Spin hall effect assisted spin transfer torque magnetic random access memory
Embodiments are directed to providing a spin hall effect (SHE) assisted spin transfer torque magnetic random access memory (STT-MRAM) device by coupling a magnetic tunnel junction (MTJ) to a SHE material, and coupling the SHE material to a transistor. Embodiments are directed to a spin transfer torque magnetic random access memory (STT-MRAM) device comprising: a magnetic tunnel junction (MTJ) coupled to a spin hall effect (SHE) material, and a transistor coupled to the SHE material.
1. A spin transfer torque magnetic random access memory (STT-MRAM) device comprising:
a magnetic tunnel junction (MTJ) coupled to a spin hall effect (SHE) material; and
a transistor coupled to the SHE material, such that a source of the transistor abuts the SHE material;
wherein the MTJ comprises an in-plane magnetic field and a nonmagnetic spacer, and
wherein the in-plane magnetic field is provided by a dipole field from an in-plane magnetized ferromagnetic (FM) layer, and wherein the in-plane magnetized FM layer is coupled to the nonmagnetic spacer, and wherein the nonmagnetic spacer is coupled to a reference layer of the MTJ;
wherein one edge of the transistor is aligned to an edge of the SHE material, while an other edge of the transistor is aligned to an edge of the MTJ.
2. The device of claim 1 , wherein the SHE material comprises a wire and has a thickness on the order of one to ten nanometers.
3. The device of claim 1 , wherein the SHE material comprises bismuth.
4. The device of claim 1 , wherein the SHE material is misaligned from the transistor.
5. The device of claim 1 , wherein the transistor comprises a field effect transistor (FET), and wherein one of a source and a drain of the FET is coupled to the SHE material.
6. A spin transfer torque magnetic random access memory (STT-MRAM) device comprising:
a magnetic tunnel junction (MTJ) coupled to a spin hall effect (SHE) material; and
a field effect transistor (FET) coupled to, and misaligned from, the SHE material, a source of the transistor abutting the SHE material;
wherein the MTJ comprises an in-plane magnetic field and a nonmagnetic spacer, and
wherein the in-plane magnetic field is provided by a dipole field from an in-plane magnetized ferromagnetic (FM) layer, and wherein the in-plane magnetized FM layer is coupled to the nonmagnetic spacer, and wherein the nonmagnetic spacer is coupled to a reference layer of the MTJ;
wherein one edge of the transistor is aligned to an edge of the SHE material, while an other edge of the transistor is aligned to an edge of the MTJ.
7. The device of claim 6 , wherein a source of the FET is coupled to the SHE material.
8. The device of claim 6 , wherein a drain of the FET is coupled to the SHE material.
9. The device of claim 6 , wherein the SHE material comprises a wire and has a thickness on the order of one to ten nanometers.