Electronic-structure modulation transistor
An electronic structure modulation transistor having two gates separated from a channel by corresponding dielectric layers, wherein the channel is formed of a material having an electronic structure that is modified by an electric field across the channel.
1. An electronic structure modulation transistor having two gates separated from a channel by corresponding dielectric layers, wherein the channel includes graphene nanoribbon with imperfect edges and forms an electronic structure that has a near-midgap state, wherein a band width of the near-midgap state of the channel is modifiable by an electric field across the channel.
2. The transistor of claim 1 wherein the band width of the near midgap state of the channel is modulated by the electric field.
3. The transistor of claim 1 wherein the channel is formed of zigzag graphene nanoribbon.
4. The transistor of claim 1 wherein the channel is formed of molecular nano structures.
5. The transistor of claim 1 wherein the channel includes nanowires of Si or other semiconducting materials where a near-midgap state can be modulated.
6. The transistor of claim 1 wherein the gates are formed of conductively doped silicon.
7. The transistor of claim 1 wherein the gates are formed of conductive metal.
8. The transistor of claim 1 wherein the gates, dielectric layers and channel are formed in a vertical stack supported by a semiconductor substrate with insulating dielectric.
9. The transistor of claim 1 wherein the gates, dielectric layers and channel are formed in a horizontal arrangement supported by a semiconductor substrate with insulating dielectric.
10. The transistor of claim 1 wherein the electronic structure of the channel is modulated by a voltage applied across the gates.
11. The transistor of claim 1 wherein the channel is formed of armchair graphene nanoribbon.
12. An electronic structure modulation transistor having two gates separated from a channel by corresponding dielectric layers, wherein the channel includes styrene chains or other molecular chains and forms an electronic structure that has a near-midgap state, wherein a band width of the near-midgap state of the channel is modifiable by an electric field across the channel.
13. A transistor comprising:
a pair of gates having adjacent dielectric layers;
a channel disposed between the adjacent dielectric layers, wherein the channel includes graphene nanoribbon with imperfect edges and forms an electronic structure that has a near-midgap state, wherein a band width of the near-midgap state of the channel is modifiable by an electric field provided from a voltage applied across the pair of gates.
14. The transistor of claim 13 wherein the bandwidth of the near-midgap state of the channel is modulated by the electric field.
15. The transistor of claim 13 wherein the channel is formed of zigzag graphene nanoribbon.
16. The transistor of claim 13 wherein the channel is formed of molecular nano structures.
17. The transistor of claim 13 wherein the channel is formed of nanowires of Si or other semiconducting materials where a near-midgap state can be modulated.
18. The transistor of claim 13 wherein the gates are formed of conductively doped silicon.
19. The transistor of claim 13 wherein the channel is formed of armchair graphene nanoribbon.
20. A transistor comprising:
a pair of gates having adjacent dielectric layers;
a channel disposed between the adjacent dielectric layers, wherein the channel includes styrene chains or other molecular chains and forms an electronic structure that has a near-midgap state, wherein a band width of the near-midgap state is modifiable by an electric field provided from a voltage applied across the pair of gates.