Substrate supporting edge ring with coating for improved soak performance
Embodiments of the present invention provide a substrate supporting edge ring for supporting a substrate. In one embodiment, a substrate support ring is provided. The substrate support ring comprises an annular body. The annular body comprises an outer band extending radially inward from an outer annular sidewall; and a substrate supporting region extending inward from an inner portion of the outer band, wherein the annular body comprises a first material that is exposed and at least a portion of the substrate supporting region is covered with a coating comprising a second material that is different than the first material.
1. A substrate support ring, comprising:
an annular body, comprising:
an outer band extending radially inward in a plane from a first annular sidewall disposed outwardly of a second annular sidewall; and
a substrate supporting region extending inward from the second annular sidewall and below the plane of the outer band, wherein the annular body comprises a first material that is exposed and at least a portion of the substrate supporting region is covered with a coating comprising a second material that is different than the first material, wherein a plane of the substrate supporting region and the plane of the outer band are substantially parallel.
2. The ring of claim 1 , wherein the first material comprises silicon carbide.
3. The ring of claim 2 , wherein the second material comprises a refractory material.
4. The ring of claim 3 , wherein the refractory material is selected from the group consisting of a ceramic material, sapphire, and a carbon material.
5. The ring of claim 3 , wherein the refractory material is selected from the group consisting of an oxide film, a nitride film, and combinations thereof.
6. The ring of claim 5 , wherein the refractory material is selected from the group consisting of aluminum oxide (Al 2 O 3 ), beryllium oxide (BeO), zirconium dioxide (ZrO 2 ), hafnium oxide (HfO 2 ), yttrium oxide (Y 2 O 3 ), thorium oxide (ThO 2 ), scandium oxide (Sc 2 O 3 ), rare earth oxides, zirconium nitride (ZrN), hafnium nitride (HfN), and combinations thereof.
7. The ring of claim 1 , wherein the outer band comprises a silicon film.
8. The ring of claim 7 , wherein the silicon film comprises a film selected from the group consisting of amorphous silicon, monocrystalline silicon, and polycrystalline silicon.
9. The ring of claim 7 , wherein the silicon film comprises a first silicon layer, an oxide layer, and a second silicon layer disposed on the oxide layer.
10. The ring of claim 1 , wherein the annular body includes a lower surface having a film disposed thereon.
11. The ring of claim 1 , wherein the annular body includes a lower surface having a film disposed thereon.
12. A substrate support ring, comprising:
an annular body comprising a ceramic material, the annular body comprising:
a first annular sidewall;
an outer band extending radially outward from the first annular sidewall, the outer band comprising a first silicon layer, an oxide layer, and a second silicon layer disposed on the oxide layer;
a second annular sidewall coupled to the outer band; and
an inner lip extending radially inward from the first annular sidewall, the inner lip comprising a substrate supporting region, wherein the substrate supporting region consists of a film comprising a refractory material.
13. The ring of claim 12 , wherein the refractory material is selected from the group consisting of a ceramic material, sapphire, and a carbon material.
14. The ring of claim 13 , wherein the refractory material is selected from the group consisting of aluminum oxide (Al 2 O 3 ), beryllium oxide (BeO), zirconium dioxide (ZrO 2 ), yttrium oxide (Y 2 O 3 ), and combinations thereof.
15. The ring of claim 13 , wherein the refractory material comprises a hardness of 7 or greater on the Mohs scale.
16. The ring of claim 12 , wherein the film comprises a silicon film.
17. The ring of claim 16 , wherein the silicon film comprises a film selected from the group consisting of amorphous silicon, monocrystalline silicon, and polycrystalline silicon.
18. A substrate support ring, comprising:
an annular body comprising a first material, the annular body comprising:
a first annular sidewall;
an outer band extending radially outward from the first annular sidewall;
a second annular sidewall coupled to the outer band; and
an inner lip extending radially inward from the first annular sidewall, wherein a periphery of the annular body includes a coating comprising a second material that is different than the first material, wherein the inner lip comprises a substrate supporting region, and the substrate supporting region includes a film disposed over the coating.
19. The ring of claim 18 , wherein the first material comprises silicon carbide and the second material comprises a silicon film.
20. The ring of claim 19 , wherein the silicon film comprises a film selected from the group consisting of amorphous silicon, monocrystalline silicon, and polycrystalline silicon.
21. The ring of claim 20 , wherein the silicon film comprises a first silicon layer, an oxide layer, and a second silicon layer disposed on the oxide layer.
22. The ring of claim 18 , wherein the coating comprises a dielectric film stack comprising alternating layers of refractory material.
23. The ring of claim 18 , wherein the coating is continuous across the annular body.
24. The ring of claim 18 , wherein the coating is continuous across the substrate supporting region.
25. The ring of claim 18 , wherein the film is selected from the group consisting of a ceramic material, sapphire, and a carbon material.
26. The ring of claim 18 , wherein the film is selected from the group consisting of aluminum oxide (Al 2 O 3 ), beryllium oxide (BeO), zirconium dioxide (ZrO 2 ), yttrium oxide (Y 2 O 3 ), and combinations thereof.