High density chip packages, methods of forming, and systems including same
Methods and devices for multi-chip stacks are shown. A method is shown that assembles multiple chips into stacks by stacking wafers prior to dicing into individual chips. Methods shown provide removal of defective chips and their replacement during the assembly process to improve manufacturing yield.
1. A method of forming a semiconductor structure, comprising:
attaching a first semiconductor wafer to a redistribution wafer;
thinning a backside of the first semiconductor wafer to a first thickness to expose interconnection circuitry in a plurality of semiconductor chips included within the first semiconductor wafer;
removing selected semiconductor chips from the surface of the first semiconductor wafer; and
replacing the removed semiconductor chips with replacement semiconductor chips.
2. The method of claim 1 , wherein thinning a backside of a first semiconductor wafer, to a first thickness to expose interconnection circuitry in a plurality of semiconductor chips includes thinning a backside of a first semiconductor wafer, to a first thickness to expose interconnection circuitry in a plurality of memory chips.
3. The method of claim 1 , wherein thinning a backside of a first semiconductor wafer, to a first thickness to expose interconnection circuitry in a plurality of semiconductor chips includes thinning a backside of a first semiconductor wafer, to a first thickness to expose interconnection circuitry in a plurality of logic chips.
4. The method of claim 1 , wherein attaching the first semiconductor wafer to a redistribution wafer includes coupling input/output regions using pad metallurgy limiting lift off connection structures.
5. The method of claim 1 , wherein attaching the first semiconductor wafer to a redistribution wafer includes coupling input/output regions using TiNiCuAu connection structures.
6. The method of claim 1 , further including attaching a second semiconductor wafer to the first semiconductor wafer.
7. The method of claim 6 , wherein the second semiconductor wafer is thinned to expose interconnection circuitry in a plurality of semiconductor chips included within the second semiconductor wafer.
8. The method of claim 6 , further including removing selected semiconductor chips from the surface of the second semiconductor wafer.
9. The method of claim 6 , wherein attaching a second semiconductor wafer to the first semiconductor wafer includes attaching a second semiconductor wafer including memory chips to the first semiconductor wafer including memory chips.
10. The method of claim 6 , wherein attaching a second semiconductor wafer to the first semiconductor wafer includes attaching a second semiconductor wafer including logic chips to the first semiconductor wafer including memory chips.
11. The method of claim 6 , wherein attaching the second semiconductor wafer to the first semiconductor wafer includes coupling input/output regions using pad metallurgy limiting lift off connection structures.
12. The method of claim 6 , wherein attaching the second semiconductor wafer to the first semiconductor wafer includes coupling input/output regions using TiNiCuAu connection structures.
13. A method of forming a semiconductor structure, comprising:
attaching a first wafer to a redistribution wafer, the first wafer including a first plurality of semiconductor chips;
removing at least one semiconductor chip from a surface of the first wafer;
replacing any removed semiconductor chips from the first wafer with at least one replacement semiconductor chip;
stacking one or more additional wafers on the first wafer, each additional wafer including a plurality of semiconductor chips;
removing at least one semiconductor chip from an exposed surface of one or more of the additional wafers;
replacing any removed semiconductor chips with at least one replacement semiconductor chip before a subsequent wafer is stacked;
attaching a temporary holder wafer to a last wafer in the stack; and
dicing the semiconductor structure into individual chip stacks while they are secured to the temporary holder wafer.
14. The method of claim 13 , wherein stacking one or more additional wafers on the first wafer includes stacking memory wafers to a first memory wafer.
15. The method of claim 13 , wherein stacking one or more additional wafers on the first wafer includes stacking memory wafers to a first logic wafer.
16. The method of claim 13 , further comprising thinning at least some of the wafers prior to subsequent wafer attachment.