Method for high throughput, high volume manufacturing of biomolecule micro arrays

1. An apparatus configured to make a biomolecule microarray without human intervention, the apparatus comprising a track system, the track system being configured for inline processing and comprising a spacer attachment module adapted to attach a linker to a substrate surface of the biomolecule microarray, a coupling module adapted to couple a molecule to the linker, the molecule being a nucleotide or an amino acid and respectively being capable of forming an amide bond or a phosphodiester bond when the molecule is not bound to a protecting group that respectively prevents the formation of the amide or phosphodiester bond, the molecule being bound to the protecting group, and a deprotection module adapted to create deprotection of the protecting group with a radiation exposure of about 1-50 mJ/cm 2 ;

wherein the deprotection of the protecting group is by generating photo acid in a photoresist comprising poly methyl methacrylate, Bis(4-tert-butylphenyl)iodonium triflate and isopropylthioxanthenone in propylene glycol methyl ether acetate.

2. The apparatus of claim 1 , wherein the spacer attachment module comprises a developer module and a hot plate module adapted to cure the linker on the substrate surface.

3. The apparatus of claim 2 , wherein the developer module is adapted with a puddle mechanism and a spin-wash mechanism.

4. The apparatus of claim 2 , wherein the spacer attachment module further comprises a chill plate module.

5. The apparatus of claim 1 , wherein the spacer attachment module comprises a vapor prime module and a hot plate module adapted to cure the linker on the substrate surface.

6. The apparatus of claim 5 , wherein the vapor prime module is a hexamethyldisilazane (HMDS) vapor prime module.

7. The apparatus of claim 5 , wherein the spacer attachment module further comprises a chill plate module.

8. The apparatus of claim 1 , wherein the coupling module comprises a developer module.

9. The apparatus of claim 8 , wherein the developer module is adapted with a puddle mechanism and a spin-wash mechanism.

10. The apparatus of claim 8 , wherein the developer module is adapted with a mechanism to cap an unreacted linker on the substrate surface.

11. The apparatus of claim 1 , wherein the deprotection module comprises a spin coater module adapted to deposit a photoactive layer on the substrate surface.

12. The apparatus of claim 11 , wherein the deprotection module further comprises a hot plate module adapted to bake the photoactive layer.

13. The apparatus of claim 12 , wherein the deprotection module further comprises a chill plate module adapted to cool the photoactive layer.

14. The apparatus of claim 1 , wherein the deprotection module comprises an alignment and exposure module adapted to remove the protecting group.

15. The apparatus of claim 14 , wherein the alignment and exposure module adapted to remove the protecting group with the radiation exposure of about 10-50 mJ/cm 2 .

16. The apparatus of claim 15 , wherein the radiation exposure is an ultraviolet radiation exposure.

17. The apparatus of claim 14 , wherein the alignment and exposure module comprises a stepper platform.

18. The apparatus of claim 17 , wherein the stepper platform is adapted to step and scan with ability to handle one or more reticles.

19. The apparatus of claim 17 , wherein the stepper platform is adapted to perform maskless lithography.

20. The apparatus of claim 14 , wherein the deprotection module further comprises a developer module adapted to strip a photoactive layer on the substrate surface.

21. The apparatus of claim 1 , wherein the track system is enclosed inside an enclosure, air in the enclosure being filtered using a filter that filters ozone.

22. The apparatus of claim 1 , wherein the photoresist comprises 2.5% poly methyl methacrylate, 5% Bis(4-tert-butylphenyl)iodonium triflate, and 5% isopropylthioxanthenone.