Tunable resistance coatings
A method and article of manufacture of intermixed tunable resistance composite materials. A conducting material and an insulating material are deposited by such methods as ALD or CVD to construct composites with intermixed materials which do not have structure or properties like their bulk counterparts.
1. A method of tunably forming a film of selected resistance comprising:
selecting a starting conducting material and selecting a starting insulating material comprised of aluminum and fluorine;
performing deposition of the starting conducting material for a first prescribed number of cycles; and
performing deposition of the starting insulating material for a second prescribed number of cycles performing the deposition of the starting conducting and starting insulating material by circulating to intermix the layers at boundaries between the layers whereby the conducting and insulating materials are intimately intermixed with domains of the film do not exhibit bulk-like properties and do not form distinct layers of the conducting material and the insulating material, thereby achieving the selected resistance for an end product comprised of the conducting material and an aluminum fluoride compound.
2. The method as defined in claim 1 wherein the deposition step comprises an ALD process.
3. The method as defined in claim 1 wherein the deposition step comprises using a deposition method selected from the group of CVD, MOCVD, OMCVD, PECVD, PVD, MBE, reactive sputtering, PLD and evaporation.
4. The method as defined in claim 1 wherein the starting conducting material is selected from the group of metals, nitrides, sulphides and TCOs.
5. The method as defined in claim 4 wherein the metals are selected from the group of W and Mo.
6. The method as defined in claim 1 wherein the starting conducting material has a resistivity of about 10 −5 to 10Ω cm.
7. The method as defined in claim 1 wherein the deposited insulating material comprises aluminum fluoride trihydrate.
8. The method as defined in claim 7 wherein the starting insulating material comprises trimethyl aluminum and WF 6 .
9. The method as defined in claim 1 wherein the starting insulating material has a resistivity of about 10 6 to 10 15 Ω cm.
10. The method as defined in claim 1 wherein selected percentages of the deposited conducting material is less than selected percentage of the deposited insulating material.
11. The method as defined in claim 10 wherein the selected percentage of the starting conducting material ranges from about 6-12%.
12. The method as defined in claim 11 wherein the starting conducting material is selected from the group of W and Mo.
13. The method as defined in claim 12 wherein the selected starting insulating material AlO x and WF 6 .
14. The method as defined in claim 12 wherein the selected starting material is selected from the group of fluorides, nitrides, oxides and carbides.
15. An article of manufacture, comprising a thin film of composite intermixed materials including at least two materials selected from the group of an insulating material comprised of aluminum fluoride trihydrate and a conducting material with a pre-selected tuned electrical resistance associated with a percentage of deposition cycles of each of the insulating and the conducting materials which are intermixed and not distinct layers.
16. The article as defined in claim 15 wherein the composite materials include islands of the conducting material disposed between the insulating material.
17. The article as defined in claim 16 wherein the islands of conducting material consist essentially of W.
18. The article of manufacture as defined in claim 15 wherein layers of the insulating and the conducting material are intermixed to form a structure unlike a bulk form for each of the materials.
19. The article of manufacture as defined in claim 18 wherein the intermixed structure comprises an amorphous structure.