according to claim 10 , wherein the detector is located within the particle-optical column.

15. The method according to claim 10 , wherein said charged-particle microscope is selected from the group comprising a scanning electron microscope, a transmission electron microscope, a scanning transmission electron microscope, a focused ion beam tool, an electron-beam-induced deposition tool, an ion-beam-induced deposition tool, a dual-beam charged-particle microscope, a critical dimension microscope, a lithography tool, and hybrids hereof.

16. The method according to claim 10 , wherein said detector is selected from the group comprising:

a Solid-State Photo-Multiplier;

an on-chip pixelated array of avalanche photodiodes with shared detection circuitry;

a Multi-Pixel Photon Counter, and combinations hereof.

17. A charged particle microscope, comprising:

a source of charged particles;

a charged particle lens for focusing the charged particles;

a detector for detecting emissions from a sample in response to the impact of the charged particles, the detector comprising:

a solid state multi-pixel photon counter;

an adjustable power supply to provide an adjustable electrical bias to adjust the gain of the multi-pixel photon counter, the gain being adjusted to operate the multi-pixel photon counter below a saturation threshold for the multi pixel photon counter to measure the emissions.

18. The charged particle microscope of claim 17 in which the multi-pixel photon counter comprises an array of Geiger mode avalanche photodiodes.

19. The charged particle microscope of claim 17 further comprising:

a scintillator that emits light when impacted by a particle; and

an transparent electrically insulating material positioned between the scintillator and the multi-pixel photon counter.

20. The method of claim 1 in which the detector comprises a solid state multi-pixel photon counter.

21. The method of claim 19 in which the solid state multi-pixel photon counter comprises an array of Geiger mode avalanche photodiodes.

Priority Claims (1)
EP 11154322 · Feb 14, 2011 · regional
Continuity (2)
Provisional Application 61442546 · Feb 14, 2011
Related Publication 20120205539A1 · Aug 16, 2012