Process chamber component having yttrium—aluminum coating
A substrate processing chamber component comprising a chamber component structure having an yttrium-aluminum coating. The yttrium-aluminum coating comprises a compositional gradient through a thickness of the coating.
1. A substrate processing chamber component comprising:
(a) a process chamber component structure composed of a metal alloy; and
(b) an yttrium-aluminum coating on the chamber component structure, the yttrium-aluminum coating having a compositional gradient through a thickness of the coating.
2. A component according to claim 1 wherein the chamber component structure and the yttrium-aluminum coating form a unitary and continuous structure.
3. A component according to claim 1 wherein the yttrium-aluminum coating comprises a thickness of from about 0.5 mil to about 8 mils.
4. A component according to claim 1 wherein the yttrium-aluminum coating comprises yttrium-aluminum oxide.
5. A component according to claim 1 wherein the yttrium-aluminum coating comprises YAG.
6. A component according to claim 1 wherein the yttrium-aluminum coating comprises a plasma sprayed coating.
7. A component according to claim 1 wherein the chamber component structure comprises a metal alloy composed of yttrium and aluminum.
8. A component according to claim 1 wherein the chamber component structure comprises an yttrium content of less than about 80% by weight.
9. A component according to claim 1 wherein the chamber component structure comprises a process chamber wall, a portion of an enclosure wall or wall liner, substrate support, substrate transport, gas supply, gas energizer or gas exhaust.
10. A substrate processing chamber component comprising:
(a) a process chamber component structure composed of a metal alloy; and
(b) a plasma sprayed coating on the chamber component structure, the coating composed of a metal alloy of yttrium and aluminum.
11. A component according to claim 10 wherein the coating comprises a compositional gradient through a thickness of the coating.
12. A component according to claim 10 wherein the coating further comprises yttrium-aluminum oxide.
13. A component according to claim 10 wherein the coating further comprises YAG.
14. A component according to claim 10 wherein the chamber component structure comprises a process chamber wall, a portion of an enclosure wall or wall liner, substrate support, substrate transport, gas supply, gas energizer or gas exhaust.
15. A substrate processing chamber component comprising:
(a) a process chamber component structure composed of a metal alloy; and
(b) an yttrium-aluminum coating on the chamber component structure, the yttrium-aluminum coating (i) composed of yttrium and aluminum, (ii) having a compositional gradient through a thickness of the coating, and (iii) forming a unitary and continuous structure with the chamber component structure.
16. A component according to claim 15 wherein the yttrium-aluminum coating comprises yttrium-aluminum oxide.
17. A component according to claim 15 wherein the yttrium-aluminum coating comprises a plasma sprayed coating.
18. A substrate processing chamber component comprising:
(a) a process chamber component structure composed of a metal alloy; and
(b) a plasma sprayed yttrium-aluminum coating on the chamber component structure, the yttrium-aluminum coating having a compositional gradient through a thickness of the coating.