Semiconductor device and manufacturing method for the same

1. A semiconductor device comprising:

a substrate including a first circuit region, a first circuit element being formed in the first circuit region;

a multilayer wiring layer that is formed on the substrate and composed of a plurality of wiring layers and a plurality of via layers that are laminated; and

an electrode pad that is formed on the multilayer wiring layer,

wherein an interlayer insulating film is formed in a region of a first wiring layer that is a top layer of the plurality of wiring layers, in a region in which the electrode pad and the first circuit region overlap each other in a planar view of the electrode pad,

wherein the substrate further includes a second circuit region where a second circuit element is formed that is less susceptible to stress as compared to the first circuit element, and

wherein the electrode pad overlaps the first circuit region and the second circuit region in the planar view of the electrode pad.

2. The semiconductor device according to claim 1 , wherein

the electrode pad includes a first pad region and a second pad region constructed so that a larger stress is imposed on the second pad region than a stress imposed on the first pad region, and

an interlayer insulating film is formed in a region of the first wiring layer, in the region in which the second pad region and the first circuit region overlap each other in the planar view of the electrode pad.

3. The semiconductor device according to claim 2 ,

wherein a first conductor pattern is formed in at least a part of a region of the first wiring layer, in a region other than the region in which the second pad region and the first circuit region overlap in the planar view of the electrode pad.

4. The semiconductor device according to claim 3 , wherein

a second conductor pattern is formed across the first and second pad regions in a second wiring layer, which is a wiring layer immediately below the first wiring layer, and

the first and second conductor patterns are connected through a via.

5. The semiconductor device according to claim 2 ,

wherein the first pad region is formed on a side of the first circuit region and the second pad region is formed on a side of the second circuit region in the planar view of the electrode pad.

6. The semiconductor device according to claim 2 ,

wherein a projection is formed to a part corresponding to the second pad region in a periphery of the electrode pad.

7. The semiconductor device according to claim 2 ,

wherein a length of the first pad region in a direction vertical to a longitudinal direction of the electrode pad is different from a length of the second pad region in the direction vertical to the longitudinal direction of the electrode pad.

8. The semiconductor device according to claim 1 ,

wherein the first circuit region is formed in an internal circuit region, and the second circuit region is formed in an I/O circuit region.

9. The semiconductor device according to claim 8 ,

wherein the I/O circuit region is disposed along a circumference of the semiconductor device to surround the internal circuit region.

10. The semiconductor device according to claim 8 , wherein

the first circuit element formed in the internal circuit region includes at least one of a memory circuit and a logic circuit, and

the second circuit element formed in the I/O circuit region includes at least one of an input buffer circuit, an output buffer circuit, and a level shifter.

11. The semiconductor device according to claim 2 ,

wherein an analog circuit is formed in a region where the first pad region of the substrate is formed in the planar view of the electrode pad.

12. The semiconductor device according to claim 11 ,

wherein the analog circuit includes at least one of a PLL circuit and a regulator circuit.

13. The semiconductor device according to claim 2 ,

wherein the first circuit element formed in the first circuit region is a power switch circuit.

14. A manufacturing method for a semiconductor device comprising:

forming a first circuit element in a first circuit region of a substrate;

forming a multilayer wiring layer on the substrate, the multilayer wiring layer being composed of a plurality of wiring layers and a plurality of via layers that are alternately laminated; and

forming an electrode pad on the multilayer wiring layer;

forming a second circuit element in a second circuit region of the substrate, the second circuit element being less susceptible to stress than the first circuit element; and

forming the electrode pad to overlap the first circuit region and the second circuit region in the planar view of the electrode pad,

wherein at the time of forming the multilayer wiring layer, an interlayer insulating film is formed in a region of a first wiring layer that is a top layer of the plurality of wiring layers, in a region the electrode pad and the first circuit region overlap each other in a planar view of the electrode pad.

15. The manufacturing method for the semiconductor device according to claim 14 , further comprising:

forming a first pad region and a second pad region on the electrode pad, said first and second pad regions being constructed such that a larger stress is imposed on the second pad region than a stress imposed on the first pad region; and

at the time of forming the multilayer wiring layer, forming an interlayer insulating film in a region of the first wiring layer where the electrode pad and the first circuit region overlap each other in the planar view of the electrode pad.