Segmented susceptor for temperature uniformity correction and optimization in an inductive heating system
An inductively coupled heating system having a segmented susceptor is disclosed. The segmented susceptor includes two or more segments, each segment having a side edge that is mateable with a side edge of another segment. The two mated side edges form an interface, increasing eddy currents near the interface. An inductively coupled heating system having a susceptor with multiple doped regions is also disclosed.
1. An inductive heating system comprising:
a susceptor comprising a plurality of susceptor segments, each susceptor segment comprising at least one edge configured to be mechanically coupled with at least one edge of at least one other susceptor segment and each susceptor segment having at least a doping region;
wherein at least two of the plurality of susceptor segments are doped in said doping regions with different doping metals, each doping region defined by a different doping profile;
wherein each doping region is doped with a metal having a different concentration from other doping regions such that the doping profile of the at least two susceptor segments vary;
wherein said metal is selected from titanium, tungsten, or combinations thereof; and
an induction coil inductively coupled to the susceptor.
2. The system of claim 1 , wherein eddy currents are induced at each interface formed by the coupling of the edges of the susceptor segments.
3. The system of claim 1 , wherein the induction coil is selected from the group consisting of: a conical coil, a circular coil, and a pancake coil.
4. The system of claim 3 , wherein the induction coil is a pancake coil.
5. The system of claim 1 , wherein the plurality of susceptor segments comprises two susceptor segments.
6. The system of claim 1 , wherein the susceptor further comprises a support, the plurality of susceptor segments positioned in the support.
7. The system of claim 1 , wherein the plurality of susceptor segments comprise graphite coated with silicon carbide.
8. The system of claim 1 , wherein a distance between the susceptor and the induction coil is variable.
9. The system of claim 1 , wherein each of the plurality of susceptor segments is removable.
10. The system of claim 1 , wherein at least one of the plurality of susceptor segments is positioned at a height that is higher than a height of at least one other of the plurality of susceptor segments.
11. The system of claim 1 , wherein the susceptor has a conical topography.
12. The system of claim 1 , wherein the susceptor has a curved topography.
13. The system of claim 1 , wherein the doping region in the first susceptor segment is more conductive than the doping region in the second susceptor segment.
14. The system of claim 1 , further comprising a doping region in a third susceptor segment having a third doping profile, wherein the third doping profile is different than the doping profiles in the first and second susceptor segments.