Precision mechanical structure of an ultra-high-resolution spectrometer for inelastic X-ray scattering instrument

1. An ultrahigh-resolution spectrometer with a precision mechanical structure for positioning inelastic X-ray scattering optics comprising:

an X-ray monochromator;

an X-ray analyzer coupled to said X-ray monochromator;

each of said X-ray monochromator and said X-ray analyzer including X-ray optics of a collimating (C) crystal, a pair of dispersing (D) element crystals, an anomalous transmission filter (F), and a wavelength (W) selector crystal;

each of said X-ray monochromator and said X-ray analyzer including a respective precision mechanical structure; and

each of said respective precision mechanical structure including a base plate; positioning stages for D-crystal alignment; positioning stages including an incline sensor for C/F/W-crystal alignment; and said positioning stages including flexure-based high-stiffness structure.

2. The ultrahigh-resolution spectrometer as recited in claim 1 wherein said dispersing (D) element crystals includes a selected one of strain-free monolithic D-crystals and comb-style D-crystals.

3. The ultrahigh-resolution spectrometer as recited in claim 1 wherein said collimating (C) crystal, said anomalous transmission filter (F), and said wavelength (W) selector crystal perform collimation and wavelength-selection of an incident X-ray beam; and said collimating (C) crystal and wavelength (W) selector crystal include a silicon crystal about 300 μm thick.

4. The ultrahigh-resolution spectrometer as recited in claim 1 wherein base plate includes an aluminum base plate supporting said positioning stages for D-crystal alignment and said positioning stages including an incline sensor for C/F/W-crystal alignment.

5. The ultrahigh-resolution spectrometer as recited in claim 1 wherein said positioning stages for D-crystal alignment include flexure-based high-stiffness positioning structure to control dispersing (D) element crystal's pitch angle θ D coarse and fine motion, linear fine positioning L, and dispersing (D) element crystal's roll angle χ adjustment.

6. The ultrahigh-resolution spectrometer as recited in claim 1 wherein said positioning stages for D-crystal alignment include a rotary stage for D-crystal pitch alignment; said rotary stage including weak-link modules.

7. The ultrahigh-resolution spectrometer as recited in claim 1 wherein said positioning stages for D-crystal alignment include a high stiffness linear stage for D-crystal linear adjustment; said linear stage including linear weak-link modules.

8. The ultrahigh-resolution spectrometer as recited in claim 1 wherein said positioning stages for D-crystal alignment include a flexure tilting stage for D-crystal roll angle adjustment; said flexure tilting stage including a D-crystal holder.

9. The ultrahigh-resolution spectrometer as recited in claim 1 wherein said positioning stages for D-crystal alignment are stacked together for each of the D-crystals including flexure-based high-stiffness positioning structure to control the dispersing (D) element crystal's pitch angle θ D coarse and fine motion, linear fine positioning L, and the D-crystal's roll angle χ adjustment.

10. The ultrahigh-resolution spectrometer as recited in claim 1 wherein said positioning stages for D-crystal alignment include a stack of precision positioning stages including a lower PZT-driven sine bar rotary stage for pitch angle coarse and fine motion control alignment; a central high stiffness linear stage for D-crystal linear adjustment; and an upper flexure tilting stage for D-crystal roll angle adjustment.

11. The ultrahigh-resolution spectrometer as recited in claim 1 wherein said positioning stages including said incline sensor for C/F/W-crystal alignment include a thin film silicon C/F/W crystal holder.

12. The ultrahigh-resolution spectrometer as recited in claim 1 wherein said incline sensor includes a microelectromechanical systems (MEMS) inclinometer.

13. The ultrahigh-resolution spectrometer as recited in claim 1 wherein said positioning stages including said incline sensor for C/F/W-crystal alignment include a base support, a thin film silicon C/F/W crystal holder, a picomotor actuator, a grating optical encoder, and flexure pivots.

14. The ultrahigh-resolution spectrometer as recited in claim 1 wherein said ultrahigh-resolution spectrometer with the precision mechanical structure for positioning inelastic X-ray scattering optics provides spectral distributions of X-rays with shaped profiles with Gaussian-like, sharp tails and small bandwidth.

15. The ultrahigh-resolution spectrometer as recited in claim 1 wherein said ultrahigh-resolution spectrometer with the precision mechanical structure for positioning inelastic X-ray scattering optics provides enhanced performance capability.

16. The ultrahigh-resolution spectrometer as recited in claim 15 wherein said enhanced performance capability includes an energy resolution in a range of approximately 0.1-0.5 meV and momentum resolution in a range of approximately 0.01-0.1 nm −1 .

17. The ultrahigh-resolution spectrometer as recited in claim 1 wherein each of said X-ray monochromator and said X-ray analyzer includes a compact structure having structural stability in a nanometer scale.

18. A method for implementing an ultrahigh-resolution spectrometer with a precision mechanical structure for positioning inelastic X-ray scattering optics comprising:

providing an X-ray monochromator;

providing an X-ray analyzer coupled to said X-ray monochromator;

providing each of said X-ray monochromator and said X-ray analyzer with X-ray optics including a collimating (C) crystal, a pair of dispersing (D) element crystals, an anomalous transmission filter (F), and a wavelength (W) selector crystal;

providing a respective precision mechanical structure for each of said X-ray monochromator and said X-ray analyzer including

providing a base plate; and providing positioning stages for D-crystal alignment and providing positioning stages including an incline sensor for C/F/W-crystal alignment; and said positioning stages being mounted on said base plate and said positioning stages including flexure-based high-stiffness structure.

19. The method as recited in claim 18 wherein providing positioning stages for D-crystal alignment includes providing flexure-based high-stiffness positioning structure to control the dispersing (D) element crystal's pitch angle θ D coarse and fine motion, linear fine positioning L, and the D-crystal's roll angle χ adjustment.

20. The method as recited in claim 18 wherein providing positioning stages for D-crystal alignment includes providing a stack of positioning stages including a lower PZT-driven sine bar rotary stage for pitch angle coarse and fine motion control alignment; a central high stiffness linear stage for D-crystal linear adjustment; and an upper flexure tilting stage for D-crystal roll angle adjustment.