Obscured feature detector with width indication
A surface-conforming obscured feature detector includes a plurality of sensor plates, each having a capacitance that varies based on the dielectric constant of the materials that compose the surrounding objects and the proximity of those objects. A sensing circuit is coupled to the sensor plates 32 to measure the capacitances of the sensor plates. A controller is coupled to the sensing circuit to analyze the capacitances measured by the sensing circuit. One or a plurality of indicators are coupled to the controller, and are selectively activated to identify the location of an obscured feature behind a surface.
1. An obscured feature detector comprising:
a plurality of sensor plates, each having a capacitance that varies based on: (a) the proximity of the sensor plate to one or more surrounding objects, and (b) the dielectric constant(s) of the surrounding object(s);
a sensing circuit coupled to the sensor plates, the circuit being configured to measure the capacitances of the sensor plates;
a controller coupled to the sensing circuit, the controller being configured to analyze the capacitances measured by the sensing circuit; and
a plurality of indicators coupled to the controller, each indicator capable of toggling between a first state and a second state,
wherein the controller is configured to set a first group of the indicators in the first state when each respective indicator in the first group is located in front of an obscured feature and to set a second group of the indicators in the second state when each respective indicator in the second group is not located in front of the obscured feature, such that the first group of indicators in the first state identifies a location of the obscured feature and a number of indicators in the first state identifies a width of the obscured feature.
2. The obscured feature detector of claim 1 , wherein the detector uses a pattern matching module to determine the width of obscured features.
3. The obscured feature detector of claim 1 , wherein the second state is an activated state, and the detector activates indicators that are in front of an obscured feature to indicate the width of the obscured features.
4. The obscured feature detector of claim 1 , wherein the second state is an activated state, and a larger number of activated indicators indicate that an obscured feature is wider, and a smaller number of activated indicators indicates that an obscured feature is narrower.
5. An obscured feature detector comprising:
a plurality of sensor plates, each having a capacitance that varies based on: (a) the proximity of the sensor plate to one or more surrounding objects, and (b) the dielectric constant(s) of the surrounding object(s);
a sensing circuit coupled to the sensor plates, the circuit being configured to measure the capacitances of the sensor plates;
a controller coupled to the sensing circuit, the controller being configured to analyze the capacitances measured by the sensing circuit; and
a plurality of indicators coupled to the controller, each indicator capable of toggling between a first state and a second state,
wherein the controller is configured to toggle one or more of the indicators to the second state when the respective indicator is located in front of an obscured feature, and toggle the respective indicator to the first state when it is not located in front of the obscured feature, to such that the one or more indicators in the second stated identify a location of the obscured feature, and the number of indicators in the second state identify a width of the obscured feature.
6. A method for determining the location of more than one obscured feature behind a surface, the method comprising:
placing an obscured feature detector on the surface, the obscured feature detector having a plurality of sensor plates arranged in an array and a plurality of indicators;
measuring capacitance readings sensed in a plurality of regions, each region corresponding to an area surrounding one or more of the sensor plates;
identifying, based upon the measured capacitance readings, the location of an obscured feature; and
activating only the indicator(s) in front of the obscured feature to identify both the location and the width of the obscured feature.