IP Library Granted Patent US 9,055,660
Granted Patent B2
US 9,055,660 · App. 13/596,026 · Granted Jun 9, 2015

System and method for plasma generation

Inventor: Jack Hunt (Covert, MI)
H05H1/46H05H2001/4682H05H1/10
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Quick Facts
Patent No.
US 9,055,660
App. No.
13/596,026
Granted
Jun 9, 2015
Kind
B2
Abstract

A system and method for generating a plasma. An embodiment of the system for generating a plasma may include a first electrode; a second electrode disposed adjacent the first electrode; a first power supply for supplying power at the second electrode; a second power supply for generating a magnetic field; and a sequencer for coordinating a discharge of power from the first power supply and a discharge of power from the second power supply. The first power supply may be configured such that the discharge of power from the first power supply generates a plasma between the first electrode and the second electrode. The second power supply may be configured such that the magnetic field generated by the discharge of power from the second power supply rotates the plasma.

Claims (21)

1. A system for generating a plasma comprising:

a first electrode;

a second electrode;

a first power supply for supplying power at the second electrode;

a second power supply for generating a magnetic field;

a sequencer for coordinating a discharge of power from the first power supply and a discharge of power from the second power supply;

a ring magnet, the ring magnet having windings surrounding the ring magnet;

wherein the first power supply is configured such that the discharge of power from the first power supply generates a plasma between the first electrode and the second electrode; and

wherein the second power supply discharges power into the windings, and the second power supply is configured such that the magnetic field generated by the discharge of power from the second power supply rotates the plasma.

2. The system of claim 1 , wherein the sequencer triggers the first power supply and the second power supply such that a peak output of the first power supply occurs at substantially the same time as a peak output of the second power supply.

3. The system of claim 2 , wherein the sequencer triggers the first power supply and the second power supply such that a peak output of the first power supply occurs within approximately one millisecond of a peak output of the second power supply.

4. The system of claim 2 , wherein the impedance circuit matches an impedance of the first power supply to an impedance of the second electrode and a gap between the first electrode and the second electrode.

5. The system of claim 1 , further comprising an impedance circuit disposed between the first power supply and the second electrode.

6. The system of claim 1 , wherein the first power supply comprises a third power supply and a fourth power supply.

7. The system of claim 6 , wherein the third power supply supplies a voltage and the fourth power supply supplies a current.

8. The system of claim 1 , wherein the second electrode is disposed within a boundary of the first electrode.

9. The system of claim 1 , wherein the first electrode is configured as a loop.

10. The system of claim 1 , wherein the first power supply is connected to a first side of the impedance circuit and the second electrode is connected to a second side of the impedance circuit.

11. The system of claim 1 , further comprising a detection device for detecting an object in a vicinity of the first electrode.

12. The system of claim 11 , wherein the detection device triggers the sequencer.

13. The system of claim 11 , wherein the detection device initiates a modulation of the first power supply.

Assignments (7)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 26, 2019
From: JH PLASMA, INC.
To: PLASSEIN TECHNOLOGIES LTD.
Reel/Frame 049875/0471 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 14, 2019
From: JH QUANTUM TECHNOLOGY, INC.
To: PLASSEIN TECHNOLOGIES LTD.
Reel/Frame 048333/0450 →
LICENSE Recorded Jun 22, 2017
From: JH QUANTUM TECHNOLOGY, INC.
To: PLASSEIN TECHNOLOGIES LIMITED, LLC
Reel/Frame 042961/0686 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 27, 2017
From: JH QUANTUM TECHNOLOGY, INC.
To: PLASSEIN TECHNOLOGIES LTD, LLC
Reel/Frame 042005/0714 →
CHANGE OF NAME Recorded Feb 27, 2017
From: JH QUANTUM TECHNOLOGY, INC.
To: JH PLASMA, INC.
Reel/Frame 041823/0894 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 27, 2017
From: HUNT, JACK A.
To: JH QUANTUM TECHNOLOGIES, INC.
Reel/Frame 041386/0782 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 27, 2017
From: HUNT, JACK A
To: JH QUANTUM TECHNOLOGY, INC.
Reel/Frame 041387/0145 →
Continuity (3)
Continuation 11330297 · Jan 11, 2006
Continuation In Part 10934154 · Sep 3, 2004
Related Publication 20130175245A1 · Jul 11, 2013