IP Library › Granted Patent US 9,003,652
Granted Patent B2
US 9,003,652 · App. 13/400,207 · Granted Apr 14, 2015

Method of fabricating a circuit board

Inventors: Joel R. Goergen (Maple Grove, MN); Greg Hunt (San Jose, CA); Peter Tomaszewski (San Jose, TX); Joseph Pankow (Sunnyvale, CA); Michael Laudon (San Jose, CA)
Assignee: Dell Products L.P.
H05K1/111H05K1/0245H05K2201/0187H05K2201/0969
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Quick Facts
Patent No.
US 9,003,652
App. No.
13/400,207
Filed
Feb 20, 2012
Granted
Apr 14, 2015
Kind
B2
Art Unit
3729
USPC
29/846
Abstract

The characteristic impedance of a surface pad is manipulated by reticulating the pad and filling the spaces with a dielectric material, providing an inductive element in the coupling of the surface pad to an underlying ground pad of a ground plane, or a combination of these approaches. In appropriate embodiments, acceptable signal trace routing paths will exist in an embedded signal layer under the ground plane and crossing under the surface pad. Other embodiments are also described and claimed.

Claims (43)

1. A method of fabricating a circuit board, comprising:

patterning a surface pad on a surface conductive layer;

patterning at least one clearance in a conductive reference plane layer, the at least one clearance creating a reference pad, the reference pad connected to adjacent portions of the conductive reference plane layer by at least one conductive spoke adjacent the at least one clearance;

patterning a differential trace pair in an embedded conductive signal layer;

joining the surface conductive layer and the conductive reference plane layer to opposite sides of a first dielectric layer such that the reference plane layer underlies the first surface pad; and

joining the embedded conductive signal layer and the conductive reference plane layer to opposite sides of a second dielectric layer such that the differential trace pair passes under the first reference pad.

2. The method of claim 1 , further comprising:

forming a reticulation pattern in the surface pad.

3. The method of claim 2 , further comprising:

at least partially filling the reticulation pattern with a dielectric material.

4. The method of claim 1 , further comprising:

patterning a trace on the surface conductive layer; and

positioning a spoke of the at least one conductive spoke and the trace in relative alignment.

5. The method of claim 1 , further comprising:

the at least one clearance creating the reference pad connected to adjacent portions of the conductive reference plane layer by a first pair of conductive spokes oriented such that a first of the first pair of the conductive spokes overlies a first of the differential trace pair and a second of the first pair of the conductive spokes overlies a second of the different trace pair.

6. The method of claim 5 , further comprising:

the at least one clearance creating the reference pad connected to adjacent portions of the conductive reference plane layer by a second pair of conductive spokes oriented such that a first of the second pair of the conductive spokes overlies a first of the differential trace pair and a second of the second pair of the conductive spokes overlies a second of the different trace pair.

7. The method of claim 5 , further comprising:

wherein each of the first pair of conductive spokes includes an average width of at least 110% of the width of the different trace pair traces.

8. The method of claim 1 , wherein the patterning at least one clearance in the conductive reference plane layer includes providing a notch in at least one of the first reference pad or a portion of the reference plane layer that is adjacent the first reference pad and routing the at least one conductive spoke into the notch to connect the first reference pad to the portion of the reference plane layer that is adjacent the first reference pad.

9. The method of claim 1 , wherein the patterning the surface pad on the surface conductive layer includes providing an interior reticulated pattern in which a conductive material of the surface conductive layer is absent.

10. The method of claim 9 , further comprising:

filling the interior reticulated pattern with a dielectric material.

11. The method of claim 10 , wherein the providing the interior reticulated pattern includes orienting the interior reticulated pattern such that the interior reticulated pattern is aligned with a component when the component is coupled to the first surface pad.

12. The method of claim 11 , further comprising:

mounting a component to the first surface pad such that the component is aligned with the interior reticulated pattern.

13. The method of claim 11 , wherein the component includes two possible alignments, and wherein the interior reticulated pattern includes the intersection of two reticulation patterns that correspond respectively to the two possible alignments.

14. The method of claim 1 , further comprising:

patterning a plurality of proximate surface pads, wherein the first surface pad is one of the plurality of proximate surface pads, and wherein each of the plurality of proximate surface pads is aligned with a corresponding proximate reference pad patterned in the conductive reference plane layer and including at least one conductive spoke;

configuring a circuit board by attaching a component between a first proximate surface pad and a second proximate surface pad.

15. A method of setting an impedance characteristic of a surface pad on a circuit board, the method comprising:

positioning a conductive reference pad under the surface pad, the conductive reference pad located on a first plane layer that is separated from the surface pad by a first dielectric layer;

inductively coupling the conductive reference pad to a ground reference; and

positioning a differential trace pair under the conductive reference pad, the differential trace pair located on a second plane layer separated from the conductive reference pad by a second dielectric layer.

16. The method of claim 15 , further comprising:

patterning at least one opening in an interior portion of the surface pad, wherein the patterning the at least one opening reduces the capacitive coupling of the surface pad to the conductive reference pad.

17. The method of claim 16 , further comprising:

at least partially filling the at least one opening with a dielectric material.

18. The method of claim 15 , further comprising:

connecting the surface pad to a microstrip conductor on a surface of the circuit board, wherein the microstrip conductor is referenced to the ground reference and includes a first characteristic impedance, and wherein in at least one frequency range less than 1 GHz a characteristic impedance of the surface pad is less than the first characteristic impedance, and in at least one frequency range greater than 1 GHz the characteristic impedance of the surface pad is equal to or greater than the first characteristic impedance.

19. The method of claim 15 , further comprising:

coupling a component to the surface pad.

20. The method of claim 15 , wherein the conductive reference pad is separated from adjacent portions of the first plane layer by at least one clearance and is connected to adjacent portions of the first plane layer by at least one conductive spoke.

Assignments (14)
RELEASE OF SECURITY INTEREST IN PATENTS PREVIOUSLY RECORDED AT REEL/FRAME (053546/0001) Recorded Jun 23, 2022
From: THE BANK OF NEW YORK MELLON TRUST COMPANY, N.A., AS NOTES COLLATERAL AGENT
To: DELL MARKETING L.P. (ON BEHALF OF ITSELF AND AS SUCCESSOR-IN-INTEREST TO CREDANT TECHNOLOGIES, INC.); DELL INTERNATIONAL L.L.C.; DELL PRODUCTS L.P.; DELL USA L.P.; EMC CORPORATION; DELL MARKETING CORPORATION (SUCCESSOR-IN-INTEREST TO FORCE10 NETWORKS, INC. AND WYSE TECHNOLOGY L.L.C.); EMC IP HOLDING COMPANY LLC
Reel/Frame 071642/0001 →
RELEASE OF SECURITY INTEREST IN PATENTS PREVIOUSLY RECORDED AT REEL/FRAME (045455/0001) Recorded May 20, 2022
From: THE BANK OF NEW YORK MELLON TRUST COMPANY, N.A., AS NOTES COLLATERAL AGENT
To: DELL MARKETING CORPORATION (SUCCESSOR-IN-INTEREST TO ASAP SOFTWARE EXPRESS, INC.); DELL MARKETING L.P. (ON BEHALF OF ITSELF AND AS SUCCESSOR-IN-INTEREST TO CREDANT TECHNOLOGIES, INC.); DELL USA L.P.; DELL INTERNATIONAL L.L.C.; DELL PRODUCTS L.P.; DELL MARKETING CORPORATION (SUCCESSOR-IN-INTEREST TO FORCE10 NETWORKS, INC. AND WYSE TECHNOLOGY L.L.C.); EMC CORPORATION (ON BEHALF OF ITSELF AND AS SUCCESSOR-IN-INTEREST TO MAGINATICS LLC); EMC IP HOLDING COMPANY LLC (ON BEHALF OF ITSELF AND AS SUCCESSOR-IN-INTEREST TO MOZY, INC.); SCALEIO LLC
Reel/Frame 061753/0001 →
RELEASE OF SECURITY INTEREST IN PATENTS PREVIOUSLY RECORDED AT REEL/FRAME (040136/0001) Recorded Apr 26, 2022
From: THE BANK OF NEW YORK MELLON TRUST COMPANY, N.A., AS NOTES COLLATERAL AGENT
To: DELL MARKETING CORPORATION (SUCCESSOR-IN-INTEREST TO ASAP SOFTWARE EXPRESS, INC.); DELL MARKETING L.P. (ON BEHALF OF ITSELF AND AS SUCCESSOR-IN-INTEREST TO CREDANT TECHNOLOGIES, INC.); DELL USA L.P.; DELL INTERNATIONAL L.L.C.; DELL PRODUCTS L.P.; DELL MARKETING CORPORATION (SUCCESSOR-IN-INTEREST TO FORCE10 NETWORKS, INC. AND WYSE TECHNOLOGY L.L.C.); EMC CORPORATION (ON BEHALF OF ITSELF AND AS SUCCESSOR-IN-INTEREST TO MAGINATICS LLC); EMC IP HOLDING COMPANY LLC (ON BEHALF OF ITSELF AND AS SUCCESSOR-IN-INTEREST TO MOZY, INC.); SCALEIO LLC
Reel/Frame 061324/0001 →
RELEASE OF SECURITY INTEREST Recorded Nov 3, 2021
From: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH
To: ASAP SOFTWARE EXPRESS, INC.; AVENTAIL LLC; CREDANT TECHNOLOGIES, INC.; DELL USA L.P.; DELL INTERNATIONAL, L.L.C.; DELL MARKETING L.P.; DELL PRODUCTS L.P.; DELL SOFTWARE INC.; DELL SYSTEMS CORPORATION; EMC CORPORATION; EMC IP HOLDING COMPANY LLC; FORCE10 NETWORKS, INC.; MAGINATICS LLC; MOZY, INC.; SCALEIO LLC; WYSE TECHNOLOGY L.L.C.
Reel/Frame 058216/0001 →
SECURITY AGREEMENT Recorded Apr 22, 2020
From: CREDANT TECHNOLOGIES INC.; DELL INTERNATIONAL L.L.C.; DELL MARKETING L.P.; DELL PRODUCTS L.P.; DELL USA L.P.; EMC CORPORATION; FORCE10 NETWORKS, INC.; WYSE TECHNOLOGY L.L.C.; EMC IP HOLDING COMPANY LLC
To: THE BANK OF NEW YORK MELLON TRUST COMPANY, N.A.
Reel/Frame 053546/0001 →
SECURITY AGREEMENT Recorded Mar 21, 2019
From: CREDANT TECHNOLOGIES, INC.; DELL INTERNATIONAL L.L.C.; DELL MARKETING L.P.; DELL PRODUCTS L.P.; DELL USA L.P.; EMC CORPORATION; FORCE10 NETWORKS, INC.; WYSE TECHNOLOGY L.L.C.; EMC IP HOLDING COMPANY LLC
To: THE BANK OF NEW YORK MELLON TRUST COMPANY, N.A.
Reel/Frame 049452/0223 →
SECURITY AGREEMENT Recorded Sep 21, 2016
From: ASAP SOFTWARE EXPRESS, INC.; AVENTAIL LLC; CREDANT TECHNOLOGIES, INC.; DELL USA L.P.; DELL INTERNATIONAL L.L.C.; DELL MARKETING L.P.; DELL PRODUCTS L.P.; DELL SOFTWARE INC.; DELL SYSTEMS CORPORATION; EMC CORPORATION; EMC IP HOLDING COMPANY LLC; FORCE10 NETWORKS, INC.; MAGINATICS LLC; MOZY, INC.; SCALEIO LLC; SPANNING CLOUD APPS LLC; WYSE TECHNOLOGY L.L.C.
To: THE BANK OF NEW YORK MELLON TRUST COMPANY, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 040136/0001 →
SECURITY AGREEMENT Recorded Sep 21, 2016
From: ASAP SOFTWARE EXPRESS, INC.; AVENTAIL LLC; CREDANT TECHNOLOGIES, INC.; DELL USA L.P.; DELL INTERNATIONAL L.L.C.; DELL MARKETING L.P.; DELL PRODUCTS L.P.; DELL SOFTWARE INC.; DELL SYSTEMS CORPORATION; EMC CORPORATION; EMC IP HOLDING COMPANY LLC; FORCE10 NETWORKS, INC.; MAGINATICS LLC; MOZY, INC.; SCALEIO LLC; SPANNING CLOUD APPS LLC; WYSE TECHNOLOGY L.L.C.
To: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH, AS COLLATERAL AGENT
Reel/Frame 040134/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 14, 2016
From: BANK OF NEW YORK MELLON TRUST COMPANY, N.A., AS COLLATERAL AGENT
To: DELL MARKETING L.P.; ASAP SOFTWARE EXPRESS, INC.; APPASSURE SOFTWARE, INC.; COMPELLENT TECHNOLOGIES, INC.; CREDANT TECHNOLOGIES, INC.; DELL INC.; DELL PRODUCTS L.P.; DELL USA L.P.; DELL SOFTWARE INC.; FORCE10 NETWORKS, INC.; PEROT SYSTEMS CORPORATION; SECUREWORKS, INC.; WYSE TECHNOLOGY L.L.C.
Reel/Frame 040065/0618 →
RELEASE OF SECURITY INTEREST Recorded Sep 14, 2016
From: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
To: DELL MARKETING L.P.; ASAP SOFTWARE EXPRESS, INC.; APPASSURE SOFTWARE, INC.; COMPELLENT TECHNOLOGIES, INC.; CREDANT TECHNOLOGIES, INC.; DELL INC.; DELL PRODUCTS L.P.; DELL USA L.P.; DELL SOFTWARE INC.; FORCE10 NETWORKS, INC.; PEROT SYSTEMS CORPORATION; SECUREWORKS, INC.; WYSE TECHNOLOGY L.L.C.
Reel/Frame 040040/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 13, 2016
From: BANK OF AMERICA, N.A., AS ADMINISTRATIVE AGENT
To: DELL MARKETING L.P.; ASAP SOFTWARE EXPRESS, INC.; APPASSURE SOFTWARE, INC.; COMPELLANT TECHNOLOGIES, INC.; CREDANT TECHNOLOGIES, INC.; DELL INC.; DELL PRODUCTS L.P.; DELL USA L.P.; DELL SOFTWARE INC.; FORCE10 NETWORKS, INC.; PEROT SYSTEMS CORPORATION; SECUREWORKS, INC.; WYSE TECHNOLOGY L.L.C.
Reel/Frame 040065/0216 →
PATENT SECURITY AGREEMENT (ABL) Recorded Jan 2, 2014
From: DELL INC.; APPASSURE SOFTWARE, INC.; ASAP SOFTWARE EXPRESS, INC.; BOOMI, INC.; COMPELLENT TECHNOLOGIES, INC.; CREDANT TECHNOLOGIES, INC.; DELL MARKETING L.P.; DELL PRODUCTS L.P.; DELL SOFTWARE INC.; DELL USA L.P.; FORCE10 NETWORKS, INC.; GALE TECHNOLOGIES, INC.; PEROT SYSTEMS CORPORATION; SECUREWORKS, INC.; WYSE TECHNOLOGY L.L.C.
To: BANK OF AMERICA, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 031898/0001 →
PATENT SECURITY AGREEMENT (TERM LOAN) Recorded Jan 2, 2014
From: DELL INC.; APPASSURE SOFTWARE, INC.; ASAP SOFTWARE EXPRESS, INC.; BOOMI, INC.; COMPELLENT TECHNOLOGIES, INC.; CREDANT TECHNOLOGIES, INC.; DELL MARKETING L.P.; DELL PRODUCTS L.P.; DELL SOFTWARE INC.; DELL USA L.P.; FORCE10 NETWORKS, INC.; GALE TECHNOLOGIES, INC.; PEROT SYSTEMS CORPORATION; SECUREWORKS, INC.; WYSE TECHNOLOGY L.L.C.
To: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
Reel/Frame 031899/0261 →
PATENT SECURITY AGREEMENT (NOTES) Recorded Jan 2, 2014
From: APPASSURE SOFTWARE, INC.; ASAP SOFTWARE EXPRESS, INC.; BOOMI, INC.; COMPELLENT TECHNOLOGIES, INC.; CREDANT TECHNOLOGIES, INC.; DELL INC.; DELL MARKETING L.P.; DELL PRODUCTS L.P.; DELL SOFTWARE INC.; DELL USA L.P.; FORCE10 NETWORKS, INC.; GALE TECHNOLOGIES, INC.; PEROT SYSTEMS CORPORATION; SECUREWORKS, INC.; WYSE TECHNOLOGY L.L.C.
To: BANK OF NEW YORK MELLON TRUST COMPANY, N.A., AS FIRST LIEN COLLATERAL AGENT
Reel/Frame 031897/0348 →
Continuity (2)
Continuation 12001941 · Dec 13, 2007
Related Publication 20120144665A1 · Jun 14, 2012