IP Library Granted Patent US 8,759,971
Granted Patent B2
US 8,759,971 · App. 13/219,158 · Granted Jun 24, 2014

Semiconductor apparatus

Inventors: Ryuji Hosokawa (Kanagawa, JP); Tsutomu Kojima (Oita, JP); Tatsuo Shiotsuki (Oita, JP)
Assignee: Kabushiki Kaisha Toshiba
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,759,971
App. No.
13/219,158
Granted
Jun 24, 2014
Kind
B2
Abstract

A semiconductor apparatus in a preferred embodiment includes: a substrate; a first chip provided on the substrate; a solder bump formed on the first chip; a solder dam arranged in substantially a rectangular and annular manner outside around the solder bump on the first chip by alternately connecting four sides and four quarter or less arcs; an electrode pad placed outside of the solder dam in the first chip; a second chip provided on the first chip in electric connection to the first chip via the solder bump; and an under-fill material filling a clearance between the first chip and the second chip inside of the solder dam. Here, a difference between an inner diameter and an outer diameter of the arc is 60 μm or more whereas the center radius of the arc is greater than 207.5 μm.

Claims (52)

1. A semiconductor apparatus comprising:

a semiconductor substrate;

a first semiconductor chip provided on the semiconductor substrate;

a solder bump formed on the first semiconductor chip;

a solder dam arranged in substantially a rectangular and annular manner outside around the solder bump on the first semiconductor chip by alternately connecting four sides and four quarter or less arcs;

an electrode pad placed outside of the solder dam in the first semiconductor chip;

a second semiconductor chip provided on the first semiconductor chip in electric connection to the first semiconductor chip via the solder bump; and

an under-fill material filling a clearance between the first semiconductor chip and the second semiconductor chip inside of the solder dam,

wherein:

a difference between an inner diameter and an outer diameter of each the arcs is 60 μm, and a center radius of each the arcs is 307.5 μm; and

the solder bump and the solder dam are made of SnCu or SnAg.

2. The semiconductor apparatus according to claim 1 , wherein a height from bottom to top of the solder dam is 20±3 μm.

3. The semiconductor apparatus according to claim 1 , further comprising:

a second solder dam arranged in substantially a rectangular and annular manner outside around the solder dam on the first semiconductor chip by alternately connecting four sides and four quarter or less arcs, wherein:

a difference between an inner diameter and an outer diameter of each of the arcs of the second solder dam is 60 μm or more, and

a center radius of each of the arcs of the second solder dam is greater than 207.5 μm.

4. The semiconductor apparatus according to claim 1 , wherein

one of the first semiconductor chip and the second semiconductor chip is a memory chip whereas the other of the first semiconductor chip and the second semiconductor chip is a logic chip.

5. The semiconductor apparatus according to claim 1 , wherein

the solder dam is formed on an under barrier metal formed on the first semiconductor chip.

6. The semiconductor apparatus according to claim 5 , wherein

the solder bump is formed on the under barrier metal.

7. The semiconductor apparatus according to claim 5 , wherein

the under barrier metal includes Ti and Cu.

8. The semiconductor apparatus according to claim 5 , wherein

the solder dam is formed on Ni plated on the under barrier metal.

9. A semiconductor apparatus comprising:

a semiconductor substrate;

a first semiconductor chip provided on the semiconductor substrate;

a solder bump formed on the first semiconductor chip;

a solder dam arranged in substantially a rectangular and annular manner outside around the solder bump on the first semiconductor chip by alternately connecting four sides and four quarter or less arcs;

an electrode pad placed outside of the solder dam in the first semiconductor chip;

a second semiconductor chip provided on the first semiconductor chip in electric connection to the first semiconductor chip via the solder bump; and

an under-fill material filling a clearance between the first semiconductor chip and the second semiconductor chip inside of the solder dam,

wherein:

a difference between an inner diameter and an outer diameter of each the arcs is 75 μm, and a center radius of each the arcs is 300 μm; and

the solder bump and the solder dam are made of SnCu or SnAq.

10. The semiconductor apparatus according to claim 9 , wherein a height from bottom to top of the solder dam is 20±3 μm.

11. The semiconductor apparatus according to claim 9 , further comprising

a second solder dam arranged in substantially a rectangular and annular manner outside around the solder dam on the first semiconductor chip by alternately connecting four sides and four quarter or less arcs, wherein

a difference between an inner diameter and an outer diameter of each of the arcs of the second solder dam is 60 μm or more, and

a center radius of each of the arcs of the second solder dam is greater than 207.5 μm.

12. The semiconductor apparatus according to claim 9 , wherein

one of the first semiconductor chip and the second semiconductor chip is a memory chip whereas the other of the first semiconductor chip and the second semiconductor chip is a logic chip.

13. The semiconductor apparatus according to claim 9 , wherein

the solder dam is formed on an under barrier metal formed on the first semiconductor chip.

14. The semiconductor apparatus according to claim 13 , wherein

the solder bump is formed on the under barrier metal.

15. The semiconductor apparatus according to claim 13 , wherein

the under barrier metal includes Ti and Cu.

16. The semiconductor apparatus according to claim 13 , wherein

the solder dam is formed on Ni plated on the under barrier metal.

Assignments (5)
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 24, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043709/0035 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 31, 2011
From: HOSOKAWA, RYUJI; KOJIMA, TSUTOMU; SHIOTSUKI, TATSUO
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 026839/0854 →
Priority Claims (1)
JP 2010-194849 · Aug 31, 2010 · national
Continuity (1)
Related Publication 20120049355A1 · Mar 1, 2012