Apparatus and method for multiple symmetrical divisional gas distribution

1. A system for distributing materials in a semiconductor processing chamber, said system comprising:

a mounting plate comprising a plurality of threaded mounting plate outer holes and a plurality of mounting plate inner holes;

a plurality of manifolds coupled to said mounting plate;

a center purge block coupled to said mounting plate and said plurality of manifolds;

a plurality of reactant distribution blocks, wherein the plurality of reactant distribution blocks are stacked to form a reactant distribution block stack, wherein said reactant distribution block stack sits atop said center purge block;

a coupling mechanism to secure said plurality of reactant distribution blocks of said reactant distribution block stack together; and

a top cap coupled to said reactant distribution block stack and said coupling mechanism.

2. The system of claim 1 , wherein each reactant distribution block comprises a plurality of valves.

3. The system of claim 2 , wherein each reactant distribution block comprises a plurality of heater blocks.

4. The system of claim 3 , wherein each reactant distribution block is coupled to a common gas delivery line.

5. The system of claim 4 , wherein said plurality of valves for each reactant distribution block comprises at least four valves;

wherein said plurality of heater blocks for each reactant distribution block comprises at least four heater blocks; and

wherein a total number of said valves is equal to a total number of said heater blocks.

6. The system of claim 5 , further comprising an insulation jacket, wherein said insulation jacket wraps around said reactant distribution block stack and said top cap.

7. The system of claim 1 ,

wherein said reactant distribution block stack further comprises at least four manifold notches configured into separate sides of said reactant distribution block stack; and

wherein said plurality of manifolds comprises at least four manifolds and each manifold is coupled to a manifold notch.

8. The system of claim 1 , wherein said coupling mechanism comprises at least four securing rods and each securing rod is coupled along a longitudinal axis of said reactant distribution block stack.

9. The system of claim 1 , further comprising a backing plate coupled to said mounting plate, said backing plate comprising a plurality of mounting bolts, and each mounting bolt is securely coupled to a single mounting plate inner hole.

10. The system of claim 9 , further comprising:

a lid coupled to said mounting plate; and

a showerhead coupled to said backing plate.

11. The system of claim 10 , wherein said lid further comprises:

a first insulator ring;

a second insulator ring coupled to said first insulator ring; and

an outer ring coupled to said first insulator ring, said second insulator ring, and said lid.

12. The system of claim 11 , further comprising an insulator/mounting plate sub-assembly comprising:

said mounting plate; and

an insulator plate comprising a plurality of threaded insulator plate outer holes and a plurality of insulator plate inner holes,

wherein said mounting plate is securely coupled to said insulator plate through a plurality of outer mounting screws mating with said plurality of threaded mounting plate outer holes and said insulator plate outer holes.

13. The system of claim 1 , wherein said reactant distribution block stack comprises a first sub-stack and a second sub-stack, wherein said first sub-stack comprises at least one of a first sub-stack single port reactant distribution block and a first sub-stack dual port reactant distribution block, and wherein said second sub-stack comprises at least one of a second sub-stack single port reactant distribution block and a second sub-stack dual port reactant distribution block.