Doping control by ALD surface functionalization
Systems and methods for producing a material of desired thickness. Deposition techniques such as atomic layer deposition are alter to control the thickness of deposited material. A funtionalization species inhibits the deposition reaction.
1. A method for producing a doped material of desired composition and thickness comprising the steps of:
selecting a surface functionalization species;
growing a first thickness of a host matrix material;
dosing a surface functionalization species for controlling dopant wherein the surface functionalization species is chemically different than the host matrix and a dopant precursor and the surface functionalization species being non-reactive with the dopant precursor; and
dosing the dopant precursor and wherein the surface functionalization species dose acts as a control for limiting precursor deposition on the first thickness of host matrix;
dosing a dopant precursor co-reactant forming dopant on a portion of the host matrix;
dosing a surface functionalization species co-reactant to react with the surface functionalization species to obtain a desired surface chemistry for deposition of one or more additional layers of host matrix material
thereby obtaining the doped material.
2. The method of claim 1 wherein the deposition system comprises an Atomic Layer Deposition system.
3. The method of claim 1 wherein the dopant is deposited using Atomic Layer Deposition to form a doped film.
4. The method of claim 1 further including the step of continuing cycling deposition of the surface functionalization species, dopant, dopant co-reactant and surface functionalization species co-reactant dose until achieving the desired thickness for the doped material.
5. The method as defined in claim 1 , wherein the dopant co-reactant is selected from the group consisting of water, ozone, oxygen, atomic oxygen, hydrogen peroxide, hydrogen, atomic hydrogen, hydrogen sulfide, ammonia, hydrazine, nitrous oxide, atomic nitrogen, and any combination thereof.
6. The method as defined in claim 1 , wherein the surface functionalization species co-reactant is selected from the group consisting of water, ozone, oxygen, atomic oxygen, hydrogen peroxide, hydrogen, atomic hydrogen, hydrogen sulfide, ammonia, hydrazine, nitrous oxide, atomic nitrogen, and any combination thereof.
7. The method as defined in claim 3 , where the method for growing the host matrix is selected from the group of sputtering, evaporation, chemical vapor deposition, pulsed laser deposition, plasma assisted chemical vapor deposition and atomic layer deposition.
8. The method as defined in claim 3 , where the surface functionalization species are selectively removed by a further step of providing a co-reactant.
9. The method as defined in claim 3 , wherein the surface functionalization species is selected to obtain a desired chemical environment for the dopant in the host matrix.
10. The method of claim 3 where more than one surface functionalization species are input to obtain a desired chemical environment for the dopant in the host matrix.
11. The method as defined in claim 10 , further including the step of inputting additional co-reactant doses after inputting the surface functionalization species to obtain a desired chemical environment for the dopant in the matrix host.
12. The method as defined in claim 3 , where the surface functionalization species and the host thickness are changed during growth of the doped film to produce a desired doping concentration profile.
13. The method of claim 3 wherein the doped material is selected from the group of a metal oxide, metal sulfide, metal chalcogenide, metal nitride, metal halide and a metal.
14. The method as defined in claim 3 , where the doped material comprises at least one of a transparent conducting oxide, a photoluminescent rare earth-doped metal oxide, a tunable resistance coating, a dielectric material for electronic devices, a wide-bandgap semiconducting material, or a catalyst.
15. The method as defined in claim 3 , where the surface functionalization species is selected from the group of alcohol, ketone, aldehyde, beta diketone, hydrogen halide, and carboxylic acid.
16. The method as defined in claim 3 wherein the dopant precursor is selected from the group consisting of trimethyl aluminum, diethyl zinc, titanium tetrachloride, titanium tetraisopropoxide, erbium (III) tris-tetramethylheptanedionate, europium (III) tris-tetramethylheptanedionate, tetrakisdimethylamino tin, tetrakisdimethylamino zirconium, and bis-cyclopentadientyl magnesium.
17. The method as defined in claim 3 further including the step of controlling deposition temperature of the deposition system and the temperature is selected in the range of 50-250° C.