IP Library › Granted Patent US 8,756,775
Granted Patent B2
US 8,756,775 · App. 12/547,616 · Granted Jun 24, 2014

Method for smoothing a surface of an electrode

Inventors: Akiyoshi Kawamura (Nagaokakyo, JP); Takako Sato (Moriyama, JP); Osamu Chikagawa (Yasu, JP)
Assignee: Murata Manufacturing Co., Ltd.
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Quick Facts
Patent No.
US 8,756,775
App. No.
12/547,616
Granted
Jun 24, 2014
Kind
B2
Abstract

A method is provided for efficiently and securely smoothing a surface of an electrode disposed on a base, such as a ceramic substrate, without damaging the electrode or the base. The electrode is fired by a non-shrinkage process using a constraining layer and is separated from the constraining layer. The base including the electrode disposed thereon is prepared and a surface of the electrode is smoothed by vibrating media such that the media are arranged to be in contact with the electrode.

Claims (15)

1. A method for smoothing a surface of an electrode, comprising:

preparing a base having the electrode disposed thereon; and

smoothing a surface of the electrode by vibrating media such that the media are arranged to be in contact with the surface of the electrode.

2. The electrode-smoothing method according to claim 1 , wherein during the step of smoothing, the base is immersed in a treatment liquid and an ultrasonic wave is applied to the treatment liquid.

3. The electrode-smoothing method according to claim 2 , wherein the ultrasonic wave is applied to the treatment liquid while the base is disposed above a tray on which the media is disposed, such that the electrode is in contact with the media.

4. The electrode-smoothing method according to claim 2 , wherein the ultrasonic wave is applied to the treatment liquid while the base is disposed on or above a tray such that a surface of the base on which the electrode is disposed faces upward and such that the media are arranged above the base such that the electrode is in contact with the media.

5. The electrode-smoothing method according to claim 2 , wherein the treatment liquid is deaerated water.

6. The electrode-smoothing method according to claim 2 , wherein the media have a density greater than that of the treatment liquid.

7. The electrode-smoothing method according to claim 1 , wherein the media have a hardness greater than that of the electrode.

8. The electrode-smoothing method according to claim 1 , wherein the media have a spherical shape.

9. The electrode-smoothing method according to claim 1 , wherein the media are made of zirconia.

10. The electrode-smoothing method according to claim 1 , wherein the electrode has an end portion and a central portion having a surface roughness different from that of the end portion.

11. A method for manufacturing a ceramic substrate, comprising a step of smoothing a surface of an electrode by the method according to claim 1 , wherein the base is the ceramic substrate and the electrode is made of a sintered metal.

12. The ceramic substrate-manufacturing method according to claim 11 , further comprising a step of forming at least one plating layer on the smoothed electrode.

13. A ceramic substrate manufactured by the ceramic substrate-manufacturing method according to claim 11 , comprising an electrode with a smoothed surface.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 26, 2009
From: KAWAMURA, AKIYOSHI; SATO, TAKAKO; CHIKAGAWA, OSAMU
To: MURATA MANUFACTURING CO., LTD.
Reel/Frame 023146/0598 →
Priority Claims (1)
JP 2008-065343 · Mar 14, 2008 · national
Continuity (2)
Continuation PCTJP2009053161 · Feb 23, 2009
Related Publication 20090301764A1 · Dec 10, 2009