Magnetoresistive element
According to one embodiment, a magnetoresistive element comprises a storage layer having perpendicular magnetic anisotropy with respect to a film plane and having a variable direction of magnetization, a reference layer having perpendicular magnetic anisotropy with respect to the film plane and having an invariable direction of magnetization, a tunnel barrier layer formed between the storage layer and the reference layer and containing O, and an underlayer formed on a side of the storage layer opposite to the tunnel barrier layer. The reference layer comprises a first reference layer formed on the tunnel barrier layer side and a second reference layer formed opposite the tunnel barrier layer. The second reference layer has a higher standard electrode potential than the underlayer.
1. A magnetoresistive element comprising:
a storage layer having perpendicular magnetic anisotropy with respect to a film plane and having a variable direction of magnetization;
a reference layer having perpendicular magnetic anisotropy with respect to the film plane and having an invariable direction of magnetization;
a tunnel barrier layer formed between the storage layer and the reference layer and containing 0; and
an underlayer formed on a side of the storage layer opposite to the tunnel barrier layer,
wherein the reference layer comprises a first reference layer formed on the tunnel barrier layer side and a second reference layer formed opposite the tunnel barrier layer,
the second reference layer has a higher standard electrode potential than the underlayer, and
the storage layer and the first reference layer contain Co and Fe, and the storage layer has a lower Fe concentration than the first reference layer.
2. The element of claim 1 , wherein an O concentration in the tunnel barrier layer is constant.
3. The element of claim 1 , wherein the storage layer has a higher standard electrode potential than the first reference layer.
4. The element of claim 1 , wherein the second reference layer contains Pt, Pd, Ru, or W.
5. The element of claim 1 , wherein the underlayer contains Hf, Ta, Nb, Al, Ti, HfN, TaN, NbN, AlN, or TiN.
6. The element of claim 1 , wherein the underlayer has a greater film thickness than the storage layer.
7. The element of claim 1 , wherein the second reference layer has a greater film thickness than the first reference layer.
8. The element of claim 1 , wherein the tunnel barrier layer contains MgO, Al 2 O 3 , MgAlO, ZnO, or TiO.
9. A magnetoresistive element comprising:
a storage layer having perpendicular magnetic anisotropy with respect to a film plane and having a variable direction of magnetization;
a reference layer having perpendicular magnetic anisotropy with respect to a film plane and having an invariable direction of magnetization;
a tunnel barrier layer formed between the storage layer and the reference layer and containing O; and
an underlayer formed on a side of the storage layer opposite to the tunnel barrier layer and containing Hf, Ta, Nb, Al, Ti, HfN, TaN, NbN, AlN, or TiN,
wherein the reference layer comprises a first reference layer formed on the tunnel barrier layer side and a second reference layer formed opposite the tunnel barrier layer and containing Pt or Pd, and
the storage layer and the first reference layer contain Co and Fe, and the storage layer is equal to the first reference layer in Fe concentration.
10. The element of claim 9 , wherein the storage layer and the first reference layer have an Fe concentration of about 70 atm % or more.
11. The element of claim 9 , wherein an O concentration in the tunnel barrier layer is higher on the storage layer side than on the reference layer side.
12. The element of claim 9 , wherein the storage layer is equal to the first reference layer in standard electrode potential.
13. The element of claim 9 , wherein the second reference layer has a higher standard electrode potential than the underlayer.
14. The element of claim 9 , wherein the second reference layer contains Co and comprises a stack film of Pt or Pd and Co.
15. The element of claim 9 , wherein the underlayer has a greater film thickness than the storage layer.
16. The element of claim 9 , wherein the second reference layer has a greater film thickness than the first reference layer.
17. The element of claim 9 , wherein the tunnel barrier layer contains MgO, Al 2 O 3 , MgAlO, ZnO, or TiO.
18. A magnetoresistive element comprising:
a storage layer having perpendicular magnetic anisotropy with respect to a film plane and having a variable direction of magnetization;
a reference layer having perpendicular magnetic anisotropy with respect to the film plane and having an invariable direction of magnetization;
a tunnel barrier layer formed between the storage layer and the reference layer and containing 0; and
an underlayer formed on a side of the storage layer opposite to the tunnel barrier layer,
wherein the reference layer comprises a first reference layer formed on the tunnel barrier layer side and a second reference layer formed opposite the tunnel barrier layer, and
the second reference layer has a higher standard electrode potential than the underlayer.
19. The element of claim 18 , wherein the storage layer and the first reference layer contain Co and Fe, and the storage layer is equal to the first reference layer in Fe concentration.
20. The element of claim 18 , wherein an O concentration in the tunnel barrier layer is higher on the storage layer side than on the reference layer side.