IP Library Granted Patent US 9,011,682
Granted Patent B2
US 9,011,682 · App. 13/206,624 · Granted Apr 21, 2015

Reverse osmosis device

Inventor: Manfred Volker (Blankenbach, DE)
C02F9/00C02F1/008C02F1/36C02F1/385C02F1/441C02F1/4602C02F1/4672C02F1/48C02F1/481C02F1/484C02F1/485C02F2001/46133C02F2001/46152C02F2103/026C02F2103/04C02F2201/003C02F2201/46115C02F2201/46175C02F2209/008C02F2209/04C02F2209/11C02F2301/026C02F2301/046C02F2303/04C02F2303/10C02F2303/16C02F2303/20C02F2303/22
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Quick Facts
Patent No.
US 9,011,682
App. No.
13/206,624
Granted
Apr 21, 2015
Kind
B2
Abstract

The device for producing ultrapure water according to the reverse osmosis principle, comprising a reverse osmosis filter which is subdivided by the RO membrane into a primary circuit and into a secondary circuit, and a pump for the primary circuit, and a flow resistance valve required downstream of the RO membrane for pressure build-up in the primary circuit is characterized in that at least one cleaning chamber with decalcifying ability and a discharge valve are located in the primary circuit and that the flow in the primary circuit is adjustable via a valve.

Claims (9)

1. A device for producing ultrapure water according to the reverse osmosis principle, comprising a reverse osmosis filter which is subdivided by a reverse osmosis membrane (RO membrane) into a primary circuit and into a secondary circuit, a pump upstream of the RO membrane and downstream of a buffer vessel having multiple inlets and an outlet wherein fluid exiting the buffer vessel can enter the pump before entering the RO membrane, a flow resistance valve in the primary circuit downstream of the RO membrane for pressure build-up in the RO membrane wherein fluid exiting the RO membrane can enter the flow resistance valve before entering the buffer vessel, at least one cleaning chamber with decalcification means downstream of the flow resistance valve and a centrifugal chamber downstream of the least one cleaning chamber and upstream of the buffer vessel wherein fluid exiting the flow resistance valve can enter the cleaning chamber and the centrifugal chamber before entering the buffer vessel, the centrifugal chamber having a bottom connected to a discharge valve, wherein the flow resistance valve can be opened by a motor to flush the surfaces of the liquid-conducting components.

2. The device according to claim 1 , wherein the cleaning chamber comprises capacitive and/or electromagnetic means.

3. The device according to claim 1 , wherein a partial stream of the primary circuit circulates via a circulation pump only through the membrane and a second said cleaning chamber.

4. The device according to claim 1 , wherein the cleaning chamber has three electrode connections.

5. The device according to claim 1 , wherein the cleaning chamber is provided with a coil for producing a magnetic field.

6. The device according to claim 1 , wherein the at least one cleaning chamber comprises two or more cleaning chambers connected in series or in parallel.

7. The device according to claim 1 , wherein the primary circuit includes an optical or opto-electrical calcification sensor.

8. A device for producing ultrapure water according to the reverse osmosis principle, comprising a reverse osmosis filter which is subdivided by a reverse osmosis membrane (RO membrane) into a primary circuit and into a secondary circuit, a pump upstream of the RO membrane and downstream of a buffer vessel having multiple inlets and an outlet wherein fluid exiting the buffer vessel can enter the pump before entering the RO membrane, a flow resistance valve in the primary circuit downstream of the RO membrane for pressure build-up in the RO membrane wherein fluid exiting the RO membrane can enter the flow resistance valve before entering the buffer vessel, at least one cleaning chamber with decalcification means downstream of the flow resistance valve and a centrifugal chamber downstream of the least one cleaning chamber and upstream of the buffer vessel wherein fluid exiting the flow resistance valve can enter the cleaning chamber and the centrifugal chamber before entering the buffer vessel, the centrifugal chamber having a bottom connected to a discharge valve, wherein the flow resistance valve has a fixed flow resistance and comprises a bypass valve that can be opened to flush the surfaces of the liquid-conducting components.

9. The device according to claim 8 , wherein the primary circuit can be flooded and flushed by opening one or both of the discharge and bypass valves.

Priority Claims (2)
DE 10 2010 035 680 · Aug 27, 2010 · national
DE 10 2010 048 616 · Oct 15, 2010 · national
Continuity (1)
Related Publication 20120048790A1 · Mar 1, 2012