Connection structure
A connection structure that includes a region where at least a Cu—Sn intermetallic compound, a M-Sn intermetallic compound and a Cu-M-Sn intermetallic compound (where M is Ni and/or Mn) exist in a cross-section of a connecting part when the cross-section of the connecting part is analyzed with a WDX. Further, the connection structure is configured so that when the cross-section of the connecting part is evenly divided into ten sections in a vertical direction and a lateral direction, respectively, to form 100 segmentalized squares in total, a ratio of the number of squares in which two or more kinds of intermetallic compounds having different constituent elements exist to the number of all the squares, except for squares in which only a Sn-based metal component exists, is 70% or more.
1. A connection structure in which a first connecting object is connected to a second connecting object, the connection structure comprising:
a connecting part interposed between the first connecting object and the second connecting object, the connecting part having at least a Cu—Sn intermetallic compound, a M-Sn intermetallic compound and a Cu-M-Sn intermetallic compound existing in a cross-section of the connecting part when the cross-section of the connecting part is analyzed with a wavelength dispersive X-ray spectrometer; and
Cu-M alloy grains dispersed in the connecting part,
wherein M is at least one of Ni and Mn,
the Cu-M alloy grains are at least one of Cu—Mn alloy grains in which the Mn is 5 to 30% by weight and Cu—Ni alloy grains in which the Ni is 5 to 20% by weight, and
when the cross-section of the connecting part is divided into ten sections in a vertical direction and a lateral direction, respectively, to form 100 segmentalized squares in total, a ratio of a first number of squares in which two or more of the Cu—Sn intermetallic compound, the M-Sn intermetallic compound and the Cu-M-Sn intermetallic compound exist to a second number of all squares, except for squares in which only a Sn-based metal component exists, is 70% or more.
2. The connection structure according to claim 1 , wherein the connecting part contains the Sn-based metal component in an amount of 30% by volume or less.
3. The connection structure according to claim 1 , wherein no squares contain the Sn-based metal component.
4. A connection structure comprising:
a first connecting object;
a second connecting object; and
a connecting part interposed between the first connecting object and the second connecting object, the connecting part having at least a Cu—Sn intermetallic compound, a M-Sn intermetallic compound, a Cu-M-Sn intermetallic compound existing in a cross-section of the connecting part when the cross-section of the connecting part is analyzed with a wavelength dispersive X-ray spectrometer, and Cu-M alloy grains dispersed in the connecting part,
wherein M is at least one of Ni and Mn,
the Cu-M alloy grains are at least one of Cu—Mn alloy, grains in which the Mn is 5 to 30% by weight and Cu—Ni alloy grains in which the Ni is 5 to 20% by weight, and
when the cross-section of the connecting part is divided into ten sections in a vertical direction and a lateral direction, respectively, to form 100 segmentalized squares in total, a ratio of a first number of squares in which two or more of the Cu—Sn intermetallic compound, the M-Sn intermetallic compound and the Cu-M-Sn intermetallic compound exist to a second number of all squares, except for squares in which only a Sn-based metal component exists, is 70% or more.
5. The connection structure according to claim 4 , wherein the connecting part contains the Sn-based metal component in an amount of 30% by volume or less.
6. The connection structure according to claim 4 , wherein no squares contain the Sn-based metal component.
7. The connection structure according to claim 4 , wherein a first surface of the first connecting object and a second surface of the second connecting object contain a Cu-based metal.
8. The connection structure according to claim 7 , wherein the Cu-based metal is at least one of a Cu—Mn alloy and a Cu—Ni alloy.
9. The connection structure according to claim 8 , wherein the Cu-based metal is the Cu—Mn alloy, and a proportion of Mn in the alloy is 10 to 15% by weight.
10. The connection structure according to claim 8 , wherein the Cu-based metal is the Cu—Ni alloy, and a proportion of Ni in the alloy is 10 to 15% by weight.