Method for making solar cell having crystalline silicon P—N homojunction and amorphous silicon heterojunctions for surface passivation
A thin silicon solar cell is described. An example solar cell may be fabricated from a crystalline silicon wafer having a thickness of approximately 50 micrometers to 500 micrometers. The solar cell comprises a first region having a p-n homojunction, a second region that creates heterojunction surface passivation, and a third region that creates heterojunction surface passivation. Amorphous silicon layers are deposited on both sides of the silicon wafer. A final layer of transparent conductive oxide is formed on both sides. Metal contacts are applied to the transparent conductive oxide.
1. A method for making a solar cell comprising:
forming a doped layer into a doped substrate, wherein the conductivity type of the doped layer is opposite the conductivity type of at least an adjacent portion of the doped substrate;
forming a first oxide layer on a first surface of the substrate proximate the doped layer and forming a second oxide layer on a second surface of the substrate opposite the doped layer;
removing the first and second oxide layers to expose the first and the second surfaces of the substrate;
forming a first undoped amorphous layer to the first surface of the substrate proximate the doped layer;
forming a second undoped amorphous layer to the second surface of the substrate opposite the doped layer;
forming a first doped amorphous layer on the first undoped amorphous layer, wherein the conductivity type of the first doped amorphous layer is the same as the conductivity type of the doped layer; and
forming a second doped amorphous layer on the second undoped amorphous layer, wherein the conductivity type of the second doped amorphous layer is opposite the conductivity type of the doped layer.
2. The method of claim 1 , wherein the substrate comprises crystalline silicon.
3. The method of claim 1 , wherein the first undoped amorphous layer and the second undoped amorphous layer are formed simultaneously.
4. The method of claim 1 , wherein the conductivity type of the doped layer of the substrate is p-type, wherein the conductivity type of the doped substrate is n-type, wherein the conductivity type of the first doped amorphous layer is p-type, and wherein the conductivity type of the second doped amorphous layer is n-type.
5. The method of claim 1 , wherein the conductivity type of the doped layer of the substrate is n-type, wherein the conductivity type of the doped substrate is p-type, wherein the conductivity type of the first doped amorphous layer is n-type, and wherein the conductivity type of the second doped amorphous layer is p-type.
6. The method of claim 1 , further comprising:
forming a first conductive oxide layer on the first doped amorphous layer; and
forming a second conductive oxide layer on the second doped amorphous layer.
7. The method of claim 6 , further comprising:
applying a first plurality of contacts to the first conductive oxide; and applying a second plurality of contacts to the second conductive oxide.
8. The method of claim 1 , wherein the doped layer comprises a diffused layer formed in a thermal cycle performed in a furnace.
9. A method for making a solar cell comprising:
forming a doped layer into a doped substrate, wherein the conductivity type of the doped layer is opposite the conductivity type of at least an adjacent portion of the doped substrate;
forming a first undoped amorphous layer to a first surface of the substrate proximate the doped layer;
forming a second undoped amorphous layer to a second surface of the substrate opposite the doped layer;
forming a first doped amorphous layer on the first undoped amorphous layer, wherein the conductivity type of the first doped amorphous layer is the same as the conductivity type of the doped layer; and
forming a second doped amorphous layer on the second undoped amorphous layer, wherein the conductivity type of the second doped amorphous layer is opposite the conductivity type of the doped layer.