Method of manufacturing single crystal 3C-SiC substrate and single crystal 3C-SiC substrate obtained from the manufacturing method
To provide a method of manufacturing a single crystal 3C-SiC substrate that can dramatically reduce surface defects generated in a processing of epitaxial growth and can secure a quality as a semiconductor device while simplifying a post process. The method of manufacturing a single crystal 3C-SiC substrate where a single crystal 3C-SiC layer is formed on a base substrate by epitaxial growth is provided. A first growing stage of forming the single crystal 3C-SiC layer to have a surface state configured with a surface with high flatness and surface pits scattering in the surface is performed. A second growing stage of further epitaxially growing the single crystal 3C-SiC layer obtained in the first growing stage so as to fill the surface pits is performed.
1. A method of manufacturing a single crystal 3C-SiC substrate where a single crystal 3C-SiC layer is formed on a base substrate by epitaxial growth, comprising:
a first growing stage of forming the single crystal 3C-SiC layer to have a surface state configured with a surface with high flatness and surface pits scattering in the surface; and
a second growing stage of further epitaxially growing the single crystal 3C-SiC layer obtained in the first growing stage so as to fill the surface pits,
wherein the epitaxial growth in the first growing stage is performed within a transport limited range, and the epitaxial growth in the second growing stage is performed within a desorption limited range.
2. A method of manufacturing a single crystal 3C-SiC substrate where a single crystal 3C-SIC layer is formed on a base substrate by epitaxial growth, comprising:
a first growing stage of forming the single crystal 3C-SIC layer to have a surface state configured with a surface with high flatness and surface pits scattering in the surface; and
a second growing stage of further epitaxially growing the single crystal 3C-SiC layer obtained in the first growing stage so as to fill the surface pits,
wherein the first growing stage is switched to the second growing stage by at least one of a reduction of a flow rate of material gas, a reduction of a filming pressure, and an increase of a substrate temperature.
3. The method of manufacturing the single crystal 3C-SiC substrate of claim 1 , wherein the base substrate configured with semiconductor crystals containing Si in at least a surface layer part is used.
4. The method of manufacturing the single crystal 3C-SiC substrate of claim 1 , wherein the base substrate configured with Si in at least a surface layer part is used, Si of the surface layer part of the base substrate is carbonized to be converted into an SiC layer, and epitaxial growths of the first and second growing stages are performed by having the SiC layer as a seed layer.
5. The method of manufacturing the single crystal 3C-SiC substrate of claim 1 , wherein a main component of material gas when the single crystal 3C-SiC layer is formed on the base substrate by the epitaxial growth is monomethylsilane.
6. A method of manufacturing a single crystal 3C-SiC substrate where a single crystal 3C-SiC layer is formed on a base substrate by epitaxial growth, comprising:
a first growing stage of forming the single crystal 3C-SiC layer to have a surface state configured with a surface with high flatness and surface pits scattering in the surface; and
a second growing stage of further epitaxially growing the single crystal 3C-SiC layer obtained in the first growing stage so as to fill the surface pits,
a main component of material gas when the single crystal 3C-SiC layer is formed on the base substrate by the epitaxial growth is monomethylsilane,
wherein in the first growing stage, a substrate temperature is between 970 and 1120° C., a flow rate of monomethylsilane to be contained in the material gas is between 1.0 and 30.0 sccm per wafer, and a filming pressure exceeds exceeds 9×10 −6 Torr and is 4×10 −1 Torr or below, and
wherein in the second growing stage, the flow rate of monomethylsilane to be contained in the material gas is 6.0 sccm or lower per wafer, the substrate temperature is between 1100° C. and below a melting temperature of the base substrate, and the filming pressure is between 1×10 −7 and 6×10 −5 Torr.
7. The method of manufacturing the single crystal 3C-SiC substrate of claim 2 , wherein the base substrate configured with semiconductor crystals containing Si in at least a surface layer part is used.
8. The method of manufacturing the single crystal 3C-SiC substrate of claim 2 , wherein the base substrate configured with Si in at least a surface layer part is used, Si of the surface layer part of the base substrate is carbonized to be converted into an SiC layer, and epitaxial growths of the first and second growing stages are performed by having the SiC layer as a seed layer.
9. The method of manufacturing the single crystal 3C-SiC substrate of claim 3 , wherein the base substrate configured with Si in at least a surface layer part is used, Si of the surface layer part of the base substrate is carbonized to be converted into an SiC layer, and epitaxial growths of the first and second growing stages are performed by having the SiC layer as a seed layer.
10. The method of manufacturing the single crystal 3C-SiC substrate of claim 7 , wherein the base substrate configured with Si in at least a surface layer part is used, Si of the surface layer part of the base substrate is carbonized to be converted into an SiC layer, and epitaxial growths of the first and second growing stages are performed by having the SiC layer as a seed layer.
11. The method of manufacturing the single crystal 3C-SiC substrate of claim 2 , wherein a main component of material gas when the single crystal 3C-SiC layer is formed on the base substrate by the epitaxial growth is monomethylsilane.
12. The method of manufacturing the single crystal 3C-SiC substrate of claim 3 , wherein a main component of material gas when the single crystal 3C-SiC layer is formed on the base substrate by the epitaxial growth is monomethylsilane.
13. The method of manufacturing the single crystal 3C-SiC substrate of claim 7 , wherein a main component of material gas when the single crystal 3C-SiC layer is formed on the base substrate by the epitaxial growth is monomethylsilane.
14. The method of manufacturing the single crystal 3C-SiC substrate of claim 4 , wherein a main component of material gas when the single crystal 3C-SiC layer is formed on the base substrate by the epitaxial growth is monomethylsilane.
15. The method of manufacturing the single crystal 3C-SiC substrate of claim 8 , wherein a main component of material gas when the single crystal 3C-SiC layer is formed on the base substrate by the epitaxial growth is monomethylsilane.
16. The method of manufacturing the single crystal 3C-SiC substrate of claim 9 , wherein a main component of material gas when the single crystal 3C-SiC layer is formed on the base substrate by the epitaxial growth is monomethylsilane.
17. The method of manufacturing the single crystal 3C-SiC substrate of claim 10 , wherein a main component of material gas when the single crystal 3C-SiC layer is formed on the base substrate by the epitaxial growth is monomethylsilane.
18. The method of manufacturing the single crystal 3C-SiC substrate of any one of claims 1 - 6 and 7 - 17 , wherein a main surface orientation of the single crystal 3C-SiC layer formed by the epitaxial growth on the base substrate is (111).