Display device and method of manufacturing the same
A display device and a method of manufacturing the same. The display device includes a substrate, an organic light emitting diode (OLED) arranged on the substrate, a thin film encapsulation layer arranged on the substrate to cover the OLED and including an inorganic material layer and an organic material layer, and an anti-reflection layer arranged on the thin film encapsulation layer and including a dielectric layer and a metal layer.
1. A display device, comprising:
a substrate;
an organic light emitting diode (OLED) arranged on the substrate;
a thin film encapsulation layer arranged on the substrate to cover the OLED; and
an anti-reflection layer arranged on the thin film encapsulation layer and including at least one dielectric layer and at least one metal layer,
wherein the at least one dielectric layer and the at least one metal layer are alternately stacked.
2. The display device of claim 1 , wherein the anti-reflection layer comprises at least two dielectric layers and at least two metal layers, wherein ones of the dielectric layers and ones of the metal layers are alternately stacked.
3. The display device of claim 1 , wherein the at least one dielectric layer includes at least one material selected from a group consisting of SiO 2 , TiO 2 , ZrO 2 , Ta 2 O 5 , HfO 2 , Al 2 O 3 , ZnO, Y 2 O 3 , BeO, MgO, PbO 2 , WO 3 , VO x , SiN x , eN x , AlN, ZnS, CdS, SiC, SiCN, MgF, CaF 2 , NaF, BaF 2 , PbF 2 , LiF, LaF 3 , and GaP.
4. The display device of claim 1 , wherein the at least one metal layer includes at least one metal selected from a group consisting of Al, Ag, Mg, Cr, Ti, Ni, Au, Ta, Cu, Ca, Co, Fe, Mo, W, Pt, and Yb.
5. The display device of claim 1 , wherein the thin film encapsulation layer includes at least one inorganic material layer.
6. The display device of claim 5 , wherein the at least one inorganic material layer comprises at least one material selected from a group consisting of silicon nitride, aluminum nitride, zirconium nitride, titanium nitride, hafnium nitride, tantalum nitride, silicon oxide, aluminum oxide, titanium oxide, tin oxide, cerium oxide and silicon oxynitride (SiON).
7. The display device of claim 5 , wherein the thin film encapsulation layer further comprises at least one organic material layer.
8. The display device of claim 7 , wherein the thin film encapsulation layer comprises a plurality of inorganic material layers and a plurality of organic material layers, wherein ones of the inorganic material layers and ones of the organic material layers are alternately stacked.
9. The display device of claim 7 , wherein the at least one organic material layer include at least one material selected from a group consisting of epoxy resin, acryl resin, perylene resin and polyimide resin.
10. The display device of claim 1 , further comprising an interference preventing layer arranged between the thin film encapsulation layer and the anti-reflection layer.
11. The display device of claim 10 , wherein the interference preventing layer is comprised of a transparent material.
12. The display device of claim 10 , wherein the interference preventing layer has a thickness in a range of 100 nm to 10 μm.
13. The display device of claim 1 , further comprising a thin film transistor (TFT) to drive the OLED.
14. The display device of claim 13 , wherein the TFT comprises an active layer comprised of a material selected from a group consisting of amorphous silicon, polycrystalline silicon and an oxide.
15. A method of manufacturing a display device, comprising:
forming an organic light emitting diode (OLED) on a substrate;
forming a thin film encapsulation layer on the substrate to cover the OLED; and
forming an anti-reflection layer on the thin film encapsulation layer, the anti-reflection layer including at least one dielectric layer and at least one metal layer,
wherein the at least one dielectric layer and the at least one metal layer are alternately stacked.
16. The method of claim 15 , wherein the forming of the thin film encapsulation layer comprises forming at least one inorganic material layer.
17. The method of claim 16 , wherein the at least one inorganic material layer comprises at least one material selected from a group consisting of silicon nitride, aluminum nitride, zirconium nitride, titanium nitride, hafnium nitride, tantalum nitride, silicon oxide, aluminum oxide, titanium oxide, tin oxide, cerium oxide and silicon oxynitride (SiON).
18. The method of claim 15 , wherein the forming of the thin film encapsulation layer comprises forming a plurality of inorganic material layers and a plurality of organic material layers, wherein ones of the inorganic material layers and ones of the organic material layers are alternately stacked on each other.
19. The method of claim 18 , wherein each of the organic material layers include at least one material selected from a group consisting of epoxy resin, acryl resin, perylene resin and polyimide resin.
20. The method of claim 15 , wherein the forming of the anti-reflection layer comprises forming at least two dielectric layers and at least two metal layers, wherein ones of the dielectric layers and ones of the metal layers are alternately stacked on each other.
21. The method of claim 20 , wherein each of the dielectric layers include at least one material selected from a group consisting of SiO 2 , TiO 2 , ZrO 2 , Ta 2 O 5 , HfO 2 , Al 2 O 3 , ZnO, Y 2 O 3 , BeO, MgO, PbO 2 , WO 3 , VO x , S 1 N x , eN x , AlN, ZnS, CdS, SiC, SiCN, MgF, CaF 2 , NaF, BaF 2 , PbF 2 , LiF, LaF 3 , and GaP.
22. The method of claim 20 , wherein each of the metal layers include at least one material selected from a group consisting of Al, Ag, Mg, Cr, Ti, Ni, Au, Ta, Cu, Ca, Co, Fe, Mo, W, Pt, and Yb.
23. The method of claim 15 , further comprising an interference preventing layer interposed between the thin film encapsulation layer and the anti-reflection layer.
24. The method of claim 23 , wherein the interference preventing layer is comprised of a transparent material.