Method for forming resistive switching memory elements with improved switching behavior
Methods for producing RRAM resistive switching elements having optimal switching behavior include crystalline phase structural changes. Structural changes indicative of optimal switching behavior include hafnium oxide phases in an interfacial region between a resistive switching layer and an electrode.
1. A method of operating a resistive-switching memory cell, the method comprising:
providing the resistive-switching memory cell, wherein the cell comprises a first metal oxide layer between a first electrode and a second electrode;
applying an electrical field to the first metal oxide layer by applying a switching voltage between the first electrode and the second electrode;
wherein the electrical field changes a resistance state of the resistive-switching memory cell by changing at least one structural property of a region of the first metal oxide layer; and
wherein the at least one structural property comprises at least one of crystallinity, crystal phase, silicide content, or molecular structure.
2. The method of claim 1 , wherein the changing of the at least one structural property comprises transitioning a portion of the metal oxide in the region from crystalline to amorphous or from amorphous to crystalline.
3. The method of claim 1 , wherein the region is near the first electrode, and wherein the metal oxide in the region is amorphous when the resistive-switching memory cell is in a low resistance state.
4. The method of claim 1 , wherein the changing of the at least one structural property comprises transitioning a portion of the metal oxide in the region from a crystal phase having a first bandgap to a crystal phase having a second bandgap; wherein the first bandgap differs from the second bandgap.
5. The method of claim 1 , wherein the changing of the at least one structural property comprises transitioning a portion of the metal oxide in the region from one of a tetragonal, orthorhombic, monoclinic, cotunnite, or cubic crystal phase to a different one of the tetragonal, orthorhombic, monoclinic, cotunnite, or cubic crystal phase.
6. The method of claim 1 , wherein the changing of the at least one structural property comprises formation or dissociation of a silicide mass.
7. The method of claim 1 , wherein the changing of the at least one structural property comprises an increase or decrease of hafnium silicide content.
8. The method of claim 1 , wherein the changing of the at least one structural property comprises changing a portion of the metal oxide in the region to a differently structured oxide of a same metal.
9. The method of claim 1 , wherein the changing of the at least one structural property comprises converting Hf 4 O 8 to Hf 4 O 7 or Hf 4 O 7 to Hf 4 O 8 .
10. The method of claim 1 , wherein the switching voltage is less than or equal to 7V.
11. The method of claim 1 , wherein the region comprises the entirety of the first metal oxide layer, and wherein the changing of the at least one structural property is substantially homogeneous.
12. The method of claim 1 , wherein the changing of the at least one structural property occurs in a first region of the first metal oxide layer but not in a second region of the first metal oxide layer;
wherein the first region comprises a top or bottom interface between the first metal oxide layer and a neighboring layer; and
wherein the second region comprises a center plane of the first metal oxide layer parallel to, but not coincident with, the top or bottom interface of the first metal oxide layer.
13. The method of claim 12 , wherein the neighboring layer is one of the first electrode or the second electrode.
14. The method of claim 12 , wherein the neighboring layer is a second metal oxide layer.
15. The method of claim 12 , wherein the neighboring layer contains silicon, and wherein the at least one structural property comprises silicide content.
16. The method of claim 12 , wherein the neighboring layer is a polysilicon electrode, and wherein the at least one structural property comprises silicide content.
17. The method of claim 1 , wherein the first metal oxide layer comprises both crystalline and amorphous material.
18. The method of claim 1 , wherein the first metal oxide layer comprises two or more different crystal phases.
19. The method of claim 1 , wherein the first metal oxide layer comprises a silicide of a same metal as the metal oxide.
20. The method of claim 1 , wherein the first metal oxide layer comprises at least two different molecular structures of the metal oxide.