Internal member of a plasma processing vessel
An internal member of a plasma processing vessel includes a base material and a film formed by thermal spraying of ceramic on a surface of the base material. The film is formed of ceramic which includes at least one kind of element selected from the group consisting of B, Mg, Al, Si, Ca, Cr, Y, Zr, Ta, Ce and Nd. In addition, at least a portion of the film is sealed by a resin.
1. An internal member of a plasma processing vessel, comprising:
a base material, wherein the base material comprises at least one of stainless steel, Al, Al alloy, W, W alloy, Ti, Ti alloy, Mo, Mo alloy, carbon, oxide or non-oxide based sintered ceramic body, and carbonaceous material; and
a film formed on a surface of the base material, the film having pores therein,
wherein the film includes a first ceramic layer and a second ceramic layer, the second ceramic layer formed in contact with the base material,
wherein the first and second ceramic layers include at least one kind of element selected from the group consisting of B, Mg, Al, Si, Ca, Cr, Y, Zr, Ta, Ce and Nd, and at least parts of the pores in the film is sealed by a sol-gel method using Y 2 O 3 to form a sealing-treated portion,
wherein the sealing treated portion is formed in a lower portion of the second ceramic layer to make a contact with the base material, and
wherein the sealing-treated portion is not formed in an upper portion of the film to suppress surface degradation of the film.
2. The internal member of claim 1 , wherein an anodic oxidized film is formed between the base material and the film.
3. The internal member of claim 1 , wherein the first ceramic layer is Y 2 O 3 and the second ceramic layer is Al 2 O 3 .
4. The internal member of claim 1 , wherein the first and second ceramic layers are selected from the group consisting of B 4 C, MgO, Al 2 O 3 , SiC, Si 3 N 4 , SiO 2 , CaF 2 , Cr 2 O 3 , Y 2 O 3 , YF 3 , ZrO 2 , TaO 2 , CeO 2 , Ce 2 O 3 , CeF 3 and Nd 2 O 3 .
5. The internal member of claim 1 , wherein the film is formed by a thermal spraying method.
6. The internal member of claim 1 , wherein the upper portion of the film is located on a side of the film that is opposite to a side of the film that is formed on the surface of the base material.
7. A plasma processing apparatus comprising:
a vacuum chamber in which an object to be processed is placed;
a gas supply member configured to supply a gas into the vacuum chamber;
a plasma generating member configured to generate a plasma of the gas in the vacuum chamber;
an exhausting member configured to vacuum exhaust an inside of the vacuum chamber; and
an internal member which is installed in the vacuum chamber,
wherein the internal member includes:
a base material, wherein the base material comprises at least one of stainless steel, Al, Al alloy, W, W alloy, Ti, Ti alloy, Mo, Mo alloy, carbon, oxide or non-oxide based sintered ceramic body, and carbonaceous material; and
a film formed on a surface of the base material, the film having pores therein,
wherein the film includes a first ceramic layer and a second ceramic layer, the second ceramic layer formed in contact with the base material,
wherein the first and second ceramic layers include at least one kind of element selected from the group consisting of B, Mg, Al, Si, Ca, Cr, Y, Zr, Ta, Ce and Nd, and at least parts of the pores in the film is sealed by a sol-gel method using Y2O3 to form a sealing-treated portion,
wherein the sealing treated portion is formed in a lower portion of the second ceramic layer to make a contact with the base material, and
wherein the sealing-treated portion is not formed in an upper portion of the film to suppress surface degradation of the film.
8. The plasma processing apparatus of claim 7 , wherein an anodic oxidized film is formed between the base material and the film.
9. The plasma processing apparatus of claim 7 , wherein the first ceramic layer is Y 2 O 3 and the second ceramic layer is Al 2 O 3 .
10. The plasma processing apparatus of claim 7 , wherein the upper portion of the film is located on a side of the film that is opposite to a side of the film that is formed on the surface of the base material.
11. An internal member of a plasma processing vessel, comprising:
a base material;
a coating film formed on a surface of the base material; and
an anodic oxidized film formed between the base material and the coating film,
wherein the anodic oxidized film is sealed by a resin,
wherein at least a portion of the coating film is sealed by a resin or by a sol gel method to form a sealing-treated portion,
wherein the sealing-treated portion is formed in a lower portion of the coating film to make a contact with the base material,
wherein the sealing-treated portion is not formed in an upper portion of the coating film to suppress surface degradation of the film, and
wherein the coating film is formed of ceramic including at least one kind of element selected from the group consisting of B, Mg, Al, Si, Ca, Cr, Y, Zr, Ta, Ce and Nd.
12. The internal member of claim 11 , wherein the resin is selected from the group consisting of SI (silicon), PTFE (polytetrafluoroethylene), PI (polyimide), PAI (polyamideimide), PEI (polyetherimide), PBI (polybenzimidazole) and PFA (perfluoroalkoxyalkane).
13. The internal member of claim 11 , wherein the upper portion of the coating film is located on a side of the coating film that is opposite to a side of the coating film that is formed on the surface of the base material.