Apparatus and methods for deposition reactors

1. An apparatus comprising:

a deposition reactor comprising a vacuum chamber enclosing a sealable reaction chamber; a reaction chamber heater placed in the vacuum chamber;

a precursor source configured for depositing material on a heated substrate in the deposition reactor by sequential self-saturating surface reactions;

an in-feed line for feeding precursor vapor from the precursor source through the vacuum chamber to the sealable reaction chamber, the in-feed line going through a vacuum chamber wall of the reactor; and

a structure configured to utilize heat from the reaction chamber heater for preventing condensation of precursor vapor into liquid or solid phase between the precursor source and the sealable reaction chamber, said structure comprising:

a protruding internal neck arranged around said in-feed line, and said protruding internal neck protruding through said vacuum chamber wall; and

an outer neck around the protrusion, the internal neck and the outer neck forming a gap there between.

2. The apparatus of claim 1 , wherein the precursor source comprises: a protrusion configured for receiving heat from the reactor.

3. The apparatus of claim 2 , comprising: a heat conductor tube around the in-feed line.

4. The apparatus of claim 1 , comprising: a source framework configured for receiving a detachably attachable source cartridge.

5. The apparatus of claim 4 , comprising: a heater for heating the source cartridge.

6. An apparatus comprising:

a deposition reactor comprising a vacuum chamber enclosing a sealable reaction chamber;

a precursor source configured to deposit material on a heated substrate in the deposition reactor by sequential self-saturating surface reactions;

two pulsing valves embedded into the precursor source and configured to control feeding of precursor vapor through an in-feed line from the precursor source through the vacuum chamber to the sealable reaction chamber; and

a bypass line between the pulsing valves for feeding inactive gas from a pulsing valve to another pulsing valve, wherein the pulsing valves are further configured to control feeding of the inactive gas from a pulsing valve to another pulsing valve.

7. The apparatus of claim 6 , comprising a flow restrictor in the bypass line.

8. An apparatus comprising:

a deposition reactor comprising a vacuum chamber enclosing a sealable reaction chamber;

a precursor source configured to deposit material on a heated substrate in the deposition reactor by sequential self-saturating surface reactions;

a pulsing valve embedded into the precursor source configured to control feeding of precursor vapor through an in-feed line from the precursor source through the vacuum chamber to the sealable reaction chamber, the apparatus being configured to:

convey inactive gas via the pulsing valve to the precursor source cartridge to raise the pressure inside the precursor source cartridge and to ease subsequent flow of a mixture of precursor vapor and inactive gas towards the reaction chamber.

9. The apparatus of claim 8 , wherein the apparatus is configured to: close the precursor cartridge after the pressure raise until the commencement of a next precursor pulse period, and further configured to: open a route towards the reaction chamber via the pulsing valve upon commencement of the next precursor pulse period.

10. The apparatus of claim 3 , comprising: an air gap around the heat conductor tube configured for decreasing thermal energy loss.

11. An apparatus comprising:

a deposition reactor comprising a vacuum chamber enclosing a sealable reaction chamber;

a reaction chamber heater placed in the vacuum chamber;

a precursor source configured for depositing material on a heated substrate in the deposition reactor by sequential self-saturating surface reactions;

an in-feed line for feeding precursor vapor from the precursor source through the vacuum chamber to the sealable reaction chamber;

a protrusion attached to a wall of the vacuum chamber and coupled to the precursor source, through which the in-feed line passes and extends through the vacuum chamber wall into the reactor, the protrusion comprises an internal neck configured to utilize heat from the reaction chamber heater for preventing condensation of precursor vapor into liquid or solid phase between the precursor source and the sealable reaction chamber, the internal neck is arranged around the in-feed line substantially extending from the precursor source and protruding through the vacuum chamber wall; and

an outer neck arranged around the protrusion, wherein the internal neck and outer neck form a gap there between.

12. The apparatus of claim 11 , further comprising an outer neck arranged around the protrusion.

13. The apparatus of claim 12 , wherein the internal neck and outer neck form a gap there between.

14. The apparatus of claim 13 , wherein the protrusion further comprises a neck connector.

15. The apparatus of claim 14 , wherein the neck connector comprises a pair of flanges with at least one seal.

16. The apparatus of claim 11 , wherein the internal neck contacts the in-feed line on the reaction chamber side of the vacuum wall.

17. The apparatus of claim 11 , further comprising a coaxial heat conductor tube that is positioned within the internal neck and arranged around the in-feed line extending substantially from the precursor source and protruding through the vacuum chamber wall.

18. The apparatus of claim 11 , further comprising two pulsing valves embedded into the precursor source and configured to control feeding of precursor vapor from the precursor source to a reaction chamber comprised by the reactor containing the substrate; and a bypass line between the pulsing valves for feeding inactive gas from a pulsing valve to another pulsing valve, wherein the pulsing valves are further configured to control feeding of the inactive gas from a pulsing valve to another pulsing valve.

19. The apparatus of claim 11 , further comprising a pulsing valve embedded into the precursor source configured to control feeding of precursor vapor from the precursor source to a reaction chamber comprised by the reactor containing the substrate, the apparatus being configured to: convey inactive gas via the pulsing valve to the precursor source cartridge to raise the pressure inside the precursor source cartridge and to ease subsequent flow of a mixture of precursor vapor and inactive gas towards the reaction chamber.