Glass substrate for flat panel display and manufacturing method thereof
A flat panel display glass substrate includes a glass comprising, in mol %, 55-80% SiO 2 , 3-20% Al 2 O 3 , 3-15% B 2 O 3 , and 3-25% RO (the total amount of MgO, CaO, SrO, and BaO). The contents in mol % of SiO 2 , Al 2 O 3 , and B 2 O 3 satisfy a relationship (SiO 2 +Al 2 O 3 )/(B 2 O 3 )=7.5-17. The strain point of the glass is 665° C. or more. The devitrification temperature of the glass is 1250° C. or less. The substrate has a heat shrinkage rate of 75 ppm or less. The rate of heat shrinkage is calculated from the amount of shrinkage of the substrate measured after a heat treatment which is performed at a rising and falling temperature rate of 10° C./min and at 550° C. for 2 hours by the rate of heat shrinkage (ppm)={the amount of shrinkage of the substrate after the heat treatment/the length of the substrate before the heat treatment}×10 6 .
1. A method for manufacturing a display glass substrate, the method comprising:
a melting step of melting a glass material for a glass comprising, as expressed in mol %, 55-80% SiO 2 , 3-20% Al 2 O 3 , 3-15% B 2 O 3 , and 3-25% RO (the total amount of MgO, CaO, SrO, and BaO), with the contents in mol % of SiO 2 , Al 2 O 3 , and B 2 O 3 satisfying a relationship (SiO 2 +Al 2 O 3 )/(B 2 O 3 )=7.5-17, the strain point of the glass being 685° C. or more, and the devitrification temperature of the glass being 1250° C. or less, to produce a molten glass;
a forming step of forming the molten glass into a glass plate; and
an annealing step of annealing the glass plate,
wherein
the glass plate has a rate of heat shrinkage of 75 ppm or less, and
the rate of heat shrinkage is calculated from the amount of shrinkage of the glass plate measured after a heat treatment which is performed at a rising and falling temperature rate of 10° C./min and at 550° C. for 2 hours by:
the rate of heat shrinkage (ppm)={the amount of shrinkage of the glass substrate after the heat treatment/the length of the glass substrate before the heat treatment}×10 6 .
2. The method for manufacturing a display glass substrate according to claim 1 , wherein
in the melting step, the molten glass is produced to have a β-OH of 0.05-0.40 mm −1 .
3. The method for manufacturing a display glass substrate according to claim 1 , wherein
in the annealing step, the glass plate is cooled at an average rate of 50-300° C./min within the temperature range of the glass transition temperature (Tg) to Tg−100° C.
4. The method for manufacturing a display glass substrate according to claim 1 , wherein
in the glass, the contents in mol % of SrO and BaO satisfy SrO+BaO=0-5%.
5. A method for manufacturing a display glass substrate, the method comprising:
a melting step of melting a glass material for a glass comprising, as expressed in mol %, 55-80% SiO 2 , 3-20% Al 2 O 3 , 3-15% B 2 O 3 , and 3-25% RO (the total amount of MgO, CaO, SrO, and BaO), with the contents in mol % of SiO 2 , Al 2 O 3 , and B 2 O 3 satisfying a relationship (SiO 2 +Al 2 O 3 )/(B 2 O 3 )=8.45-17.0, the strain point of the glass being 685° C. or more, and the devitrification temperature of the glass being 1250° C. or less, to produce a molten glass;
a forming step of forming the molten glass into a glass plate; and
an annealing step of annealing the glass plate,
wherein
the glass plate has a rate of heat shrinkage of 60 ppm or less, and
the rate of heat shrinkage is calculated from the amount of shrinkage of the glass plate measured after a heat treatment which is performed at a rising and falling temperature rate of 10° C./min and at 550° C. for 2 hours by:
the rate of heat shrinkage (ppm)={the amount of shrinkage of the glass plate after the heat treatment/the length of the glass plate before the heat treatment}×10 6 .
6. The method for manufacturing a display glass substrate according to claim 5 , wherein
in the melting step, the molten glass is produced to have a β-OH of 0.05-0.40 mm −1 .
7. The method for manufacturing a display glass substrate according to claim 5 , wherein
in the annealing step, the glass plate is cooled at an average rate of 50-300° C./min within the temperature range of the glass transition temperature (Tg) to Tg−100° C.
8. The method for manufacturing a display glass substrate according to claim 5 , wherein
in the glass, the contents in mol % of SrO and BaO satisfy SrO+BaO=0-5%.