Low-permittivity resin composition
The present invention relates to a low-dielectric resin composition having sufficiently low dielectric constant and dissipation factor, a low-dielectric film formed of the low-dielectric resin composition, processes for producing the low-dielectric resin composition and the low-dielectric film, and a coating agent for low-dielectric films. According to the present invention, there are provided (1) a low-dielectric resin composition including hollow silica particles having an average particle size of from 0.05 to 3 μm and a BET specific surface area of less than 30 m 2 /g, and a matrix resin in which the hollow silica particles are dispersed; (2) a low-dielectric film including the low-dielectric resin composition; (3) a process for producing the low-dielectric resin composition which includes the steps of preparing hollow silica particles (A) containing air inside thereof or core/shell type silica particles (B) in which a material capable of being dissipated by calcination to form hollow portions therein is encapsulated; calcination the hollow silica particles (A) or the core/shell type silica particles (B) at a temperature higher than 950° C. to prepare hollow silica particles (C); and dispersing the hollow silica particles (C) in a matrix resin-forming material to prepare a dispersion of the particles; and (4) a coating agent for low-dielectric films including the hollow silica particles, and a matrix resin-forming material in which the hollow silica particles are dispersed.
1. A low-dielectric resin composition, comprising hollow silica particles having an average particle size of from 0.05 to 2.2 μm and a BET specific surface area of less than 30 m 2 /g, and a matrix resin in which the hollow silica particles are dispersed.
2. A low-dielectric resin composition comprising hollow silica particles having an average particle size of from 0.05 to 1 μm with the proviso that 80% by mass or more of the whole particles have a particle size falling within the range of the average particle size ±30%, and a BET specific surface area of less than 30 m 2 /g, and a matrix resin in which the hollow silica particles are dispersed.
3. A low-dielectric resin composition, comprising hollow silica particles having an average particle size of from 0.05 to 2.2 μm, a porosity of from 30 to 90% and a BET specific surface area of less than 30 m 2 /g, and a matrix resin in which the hollow silica particles are dispersed.
4. The low-dielectric resin composition according to claim 1 , wherein when subjected to powder X-ray diffraction measurement, the hollow silica particles exhibit a diffraction pattern in which no peaks are observed at a diffraction angle (2θ) corresponding to a crystal lattice spacing (d) of less than 1 nm.
5. The low-dielectric resin composition according to 1 , wherein a content of the hollow silica particles in the composition is from 10 to 60% by mass.
6. The low-dielectric resin composition according to claim 3 , wherein a volume ratio of air in the resin composition is from 3 to 60%.
7. A low-dielectric film comprising a low-dielectric resin composition as defined in claim 1 .
8. A process for producing a low-dielectric resin composition as defined in claim 1 , comprising:
preparing hollow silica particles (A) comprising air inside thereof or core/shell silica particles (B) in which a material capable of being dissipated by calcination to form hollow portions therein is encapsulated;
calcining the hollow silica particles (A) or the core/shell type silica particles (B) obtained in said preparing at a temperature higher than 950° C. to prepare hollow silica particles (C); and
dispersing the hollow silica particles (C) obtained in said calcining in a matrix resin-forming material to prepare a dispersion of the particles.
9. The process for producing a low-dielectric film according to claim 8 , further comprising
applying the dispersion obtained in said dispersing onto a substrate and then solidifying the applied dispersion.
10. The process for producing a low-dielectric film according to claim 8 , wherein the matrix resin-forming material has a viscosity of from 0.1 to 20 Pa's.
11. A coating agent for low-dielectric films, comprising hollow silica particles having an average particle size of from 0.05 to 2.2 μm and a BET specific surface area of less than 30 m 2 /g, and a matrix resin-forming material in which the hollow silica particles are dispersed.
12. A coating agent for low-dielectric films comprising hollow silica particles having an average particle size of from 0.05 to 1 μm with the proviso that 80% by mass or more of the whole particles have a particle size falling within the range of the average particle size ±30%, and a BET specific surface area of less than 30 m 2 /g, and a matrix resin-forming material in which the hollow silica particles are dispersed.
13. A coating agent for low-dielectric films, comprising hollow silica particles having an average particle size of from 0.05 to 2.2 μm, a porosity of from 30 to 90% and a BET specific surface area of less than 30 m 2 /g, and a matrix resin-forming material in which the hollow silica particles are dispersed.
14. The low-dielectric resin composition according to claim 2 , wherein when subjected to powder X-ray diffraction measurement, the hollow silica particles exhibit a diffraction pattern in which no peaks are observed at a diffraction angle (2θ) corresponding to a crystal lattice spacing (d) of less than 1 nm.
15. The low-dielectric resin composition according to claim 3 , wherein when subjected to powder X-ray diffraction measurement, the hollow silica particles exhibit a diffraction pattern in which no peaks are observed at a diffraction angle (2θ) corresponding to a crystal lattice spacing (d) of less than 1 nm.
16. The low-dielectric resin composition according to claim 2 , wherein a content of the hollow silica particles in the composition is from 10 to 60% by mass.
17. The low-dielectric resin composition according to claim 3 , wherein a content of the hollow silica particles in the composition is from 10 to 60% by mass.
18. A process for producing the low-dielectric resin composition as defined in claim 2 , comprising:
preparing hollow silica particles (A) comprising air inside thereof or core/shell silica particles (B) in which a material capable of being dissipated by calcination to form hollow portions therein is encapsulated;
calcining the hollow silica particles (A) or the core/shell type silica particles (B) obtained in said preparing at a temperature higher than 950° C. to prepare hollow silica particles (C); and
dispersing the hollow silica particles (C) obtained in said calcining in a matrix resin-forming material to prepare a dispersion of the particles.
19. The process for producing a low-dielectric film according to claim 18 , further comprising:
applying the dispersion obtained in said dispersing onto a substrate and then solidifying the applied dispersion.
20. A process for producing the low-dielectric resin composition as defined in claim 3 , comprising:
preparing hollow silica particles (A) comprising air inside thereof or core/shell silica particles (B) in which a material capable of being dissipated by calcination to form hollow portions therein is encapsulated;
calcining the hollow silica particles (A) or the core/shell type silica particles (B) obtained in said preparing at a temperature higher than 950° C. to prepare hollow silica particles (C); and
dispersing the hollow silica particles (C) obtained in said calcining in a matrix resin-forming material to prepare a dispersion of the particles.
21. The process for producing a low-dielectric film according to claim 20 , further comprising:
applying the dispersion obtained in said dispersing onto a substrate and then solidifying the applied dispersion.
22. The low-dielectric resin composition according to claim 1 , wherein 80% by mass or more of all of said particles have a particle size falling within the range of the average particle size ±30%.