Thin-film transistor and method of manufacturing same
There is provided a thin-film transistor including at least a substrate, a gate electrode, a gate insulating layer, an oxide semiconductor layer, a source electrode, a drain electrode and a protective layer, wherein the oxide semiconductor layer is an amorphous oxide containing at least one of the elements In, Ga and Zn, the gate electrode-side carrier density of the oxide semiconductor layer is higher than the protective layer-side carrier density thereof, and the film thickness of the oxide semiconductor layer is 30 nm±15 nm.
1. A method of manufacturing a thin-film transistor comprising at least the steps of:
forming a gate electrode on a substrate;
forming a gate insulating layer;
forming an amorphous oxide semiconductor layer containing In, Ga and Zn and having an electron carrier density of 10 14 /cm 3 or more and 10 18 /cm 3 or less while controlling an oxygen partial pressure;
forming a source electrode and a drain electrode; and
forming a protective layer;
wherein the forming of the protective layer is performed by a sputtering method in an oxygen-containing atmosphere in which a mixed gas of O 2 and Ar is used and the O 2 /Ar mixing ratio of the mixed gas is 20% or more and 50% or less so that the gate electrode-side electron carrier density of the oxide semiconductor layer is higher than the protective layer-side electron carrier density thereof.
2. The method of manufacturing a thin-film transistor according to claim 1 , wherein the protective layer contains at least one of SiOxNy, SiO 2 , Al 2 O 3 , Ga 2 O 3 , In 2 O 3 , MgO, CaO, SrO, BaO, ZnO, Nb 2 O 5 , Ta 2 O 5 , TiO 2 , ZrO 2 , HfO 2 , CeO 2 , Li 2 O, Na 2 O, K 2 O, Rb 2 O, Sc 2 O 3 , Y 2 O 3 , La 2 O 3 , Nd 2 O 3 , Sm 2 O 3 , Gd 2 O 3 , Dy 2 O 3 , Er 2 O 3 , and Yb 2 O 3 .