IP Library › Granted Patent US 8,878,175
Granted Patent B2
US 8,878,175 · App. 13/541,094 · Granted Nov 4, 2014

Semiconductor device and manufacturing method thereof

Inventor: Shunpei Yamazaki (Setagaya, JP)
Assignee: Semiconductor Energy Laboratory Co., Ltd.
H01L27/1214H01L29/7869H01L27/1225
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Quick Facts
Patent No.
US 8,878,175
App. No.
13/541,094
Granted
Nov 4, 2014
Kind
B2
Abstract

An object is to reduce a capacitance value of parasitic capacitance without decreasing driving capability of a transistor in a semiconductor device such as an active matrix display device. Further, another object is to provide a semiconductor device in which the capacitance value of the parasitic capacitance was reduced, at low cost. An insulating layer other than a gate insulating layer is provided between a wiring which is formed of the same material layer as a gate electrode of the transistor and a wiring which is formed of the same material layer as a source electrode or a drain electrode.

Claims (44)

1. A display device comprising:

a first wiring including a gate electrode over a substrate;

a gate insulating layer over the gate electrode;

an oxide semiconductor layer over the gate insulating layer;

a second wiring including one of a source electrode and a drain electrode electrically connected to the oxide semiconductor layer;

an insulating layer over the oxide semiconductor layer;

an organic insulating layer over the insulating layer; and

a pixel electrode layer over the organic insulating layer, wherein the pixel electrode layer is in electrical contact with the other of the source electrode and the drain electrode through a contact hole opened in the insulating layer and the organic insulating layer,

wherein the first wiring and the second wiring include a portion overlapped with each other, and

wherein a transparent conductive layer overlaps the portion.

2. The display device according to claim 1 , wherein the oxide semiconductor layer includes indium, gallium and zinc.

3. The display device according to claim 1 , wherein the oxide semiconductor layer is formed over the source electrode and the drain electrode.

4. The display device according to claim 1 , further comprising a resist mask over the first wiring.

5. The display device according to claim 1 , wherein the display device is incorporated in one selected from the group consisting of a poster, an advertisement, an e-book reader, a television set, a digital photo frame, a portable amusement machine, a slot machine, and a cellular phone.

6. A display device comprising:

a first wiring including a gate electrode over a substrate;

a gate insulating layer over the gate electrode;

an oxide semiconductor layer over the gate insulating layer;

a second wiring including one of a source electrode and a drain electrode electrically connected to the oxide semiconductor layer;

an insulating layer over the oxide semiconductor layer;

an organic insulating layer over the insulating layer;

a pixel electrode layer over the organic insulating layer, wherein the pixel electrode layer is in electrical contact with the other of the source electrode and the drain electrode through a contact hole opened in the insulating layer and the organic insulating layer; and

a liquid crystal layer over the pixel electrode layer,

wherein the first wiring and the second wiring include a portion overlapped with each other, and

wherein a transparent conductive layer overlaps the portion.

7. The display device according to claim 6 , wherein the oxide semiconductor layer includes indium, gallium and zinc.

8. The display device according to claim 6 , wherein the oxide semiconductor layer is formed over the source electrode and the drain electrode.

9. The display device according to claim 6 , further comprising a resist mask over the first wiring.

10. The display device according to claim 6 , wherein the display device is incorporated in one selected from the group consisting of a poster, an advertisement, an e-book reader, a television set, a digital photo frame, a portable amusement machine, a slot machine, and a cellular phone.

11. A display device comprising:

a first wiring including a gate electrode over a substrate;

a gate insulating layer over the gate electrode;

an oxide semiconductor layer over the gate insulating layer;

a second wiring including one of a source electrode and a drain electrode electrically connected to the oxide semiconductor layer;

an insulating layer over the oxide semiconductor layer;

an organic insulating layer over the insulating layer;

a pixel electrode layer over the organic insulating layer, wherein the pixel electrode layer is in electrical contact with the other of the source electrode and the drain electrode through a contact hole opened in the insulating layer and the organic insulating layer; and

a light-emitting layer over the pixel electrode layer,

wherein the first wiring and the second wiring include a portion overlapped with each other, and

wherein a transparent conductive layer overlaps the portion.

12. The display device according to claim 11 , wherein the oxide semiconductor layer includes indium, gallium and zinc.

13. The display device according to claim 11 , wherein the oxide semiconductor layer is formed over the source electrode and the drain electrode.

14. The display device according to claim 11 , further comprising a resist mask over the first wiring.

15. The display device according to claim 11 , wherein the display device is incorporated in one selected from the group consisting of a poster, an advertisement, an e-book reader, a television set, a digital photo frame, a portable amusement machine, a slot machine, and a cellular phone.

Priority Claims (1)
JP 2008-330258 · Dec 25, 2008 · national
Continuity (3)
Continuation 13357958 · Jan 25, 2012
Continuation 12634048 · Dec 9, 2009
Related Publication 20120268682A1 · Oct 25, 2012