Nonvolatile semiconductor memory device and method for manufacturing same

1. A nonvolatile semiconductor memory device comprising:

a first stacked structure including a plurality of first electrode films stacked in a first direction and a first interelectrode insulating film provided between the plurality of first electrode films;

a first select gate electrode stacked with the first stacked structure along the first direction, the first select gate electrode including a plurality of first select gate conductive films stacked in the first direction and a first inter-select gate conductive film insulating film provided between the plurality of first select gate conductive films;

a first semiconductor pillar piercing the first stacked structure, the plurality of first select gate conductive films and the first inter-select gate conductive film insulating film in the first direction;

a first memory portion provided between each of the plurality of first electrode films and the first semiconductor pillar;

a first inner insulating film provided between the first memory portion and the first semiconductor pillar;

a first outer insulating film provided between the first memory portion and the plurality of first electrode films; and

a first select gate insulating film provided between each of the plurality of first select gate conductive films and the first semiconductor pillar,

wherein ends of at least two of the plurality of first electrode films form a step.

2. The device according to claim 1 , wherein each of the plurality of first select gate conductive films is made of a material the same as a material of each of the plurality of first electrode films.

3. The device according to claim 1 , wherein each of the plurality of first select gate conductive films has a thickness the same as a thickness of each of the plurality of first electrode films.

4. The device according to claim 1 , further comprising:

a second stacked structure being adjacent to the first stacked structure in a second direction perpendicular to the first direction, the second stacked structure including a plurality of second electrode films stacked in the first direction and a second interelectrode insulating film provided between the plurality of second electrode films;

a second select gate electrode stacked with the second stacked structure along the first direction, the second select gate electrode including a plurality of second select gate conductive films stacked in the first direction and a second inter-select gate conductive film insulating film provided between the plurality of second select gate conductive films;

a second semiconductor pillar piercing the second stacked structure and the second select gate electrode in the first direction;

a second memory portion provided between each of the plurality of second electrode films and the second semiconductor pillar;

a second inner insulating film provided between the second memory portion and the second semiconductor pillar;

a second outer insulating film provided between the second memory portion and the plurality of second electrode films;

a second select gate insulating film provided between the plurality of second select gate conductive films and the second semiconductor pillar; and

a semiconductor connecting portion connecting one end of the first semiconductor pillar and one end of the second semiconductor pillar.

5. The device according to claim 4 , further comprising:

a first interconnection connected to another end of the first semiconductor pillar on opposite side from the semiconductor connecting portion; and

a second interconnection connected to another end of the second semiconductor pillar on opposite side from the semiconductor connecting portion and extending in a direction orthogonal to an extending direction of the first interconnection.

6. The device according to claim 4 , wherein

each of the plurality of second select gate conductive films has a thickness the same as a thickness of each of the plurality of first select gate conductive films, and

each of the plurality of second inter-select gate conductive film insulating films has a thickness the same as a thickness of each of the plurality of first inter-select gate conductive film insulating films.

7. The device according to claim 1 , wherein the first inter-select gate conductive film insulating film is made of a material the same as a material of the first interelectrode insulating film.

8. The device according to claim 1 , wherein the first inter-select gate conductive film insulating film has a thickness the same as a thickness of the first interelectrode insulating film.

9. The device according to claim 1 , wherein the first select gate electrode has a thickness along the first direction larger than a thickness along the first direction of one of the plurality of first electrode films.

10. The device according to claim 1 , wherein a number of the plurality of first electrode films is larger than a number of the plurality of first select gate conductive films.

11. The device according to claim 1 , wherein the first electrode film includes at least one of polycrystalline silicon doped with an impurity and amorphous silicon doped with an impurity.

12. The device according to claim 1 , wherein the first select gate conductive film includes at least one of amorphous silicon doped with an impurity and polycrystalline silicon doped with an impurity.

13. The device according to claim 1 , further comprising a contact member electrically connecting the plurality of first select gate conductive films.

14. The device according to claim 13 , wherein the contact member extends in the first direction.

15. The device according to claim 13 , wherein the contact member electrically connects the plurality of first select gate conductive films at each end portion of the plurality of first select gate conductive films.

16. The device according to claim 13 , wherein the contact member pierces at least one of the plurality of first select gate conductive films in the first direction.

17. The device according to claim 1 , wherein each end of the plurality of first select gate conductive films is disposed in a plane parallel to the first direction.

18. The device according to claim 13 , wherein

the plurality of first select gate conductive films includes a nearest select gate conductive film and other select gate conductive films except for the nearest select gate conductive films, the nearest select gate conductive film being nearest to the first stacked structure among the plurality of first select gate conductive films,

the contact member has an end on a side of the first stacked structure,

the nearest select gate conductive film contacts the end of the contact member, and

other select gate conductive films contact a side face of the contact member.

19. The device according to claim 1 , wherein the plurality of first select gate conductive films are configured capable to be set at a same potential.

20. The device according to claim 1 , wherein a thickness of each of plurality of first electrode films is larger than a thickness of the first inter-select gate conductive film insulating film.

21. The device according to claim 1 , wherein a thickness of each of plurality of first electrode films is larger than a thickness of the first interelectrode insulating film.

22. The device according to claim 1 , wherein a thickness of each of the plurality of first select gate conductive films is larger than a thickness of the first inter-select gate conductive film insulating film.

23. The device according to claim 1 , wherein a thickness of each of the plurality of first select gate conductive films is larger than a thickness of the first interelectrode insulating film.