Lithographic apparatus and device manufacturing method
An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.
1. A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate and along a beam path in the space, the apparatus comprising:
a liquid confinement structure configured to at least partly confine the liquid within the space, the liquid confinement structure having a first outlet at the bottom side of the liquid confinement structure and a second outlet outwardly from the first outlet relative to the beam path, the first outlet into which liquid from the space can flow and the second outlet arranged to extract a fluid from the space, and
a divider to divide the space into two parts and that is substantially parallel to a surface of a substrate table configured to hold the substrate, the divider having an inlet to provide liquid to the space and an aperture to allow transmission of the pattern and liquid from the part above the divider to the part below the divider, the divider configured to provide a liquid flow substantially parallel to a top surface of the substrate table, and the divider extending from the liquid confinement structure to a point closer to the beam path than the liquid confinement structure, wherein the second outlet surrounds.
2. The apparatus of claim 1 , wherein the inlet and/or the divider are configured to provide the liquid flow toward a central region, in plan, of the aperture from opposite sides of the central region.
3. The apparatus of claim 1 , wherein the inlet surrounds the aperture.
4. The apparatus of claim 1 , wherein the inlet is inward of the second outlet relative to the beam path.
5. The apparatus of claim 1 , wherein the inlet is outward of the aperture relative to the beam path.
6. The apparatus of claim 1 , wherein the inlet is positioned further in height from the surface of the substrate table than the second outlet.
7. The apparatus of claim 1 , wherein the second outlet is directed towards a plane comprising the surface of the substrate table.
8. The apparatus of claim 1 , wherein the divider comprises a lip which forms the narrowest part of the aperture and another portion of the aperture is wider than the narrowest part.
9. The apparatus of claim 1 , wherein an edge of the aperture is beveled.
10. The apparatus of claim 1 , wherein the divider has a hydrophobic coating, or a hydrophilic coating, or both a hydrophobic and a hydrophilic coating.
11. The apparatus of claim 1 , wherein the fluid comprises a liquid.
12. The apparatus of claim 1 , wherein the first outlet and/or the second outlet comprises a plurality of openings.
13. A device manufacturing method comprising:
projecting a patterned beam of radiation along a beam path through an aperture of a divider and a liquid provided in a space adjacent a substrate and onto the substrate, wherein the aperture allows transmission of liquid from above the divider to below the divider, wherein the liquid is at least partly confined within the space by a liquid confinement structure, the liquid confinement structure having a first outlet at the bottom side of the liquid confinement structure and a second outlet outwardly from the first outlet relative to the beam path, the first outlet into which liquid from the space flows and the second outlet extracts a fluid from the space and surrounds the aperture, and wherein the divider divides the space into two parts and extends substantially parallel to a surface of the substrate, the divider has an inlet to provide liquid to the space, and the divider extends from the liquid confinement structure to a point closer to the beam path than the liquid confinement structure; and
providing a flow of liquid through the inlet and substantially parallel to a top surface of the substrate.
14. The method of claim 13 , wherein the inlet is positioned further in height from the surface of the substrate than the second outlet.
15. The method of claim 13 , wherein an edge of the aperture is beveled.
16. The method of claim 13 , wherein the providing the liquid flow comprises providing the liquid flow toward a central region, in plan, of the aperture from opposite sides of the central region.
17. A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate, held by a substrate table, through a liquid confined in a space adjacent the substrate and along a beam path in the space, the apparatus comprising:
a liquid confinement structure configured to at least partly confine the liquid within the space, the liquid confinement structure having a first outlet at the bottom side of the liquid confinement structure and a second outlet outwardly from the first outlet relative to the beam path, the first outlet into which liquid from the space can flow and the second outlet arranged to extract a fluid from the space;
a divider structure to divide the space into two parts and that is substantially parallel to a top surface of the substrate table, the divider structure having an aperture to allow transmission of the pattern and liquid from the part above the divider structure to the part below the divider structure, the divider structure configured to provide a liquid flow substantially parallel to the top surface of the substrate table, and the divider structure extending to a point closer to the beam path than the liquid confinement structure; and
an inlet, located above the divider structure, to provide liquid to the space,
wherein the first and second outlets surround the aperture.
18. The apparatus of claim 17 , wherein the inlet is positioned further in height from the top surface of the substrate table than the second outlet.
19. The apparatus of claim 17 , wherein the liquid from the inlet exits in a direction substantially parallel to the top surface of the substrate table.
20. The apparatus of claim 17 , wherein the inlet and/or the divider are configured to provide the liquid flow toward a central region, in plan, of the aperture from opposite sides of the central region.