IP Library Granted Patent US 9,153,406
Granted Patent B2
US 9,153,406 · App. 14/582,696 · Granted Oct 6, 2015

Supporting structure and ion generator using the same

Inventor: Masateru Sato (Ehime, JP)
Assignee: SEN CORPORATION
H01J27/08H01J27/022
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Quick Facts
Patent No.
US 9,153,406
App. No.
14/582,696
Granted
Oct 6, 2015
Kind
B2
Abstract

An ion generator includes: an arc chamber; a repeller that includes a repeller plate provided within the arc chamber and a repeller extension portion inserted through a through hole communicating the inside and the outside of the arc chamber; and a supporting structure that is provided outside the arc chamber and that supports the repeller so that a gap is ensured between the repeller extension portion and an inner wall of the through hole. The supporting structure includes a cover member that forms, outside the arc chamber, a small chamber communicating with the gap, and an insulation member that electrically insulates the arc chamber and the repeller from each other.

Claims (13)

1. An ion generator, comprising:

an arc chamber;

a repeller that includes a repeller plate provided within the arc chamber and a repeller extension portion inserted through a through hole communicating the inside and the outside of the arc chamber; and

a supporting structure that is provided outside the arc chamber and that supports the repeller so that a gap is ensured between the repeller extension portion and an inner wall of the through hole, the supporting structure including a cover member that forms, outside the arc chamber, a small chamber communicating with the gap, and an insulation member that electrically insulates the arc chamber and the repeller from each other.

2. The ion generator of claim 1 , wherein the small chamber is hermetically closed outside the arc chamber.

3. The ion generator of claim 1 , wherein the insulation member is provided within the small chamber and connects the repeller extension portion and the cover member.

4. The ion generator of claim 3 , wherein the supporting structure further includes a shield member that is provided between the repeller extension portion and the insulation member and provided so as to cover an outer surface of the insulation member.

5. The ion generator of claim 1 , wherein the cover member is attached to the outside of the arc chamber through the insulation member.

6. The ion generator of claim 1 , wherein the repeller extension portion is fixed to the supporting structure by a connection member provided coaxially with the central axis of the through hole.

7. The ion generator of claim 1 , wherein:

the arc chamber has a threaded structure provided on the outside thereof and coaxially with the central axis of the through hole; and

the supporting structure is fixed to the arc chamber by being screwed onto the threaded structure.

8. A supporting structure for supporting a base of a repeller inserted through a through hole communicating the inside and the outside of an arc chamber so that a gap is ensured between the base and an inner wall of the through hole, the supporting structure comprising a cover member that forms, outside the arc chamber, a small chamber communicating with the gap, and an insulation member that electrically insulates the arc chamber and the repeller from each other.

Assignments (2)
CHANGE OF NAME Recorded Jul 15, 2015
From: SEN CORPORATION
To: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
Reel/Frame 036106/0295 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 24, 2014
From: SATO, MASATERU
To: SEN CORPORATION
Reel/Frame 034584/0566 →
Priority Claims (1)
JP 2013-267764 · Dec 25, 2013 · national
Continuity (1)
Related Publication 20150179385A1 · Jun 25, 2015