Resist composition, method of forming resist pattern and compound

1. A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, comprising:

a base component (A) which exhibits changed solubility in a developing solution under action of acid;

an acid generator component (B) comprising a compound represented by general formula (b-1) shown below:

wherein the R 101 —Y 101 —V 101 —CR 102 F—SO 3 − in the general formula (b-1) is at least one anion moiety represented by any one of formulae (an-1) to (an-3) shown below:

wherein M′ m+ re resents an organic cation having a valency of m: R″ 101 represents an aliphatic cyclic group which may have a substituent, a group represented by any one of formulae (r-hr-1) to (r-hr-6) shown below or a chain-like alkyl group which may have a substituent; R″ 102 represents an aliphatic cyclic group which may have a substituent, a lactone-containing cyclic got represented by any one of formulae (a2-r-1) to (a2-r-7) shown below or an —SO 2 — containing cyclic group represented by an one of formulae (a5-r-1) to (a5-r-4) shown below; R″ 103 represents an aromatic cyclic group which may have a substituent, an aliphatic cyclic group which may have a substituent or a chain-like alkenyl group which ma have a substituent V″ 101 represents a fluorinated alkylene group; L″ 101 represents —C(═O)— or —SO 2 —; v″ each independently represents an integer of 0 to 3; q″ each independently represents an integer of 1 to 20; and n″ represents 0 or 1:

wherein * represents a valence bond:

wherein each Ra′ 21 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, —COOR″—OC(═O)R″, a hydroxyalkyl group or a cyano group; R″ represents a hydrogen atom or an alkyl group; A″ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom; n′ represents an integer of 0 to 2; m′ represents 0 or 1; and * represents a valence bond:

wherein each Ra′ 51 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, —COOR″, —OC(═O)R″, a hydroxyalkyl group or a cyano group; R″ represents a hydrogen atom or an alkyl group; A″ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom; n′ represents an integer of 0 to 2; and * represents a valence bond; and

a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below:

wherein R 1 represents a cyclic aliphatic hydrocarbon group represented by any one of formulae (r-lc-1-1) to (r-lc-1-2), (r-lc-2-1), (r-lc-2-7), (r-lc-6-1), (r-lc-7-1), (r-sl-1-1) and (r-sl-1-18) shown below:

Y 1 represents a single bond or a divalent linking group; R 2 and R 3 each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom; one of R 2 and R 3 may form a ring with Y′; M m+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.

2. The resist composition according to claim 1 , wherein the base component (A) comprises a resin compound (A1) which comprises a structural unit (a1) containing an acid decomposable group that exhibits increased polarity by the action of acid.

3. The resist composition according to claim 1 , wherein Y 1 represents a single bond or an alkylene group of 1 to 5 carbon atoms which may have a substituent.

4. The resist composition according to claim 1 , wherein R 2 and R 3 each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a substituted or unsubstituted amino group, an alkoxy group, an aryloxy group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, an acylamino group, an alkoxycarbonylamino group, and aryloxycarbonylamino group, a sulfonylamino group, a hydroxy group, a mercapto group, a chlorine atom, a bromine atom, an iodine atom, a cyano group, a sulfo group, a carboxyl group, a nitro group, a hydroxamic acid group, a sulfino group, a hydrazino group, an imino group, a heterocyclic group, or a silyl group.

5. The resist composition according to claim 1 , wherein R 2 and R 3 each represents a hydrogen atom.

6. The resist composition according to claim 1 , wherein V″ 101 represents —CF 2 —, —CF 2 CF 2 —, —CHFCF 2 —, —CF(CF 3 )CF 2 — or —CH(CF 3 )CF 2 —.

7. A method of forming a resist pattern, comprising: forming a resist film on a substrate using a resist composition of claim 1 ; conducting exposure of the resist film; and

developing the resist film to form a resist pattern.