Negative photosensitive resin composition, pattern formation method, and liquid discharge head
A photosensitive resin composition includes a cationically polymerizable compound, a photoacid generating agent having an anion portion and a cation portion, and a salt having a cation portion having either one of a quaternary ammonium structure and a quaternary phosphonium structure and an anion portion, wherein the anion portion of the salt is exchanged with the anion portion of a first acid derived from the anion portion of the photoacid generating agent to form a second acid having acid strength that is lower than acid strength of the first acid.
1. A photosensitive resin composition comprising:
a cationically polymerizable compound;
a photoacid generating agent having an anion portion and a cation portion; and
a salt having a cation portion having either one of a quaternary ammonium structure and a quaternary phosphonium structure and an anion portion,
wherein the anion portion of the salt is exchanged with the anion portion of a first acid derived from the anion portion of the photoacid generating agent to form a second acid having acid strength that is lower than acid strength of the first acid,
wherein the photoacid generating agent includes a plurality of types of compounds, and a number of moles of the salt is larger than ¼ times of a number of moles of the photoacid generating agent generating the acid having the highest acid strength among the plurality of types of compounds.
2. The photosensitive resin composition according to claim 1 , wherein the second acid formed by the salt is a fluorine atom-containing antimonic acid, a fluorine atom-containing phosphoric acid, a fluorine atom-containing boric acid, a fluorine atom-containing sulfonic acid, or a carboxylic acid.
3. The photosensitive resin composition according to claim 1 , wherein the photoacid generating agent includes a plurality of types of compounds, and a number of moles of the salt is larger than ½ times of a number of moles of the photoacid generating agent generating the acid having the highest acid strength among the plurality of types of compounds.
4. The photosensitive resin composition according to claim 1 , wherein the photoacid generating agent includes a plurality of types of compounds, and a number of moles of the salt is larger than a number of moles of the photoacid generating agent generating the acid having the highest acid strength among the plurality of types of compounds.
5. The photosensitive resin composition according to claim 1 , further comprising an amine compound.
6. The photosensitive resin composition according to claim 1 , wherein the cationically polymerizable compound is an epoxy resin.
7. The photosensitive resin composition according to claim 1 , wherein the second acid is a fluorine atom-containing antimonic acid, a fluorine atom-containing phosphoric acid, or a fluorine atom-containing boric acid.
8. A pattern formation method comprising:
preparing a substrate on which a photosensitive resin composition is provided, the photosensitive resin composition comprising a cationically polymerizable compound, a photoacid generating agent having an anion portion and a cation portion, and a salt having a cation portion having either one of a quaternary ammonium structure and a quaternary phosphonium structure and an anion portion, wherein the anion portion of the salt is exchanged with the anion portion of a first acid derived from the anion portion of the photoacid generating agent to form a second acid having acid strength that is lower than acid strength of the first acid;
exposing a part of the photosensitive resin composition to light to cure the exposed part; and
heating the cured part obtained by the curing,
wherein the photoacid generating agent includes a plurality of types of compounds, and a number of moles of the salt is larger than ¼ times of a number of moles of the photoacid generating agent generating the acid having the highest acid strength among the plurality of types of compounds.
9. The pattern formation method according to claim 8 , wherein the second acid formed by the salt is a fluorine atom-containing antimonic acid, a fluorine atom-containing phosphoric acid, a fluorine atom-containing boric acid, a fluorine atom-containing sulfonic acid, or a carboxylic acid.
10. The pattern formation method according to claim 8 , wherein the cationically polymerizable compound is an epoxy resin.
11. A liquid discharge head comprising:
a discharge port member provided with a discharge port for discharging a liquid,
wherein the discharge port member is formed of a cured matter of a resin composition comprising a cationically polymerizable compound, a photoacid generating agent having an anion portion and a cation portion, and a salt having a cation portion having either one of a quaternary ammonium structure and a quaternary phosphonium structure and an anion portion, wherein the anion portion of the salt is exchanged with the anion portion of a first acid derived from the anion portion of the photoacid generating agent to form a second acid having acid strength that is lower than acid strength of the first acid, and
wherein the photoacid generating agent includes a plurality of types of compounds, and a number of moles of the salt is larger than ¼ times of a number of moles of the photoacid generating agent generating the acid having the highest acid strength among the plurality of types of compounds.
12. The liquid discharge head according to claim 11 , wherein the second acid formed by the salt is a fluorine atom-containing antimonic acid, a fluorine atom-containing phosphoric acid, a fluorine atom-containing boric acid, a fluorine atom-containing sulfonic acid, or a carboxylic acid.
13. The liquid discharge head according to claim 11 , wherein the cationically polymerizable compound is an epoxy resin.