Processes and mounting fixtures for fabricating electromechanical devices and devices formed therewith
Processes and fixtures for producing electromechanical devices, and particularly three-dimensional electromechanical devices such as inertial measurement units (IMUs), through the use of a fabrication process and a three-dimensional assembly process that entail joining single-axis device-IC chips while positioned within a mounting fixture that maintains the orientations and relative positions of the chips during the joining operation.
1. A process of assembling a three-dimensional electromechanical device, the process comprising:
providing a mounting fixture comprising at least one wafer member defining oppositely-disposed first and second surfaces, and at least a first mounting cavity in the wafer member, the first mounting cavity defining an opening in the first surface of the wafer member and being defined by multiple side walls and a bottom wall that adjoins the side walls and closes the first mounting cavity at the second surface of the wafer member;
placing multiple chips in the first mounting cavity through the opening of the cavity in the first surface of the wafer member, a first of the chips contacting a first of the side walls, a second of the chips contacting a second of the side walls, and a third of the chips contacting the bottom walls;
securing the first and second chips to the first and second side walls; and
joining the first, second and third chips to form the three-dimensional electromechanical device.
2. The process according to claim 1 , wherein the first, second and third chips are electrically and physically interconnected with flexible cables prior to being placed in the first mounting cavity, and the flexible cables are folded as a result of placing the chips in the first mounting cavity.
3. The process according to claim 1 , wherein the first, second and third chips are joined by flowing and solidifying a metallic bond material.
4. The process according to claim 1 , wherein the electromechanical device is a three-axis inertial measurement unit and each of the chips comprises a gyroscope and/or an accelerometer.
5. The three-dimensional device assembled by the process of claim 1 .
6. The three-dimensional device according to claim 5 , wherein the device is a three-axis inertial measurement unit.
7. A process of assembling a three-dimensional electromechanical device, the process comprising:
fabricating a mounting fixture by etching at least one wafer member having oppositely-disposed first and second surfaces to define at least a first mounting cavity that defines an opening in the first surface of the wafer member, multiple side walls and a bottom wall that adjoins the side walls and closes the first mounting cavity at the second surface of the wafer member;
placing multiple chips in the first mounting cavity through the opening of the cavity in the first surface of the wafer member, a first of the chips contacting a first of the side walls, a second of the chips contacting a second of the side walls, and a third of the chips contacting the bottom walls;
securing the first and second chips to the first and second side walls; and
joining the first, second and third chips to form the three-dimensional electromechanical device.
8. The process according to claim 7 , further comprising applying a force to each of the first, second and third chips to promote bonding thereof during the joining step.
9. The process according to claim 8 , wherein the force is applied with a pressurized gas.
10. The process according to claim 8 , wherein the force is applied with a movable structure that applies the force in three orthogonal directions.
11. The process according to claim 7 , wherein the first, second and third chips are electrically and physically interconnected with flexible cables prior to being placed in the first mounting cavity, and the flexible cables are folded as a result of placing the chips in the first mounting cavity.
12. The process according to claim 7 , wherein the electromechanical device is a three-axis inertial measurement unit and each of the chips comprises a gyroscope and/or an accelerometer.
13. The three-dimensional device assembled by the process of claim 7 .
14. The three-dimensional device according to claim 13 , wherein the device is a three-axis inertial measurement unit.
15. A three-dimensional electromechanical device comprising:
a mounting fixture comprising multiple side walls and a bottom wall that adjoins the side walls, and at least a first mounting cavity defined by at least first and second side walls of the multiple side walls and the bottom wall; and
first, second and third chips that are within the first mounting cavity, bonded to the first ands second side walls and the bottom wall, respectively, of the mounting fixture, and oriented by the first ands second side walls and the bottom wall to be orthogonal to each other.
16. The three-dimensional electromechanical device according to claim 15 , wherein the first, second and third chips are electrically and physically interconnected with flexible cables that are folded between adjacent pairs of the chips.
17. The three-dimensional electromechanical device according to claim 15 , wherein the electromechanical device is a three-axis inertial measurement unit and each of the chips comprises a gyroscope and/or an accelerometer.
18. An inertial navigation system containing the three-axis inertial measurement unit of claim 15 .
19. The inertial navigation system according to claim 18 , wherein the inertial navigation system is installed in a moving object.
20. The process according to claim 1 , wherein the mounting fixture is further provided to comprise:
at least one channel within each of the first and second side walls of the first mounting cavity;
at least one hole in each of the first and second side walls of the first mounting cavity and fluidically coupling the first mounting cavity to a corresponding one of the channels; and
at least one hole in the bottom wall of the first mounting cavity;
wherein the securing step comprises applying a vacuum to the channels within the first and second side walls so as to draw a vacuum at the holes in the first and second side walls to secure the first and second chips to the first and second side walls.
21. The process according to claim 7 , wherein the mounting fixture is further fabricated to comprise:
channels within the first and second side walls;
holes in the first and second side walls that are fluidically coupled to the channels; and
holes in the bottom walls;
wherein the securing step comprises applying a vacuum to the channels within the first and second side walls so as to draw a vacuum at the holes in the first and second side walls to secure the first and second chips to the first and second side walls.
22. The three-dimensional electromechanical device according to claim 15 , wherein the mounting fixture further comprises:
at least one channel within each of the first and second side walls of the first mounting cavity;
at least one hole in each of the first and second side walls of the first mounting cavity and fluidically coupling the first mounting cavity to a corresponding one of the channels; and
at least one hole in the bottom wall of the first mounting cavity;
wherein the holes and the channel are configured for drawing a vacuum at the holes in the first and second side walls to secure the first and second chips to the first and second side walls.