Semiconductor device
The present invention provides a technique for improving the reliability of a semiconductor device where spreading of cracking that occurs at the time of dicing to a seal ring can be restricted even in a semiconductor device with a low-k film used as an interlayer insulating film. Dummy vias are formed in each layer on a dicing region side. The dummy vias are formed at the same intervals in a matrix as viewed in a top view. Even in the case where cracking occurs at the time of dicing, the cracking can be prevented from spreading to a seal ring by the dummy vias. As a result, resistance to moisture absorbed in a circuit formation region can be improved, and deterioration in reliability can be prevented.
1. A semiconductor device comprising:
a plurality of interlayer insulating films;
a seal ring formed within said interlayer insulating films in the vicinity of an edge of a semiconductor chip so as to surround a circuit formation region of said semiconductor chip; and
a plurality of conductive members formed within said interlayer insulating film between a dicing cut surface of said semiconductor chip and said seal ring, wherein
said conductive members are arranged along a plurality of columns in the plan view in such a manner that said conductive members form a zigzag arrangement where said conductive members that are arranged in adjacent columns are arranged alternately,
said conductive members include a plurality of dummy vias,
said interlayer insulting films include a first interlayer insulating film and a second interlayer insulating film formed on said first interlayer insulating film,
said conductive members include:
a first dummy metal formed within said first interlayer insulating film; and
a second dummy metal formed within said second interlayer insulating film, and
said dummy vias are formed within said second interlayer insulating film and connect said first dummy metal and said second dummy metal.
2. The semiconductor device according to claim 1 , wherein each of the plurality of interlayer insulating films has a specific dielectric constant of 3 or less.