Method for producing an antireflection coating
A method for producing an antireflection coating on a substrate is specified. A first nanostructure in a first material is formed using by means of a first plasma etching process. The first material is the material of the substrate or the material of a layer made of a first organic material applied onto the substrate. A layer made of a second material is applied onto the first nanostructure, the second material is an organic material. A second nanostructure is formed in the layer made of the second material using a second plasma etching process. The second material has a higher etching rate than the first material when carrying out the second plasma etching process.
1. A method for producing an antireflection coating on a substrate, the method comprising:
forming a first nanostructure in a first material using a first plasma etching process, wherein the first material is a material of the substrate or a material of a layer made of a first organic material applied onto the substrate;
applying a layer made of a second material onto the first nanostructure, wherein the second material is an organic material; and
forming a second nanostructure in the layer made of the second material using a second plasma etching process, wherein the second material has a higher etching rate than the first material when carrying out the second plasma etching process.
2. The method according to claim 1 , wherein the first nanostructure has a depth of between 100 nm and 200 nm.
3. The method according to claim 1 , wherein a refractive index gradient is generated in the first material by means of the first nanostructure such that the refractive index decreases with increasing distance from the substrate.
4. The method according to claim 1 , wherein the first nanostructure has a mean effective refractive index n 1 of between 1.25 and 1.4.
5. The method according to claim 1 , wherein the layer made of the second material is applied with a layer thickness of between 200 nm and 400 nm onto the first nanostructure.
6. The method according to claim 1 , wherein the second nanostructure has a depth of between 100 nm and 200 nm.
7. The method according to claim 1 , wherein a refractive index gradient is generated in the layer made of the second material by means of the second nanostructure such that the refractive index decreases with increasing distance from the substrate.
8. The method according to claim 1 , wherein the second nanostructure has a mean effective refractive index n 2 of between 1.08 and 1.25.
9. The method according to claim 1 , wherein the first nanostructure and/or the second nanostructure each have structure elements in the form of elevations, recesses and/or pores, the width of which on average is less than 150 nm.
10. The method according to claim 1 , further comprising applying an etch stop layer onto the first nanostructure before applying the layer made of the second material, wherein the etch stop layer has a thickness of no more than 30 nm.
11. The method according to claim 1 , further comprising applying a protection layer onto the second nanostructure after generating the second nanostructure, wherein the protection layer has a thickness of no more than 30 nm.
12. The method according to claim 1 , wherein the first material is the material of the substrate and the substrate comprises PMMA, polycarbonate, a cycloolefin, polyamide or PTFE.
13. The method according to claim 1 , wherein the first material is the material of a layer made of a first organic material applied onto the substrate.
14. The method according to claim 1 , wherein the substrate is a curved substrate.
15. The method according to claim 1 , wherein the substrate has a refractive index n s <1.7.