Photo-mask and method for manufacturing liquid crystal display device using the same
A photo-mask is capable of preventing stain defects and a method for fabricating a liquid crystal display device using the photo-mask which achieves the same capability. The photo-mask includes a transparent substrate configured to transmit ultraviolet light and a light shielding layer configured to block ultraviolet light on a surface of the transparent substrate. The light shielding layer includes an absorption layer configured to absorb ultraviolet light.
1. A method for fabricating a liquid crystal display device, comprising the steps of:
preparing a first substrate and a second substrate comprising cell regions;
forming a sealant at a peripheral region of the cell regions of at least one of the first and second substrates;
dispensing a liquid crystal within the cell regions;
joining the first and second substrates;
disposing a photo-mask above one of the first substrate and the second substrate, the photo-mask comprising a transparent substrate and a light shielding layer borne on a surface of the transparent substrate, the light shielding layer comprising a filter layer which is configured to absorb ultraviolet light with a first wavelength smaller than a predetermined wavelength and which is configured to be transmissive to ultraviolet light with a second wavelength greater than the predetermined wavelength; and
selectively hardening the sealant with ultraviolet light passing through the photo-mask,
the ultraviolet light having the second wavelength not inducing polymerization of the liquid crystal.
2. The method of claim 1 , wherein the sealant comprises a first reactive resin and a first photoinitiator.
3. The method of claim 2 , further wherein the first photoinitiator is reactive to ultraviolet light having a wavelength range of from about 380 nm to about 400 nm.
4. The method of claim 3 , further wherein the first photoinitiator comprises one of benzoin ether and benzophenone/amine.
5. The method of claim 1 , wherein a layer of the liquid crystal comprises a second reactive resin and a second photoinitiator.
6. The method of claim 5 , further wherein the second photoinitiator is reactive to ultraviolet light having a wavelength smaller than about 380 nm.
7. The method of claim 6 , further wherein the second photoinitiator comprises thioxanthone.
8. The method of claim 1 , further wherein the filter layer comprises one of polycrystal silicon and amorphous silicon.
9. The method of claim 8 , further wherein the polycrystal silicon absorbs ultraviolet light having a wavelength smaller than about 380 nm.
10. The method of claim 1 , wherein the predetermined wavelength is within a range of from about 380 nm to about 400 nm.
11. The method of claim 1 , wherein the light shielding layer further comprises a reflection layer formed on the filter layer.
12. A method for fabricating a liquid crystal display device, comprising the steps of:
providing a liquid crystal display unit formed by first and second substrates joined by a sealant at a peripheral region of a plurality of cell regions, each cell region containing a liquid crystal;
disposing a photo-mask above one of the first and second substrates, the photo-mask comprising a transparent substrate and a light shielding layer borne on a surface of the transparent substrate, the light shielding layer comprising a filter layer absorbing ultraviolet light with a first wavelength smaller than a predetermined wavelength and transmitting ultraviolet light with a second wavelength greater than the predetermined wavelength, the ultraviolet light having the second wavelength not inducing polymerization of the liquid crystal; and
selectively hardening the sealant with ultraviolet light passing through the photo-mask.