Substrate supporting edge ring with coating for improved soak performance
Embodiments of the present invention provide a substrate supporting edge ring for supporting a substrate. In one embodiment, a substrate support ring is provided. The substrate support ring comprises an annular body. The annular body comprises an outer band extending radially inward from an outer annular sidewall; and a substrate supporting region extending inward from an inner portion of the outer band, wherein the annular body comprises a first material that is exposed and at least a portion of the substrate supporting region is covered with a coating comprising a second material that is different than the first material.
1. A substrate support ring, comprising:
an annular body comprising a ceramic material that includes:
an outer band comprising a film extending radially inward from an outer sidewall of the annular body, the film comprising a first silicon layer, an oxide layer, and a second silicon layer disposed on the oxide layer; and
a substrate supporting region extending inward from an inner portion of the outer band.
2. The ring of claim 1 , wherein the first or second silicon layer is selected from the group consisting of amorphous silicon, monocrystalline silicon, and polycrystalline silicon.
3. The ring of claim 1 , wherein the film is provided as discontinuous patches on the outer band.
4. The ring of claim 1 , wherein the film covers the entirety of the outer band.
5. The ring of claim 1 , wherein the ceramic material comprises silicon carbide.
6. The ring of claim 1 , wherein the substrate supporting region has a film layer disposed thereon.
7. The ring of claim 6 , wherein the film layer is selected from the group consisting of a ceramic material, sapphire, and a carbon material.
8. The ring of claim 6 , wherein the film layer is selected from the group consisting of an oxide film, a nitride film, and combinations thereof.
9. The ring of claim 6 , wherein the film layer is selected from the group consisting of aluminum oxide (Al 2 0 3 ), beryllium oxide (BeO), zirconium dioxide (ZrO 2 ), hafnium oxide (HfO 2 ), yttrium oxide (Y 2 O 3 ), thorium oxide (ThO 2 ), scandium oxide (Sc 2 O 3 ), rare earth oxides, zirconium nitride (ZrN), hafnium nitride (HfN), and combinations thereof.
10. A substrate support ring, comprising:
an annular body comprising a ceramic material, the annular body comprising:
a first sidewall;
an outer band extending radially outward from the first sidewall, the outer band comprising a film having a first silicon layer, an oxide layer, and a second silicon layer disposed on the oxide layer, the first or second silicon layer selected from the group consisting of amorphous silicon, monocrystalline silicon, and polycrystalline silicon;
a second sidewall extending from the outer band; and
a substrate supporting region extending radially inward from the first sidewall.
11. The ring of claim 10 , wherein the film is provided as discontinuous patches on the outer band.
12. The ring of claim 10 , wherein the film covers the entirety of the outer band.
13. The ring of claim 10 , wherein the substrate supporting region comprises a refractory film layer disposed on the ceramic material.
14. The ring of claim 13 , wherein the refractory film layer is selected from the group consisting of aluminum oxide (Al 2 0 3 ), beryllium oxide (BeO), zirconium dioxide (ZrO 2 ), yttrium oxide (Y 2 O 3 ), and combinations thereof.
15. A substrate support ring, comprising:
an annular body comprising a first material, the annular body comprising:
a first sidewall;
an outer band extending radially outward from the first sidewall, the outer band comprising a coating made of a second material that is different than the first material;
a second sidewall extending from the outer band; and
a substrate supporting region extending radially inward from the first sidewall and having a surface disposed in a plane that is parallel to a plane of the outer band.
16. The ring of claim 15 , wherein the first material comprises silicon carbide and the second material comprises a first silicon layer, an oxide layer, and a second silicon layer disposed on the oxide layer.
17. The ring of claim 16 , wherein the first or second silicon layer comprises a film selected from the group consisting of amorphous silicon, monocrystalline silicon, and polycrystalline silicon.
18. The ring of claim 15 , wherein the second material is a film selected from the group consisting of alternating layers of silicon, silicon oxide, aluminum oxide, beryllium oxide, zirconium dioxide, hafnium oxide, yttrium oxide, thorium oxide, scandium oxide, rare earth oxides, and combinations thereof.
19. The ring of claim 15 , wherein the second material is continuous across the outer band.
20. The ring of claim 15 , wherein the second material is provided as discontinuous patches on the outer band.
21. A substrate support ring, comprising:
an annular body comprising a first material, the annular body comprising:
a first sidewall;
an outer band extending radially outward from the first sidewall, the outer band comprising a coating made of a second material that is different than the first material;
a second sidewall extending from the outer band; and
a substrate supporting region extending radially inward from the first sidewall, wherein the second material is provided as discontinuous patches on the outer band.