Plasma equipment and methods of using the same

1. Plasma equipment comprising:

a chamber in which a plasma reaction occurs;

a detector configured to output a spectrum signal in response to light generated from the plasma reaction; and

a plasma monitoring module configured to determine whether the spectrum signal includes an arcing signal or a hunting signal,

wherein the plasma monitoring module comprises a high pass filter configured to output a high frequency signal in response to the spectrum signal,

wherein the plasma monitoring module further comprises a probability analyzer configured to apply an amplitude variation of the high frequency signal to a probability function to determine whether the high frequency signal includes the arcing signal or the hunting signal.

2. The plasma equipment of claim 1 , wherein the high pass filter is configured to remove a low frequency noise signal from the spectrum signal.

3. The plasma equipment of claim 1 , wherein the probability function comprises a Gaussian distribution function.

4. The plasma equipment of claim 3 , wherein the Gaussian distribution function includes an amplitude and a variance of the high frequency signal as variable parameters.

5. The plasma equipment of claim 4 , wherein the probability analyzer is configured to calculate a normalized probability value of the high frequency signal using the Gaussian distribution function and regards a signal having an amplitude over the normalized probability value as the arcing signal or the hunting signal.

6. The plasma equipment of claim 1 , wherein the plasma monitoring module further comprises:

a gain adjustor configured to amplify the spectrum signal; and

an analog-to-digital converter configured to convert the amplified spectrum signal into a digital signal.