Susceptor and vapor-phase growth apparatus
View Patent ↗The present invention provides a susceptor which is rotatably provided in a chamber and has a plurality of substrate mounting parts, and a substrate on which a thin film is deposited is rotatably mounted on the substrate mounting part, and the susceptor has a disk-shape wherein there is an opening at an inner periphery of the susceptor, into which a rotating shaft to rotate the susceptor is inserted, and the susceptor has a plurality of notches extending in a radial direction at an outer periphery and/or a periphery of said opening.
1. A susceptor which is rotatably provided in a chamber and has a plurality of substrate mounting parts, and a substrate on which a thin film is deposited is rotatably mounted on the substrate mounting part,
the susceptor has a disk-shape wherein there is an opening at an inner periphery of the susceptor, into which a rotating shaft to rotate the susceptor is inserted, and the susceptor has a plurality of notches extending in a radial direction at an outer periphery and/or a periphery of said opening, and a length of each of the notches is between 1 mm and 20 mm, the plurality of notches including at least a first plurality of notches that are provided at the outer periphery of the susceptor and that are located so as to communicate with corresponding openings for the plurality of substrate mounting parts.
2. The susceptor according to claim 1 , wherein the plurality of notches also includes a second plurality of notches that are provided between the substrate mounting parts.
3. The susceptor according to claim 2 , wherein the second plurality of notches are provided at the outer periphery of the susceptor, and a circular hole is provided in each of the second plurality of notches.
4. The susceptor according to claim 3 , wherein the circular holes have a diameter that is greater than a width of the notches.
5. The susceptor according to claim 3 , wherein the circular hole provided in each of the second plurality of notches is located at a radial inner end of the notch.
6. The susceptor according to claim 1 , wherein the plurality of notches includes a the plurality of notches that are provided at the periphery of said opening.
7. The susceptor according to claim 6 , wherein at least some of the third plurality of notches provided at the periphery of said opening are located so as to communicate said opening and corresponding openings for the plurality of substrate mounting parts.
8. A vapor-phase growth apparatus comprising the susceptor according to claim 1 .
9. A vapor-phase growth apparatus comprising the susceptor according to claim 3 , wherein the vapor-phase growth apparatus further comprises a susceptor cover provided on an upper surface of the susceptor, and a thrust-up mechanism having at least one thrust-up rod provided below the susceptor to be insertable into the circular hole and movable up and down, and the susceptor cover is able to be thrust up by the at least one thrust-up rod.
10. The vapor-phase growth apparatus of claim 9 , wherein the susceptor cover overlies and covers the first plurality of notches provided at the outer periphery of the susceptor.
11. A susceptor which is rotatably provided in a chamber and has a plurality of substrate mounting parts, and a substrate on which a thin film is deposited is rotatably mounted on the substrate mounting part,
the susceptor has a disk-shape wherein there is an opening at an inner periphery of the susceptor, into which a rotating shaft to rotate the susceptor is inserted, and the susceptor has a plurality of notches extending in a radial direction at an outer periphery and/or a periphery of said opening, and a length of each of the notches is between 1 mm and 20 mm, wherein the plurality of notches are provided at the outer periphery of the susceptor, and where a circular hole is provided in each of the plurality of notches, the circular holes having a diameter that is greater than a width of the notches.