Tungsten growth modulation by controlling surface composition
A method for selectively controlling deposition rate of a catalytic material during a catalytic bulk CVD deposition is disclosed herein. The method can include positioning a substrate in a processing chamber including both surface regions and gap regions, depositing a first nucleation layer comprising tungsten conformally over an exposed surface of the substrate, treating at least a portion of the first nucleation layer with activated nitrogen, wherein the activated nitrogen is deposited preferentially on the surface regions, reacting a first deposition gas comprising tungsten halide and hydrogen-containing gas to deposit a tungsten fill layer preferentially in gap regions of the substrate, reacting a nucleation gas comprising a tungsten halide to form a second nucleation layer, and reacting a second deposition gas comprising tungsten halide and a hydrogen-containing gas to deposit a tungsten field layer.
1. A method of controlling nucleation in a CVD process, comprising:
positioning in a processing chamber a substrate comprising both surface regions and gap regions;
depositing a first nucleation layer comprising tungsten conformally over the surface regions and the gap regions;
treating at least a portion of the first nucleation layer with activated nitrogen, wherein the activated nitrogen is deposited preferentially on the surface regions;
reacting a first deposition gas comprising a first tungsten halide and a first hydrogen-containing gas to deposit a tungsten fill layer over the first nucleation layer, wherein the tungsten fill layer is preferentially deposited in gap regions of the substrate;
reacting a nucleation gas comprising a second tungsten halide to form a second nucleation layer over the tungsten fill layer; and
reacting a second deposition gas comprising a third tungsten halide and a second hydrogen-containing gas to deposit a tungsten field layer over the second nucleation layer.
2. The method of claim 1 , wherein at least one of the tungsten fill layer and the tungsten field layer is deposited at a temperature between 250° C. and 350° C.
3. The method of claim 1 , wherein the activated nitrogen is formed by remote plasma, the activated nitrogen being a component of a quenched plasma.
4. The method of claim 1 , wherein at least one of the first tungsten halide, second tungsten halide or third tungsten halide are selected from the group consisting of tungsten hexafluoride (WF 6 ), tungsten hexachloride (WCl 6 ) and combinations thereof.
5. The method of claim 1 , wherein activated nitrogen comprises a source gas selected from the group consisting of N 2 , NH 3 , H 2 , Ar, He, Ne and combinations thereof.
6. The method of claim 5 , wherein the source gas comprises N 2 and Ar.
7. The method of claim 1 , wherein the substrate is treated with activated nitrogen for a time period of 10 seconds or less.
8. The method of claim 7 , wherein the tungsten field layer is deposited at a temperature greater than 400° C.
9. The method of claim 1 , wherein the substrate is treated with activated nitrogen for a time period of at least 30 seconds.
10. The method of claim 9 , wherein the tungsten field layer is deposited at a temperature less than 400° C.
11. A method of controlling nucleation in a CVD process, comprising:
positioning a substrate in a processing chamber, the substrate having an exposed surface comprising surface regions and gap regions;
reacting a first nucleation gas comprising a first tungsten halide and a reactant gas to deposit a first nucleation layer over the exposed surface;
forming a plasma from a nitrogen-containing gas to create an activated nitrogen;
treating at least a portion of the first nucleation layer with the activated nitrogen, wherein the activated nitrogen is deposited preferentially over the surface regions;
reacting a first deposition gas comprising a second tungsten halide and first hydrogen-containing gas to deposit a tungsten fill layer on at least a portion of the first nucleation layer;
reacting a second nucleation gas comprising a third tungsten halide and the reactant gas to deposit a second nucleation layer over the tungsten fill layer; and
reacting a second deposition gas comprising tungsten hexafluoride and hydrogen gas to deposit a tungsten field layer on the second nucleation layer.
12. The method of claim 11 , wherein at least one of the tungsten fill layer and the tungsten field layer is deposited at a temperature between 250° C. and 350° C.
13. The method of claim 11 , wherein the activated nitrogen is formed by remote plasma, the activated nitrogen being a component of a quenched plasma.
14. The method of claim 11 , wherein the activated nitrogen is delivered to the substrate as a plasma, the substrate being unbiased during the treatment with the activated nitrogen.
15. The method of claim 11 , wherein at least one of the first tungsten halide, second tungsten halide or third tungsten halide selected from the group consisting of tungsten hexafluoride (WF 6 ), tungsten hexachloride (WCl 6 ) and combinations thereof.
16. The method of claim 11 , wherein activated nitrogen comprises a source gas selected from the group consisting of N 2 , NH 3 , H 2 , Ar, He, Ne and combinations thereof.
17. The method of claim 16 , wherein the activated nitrogen is delivered to the substrate as a plasma.
18. The method of claim 11 , wherein the substrate is treated with activated nitrogen for a time period of at least 30 seconds.
19. The method of claim 18 , wherein the tungsten field layer is deposited at a temperature less than 400° C.
20. The method of claim 11 , wherein the chamber is purged using an inert gas after the formation of each nucleation layer.