Semiconductor device including oxide semiconductor layer
View Patent ↗The electrical characteristics of a transistor including an oxide semiconductor layer are varied by influence of an insulating film in contact with the oxide semiconductor layer, that is, by an interface state between the oxide semiconductor layer and the insulating film. A first oxide semiconductor layer S 1 , a second oxide semiconductor layer S 2 , and a third oxide semiconductor layer S 3 are sequentially stacked, so that the oxide semiconductor layer through which carriers flow is separated from the gate insulating film containing silicon. The thickness of the first oxide semiconductor layer S 1 is preferably smaller than those of the second oxide semiconductor layer S 2 and the third oxide semiconductor layer S 3 , and is less than or equal to 10 nm, preferably less than or equal to 5 nm.
1. A semiconductor device comprising:
a first insulating layer over an insulating surface;
a first oxide semiconductor layer over the first insulating layer;
a second oxide semiconductor layer over the first oxide semiconductor layer;
a third oxide semiconductor layer over the second oxide semiconductor layer;
a first electrode layer and a second electrode layer over the third oxide semiconductor layer; and
a second insulating layer over the third oxide semiconductor layer,
wherein the first oxide semiconductor layer, the second oxide semiconductor layer and the third oxide semiconductor layer comprise same constituent elements,
wherein a composition of the second oxide semiconductor layer is different from a composition of the first oxide semiconductor layer and a composition of the third oxide semiconductor layer, and
wherein an energy level of a bottom of a conductive band of the first oxide semiconductor layer is continuously changed to an energy level of a bottom of a conductive band of the second oxide semiconductor layer at an interface between the second oxide semiconductor layer and the first oxide semiconductor layer.
2. The semiconductor device according to claim 1 , wherein the energy level of the bottom of the conductive band of the second oxide semiconductor layer is lower than the energy level of the bottom of the conductive band of the first oxide semiconductor layer.
3. The semiconductor device according to claim 1 , wherein the third oxide semiconductor layer is in direct contact with outer side surfaces of the first oxide semiconductor layer.
4. The semiconductor device according to claim 1 , wherein the third oxide semiconductor layer is in direct contact with outer side surfaces of the second oxide semiconductor layer.
5. The semiconductor device according to claim 1 , wherein a thickness of the first oxide semiconductor layer is smaller than a thickness of the second oxide semiconductor layer.
6. The semiconductor device according to claim 1 , wherein a thickness of the first oxide semiconductor layer is smaller than a thickness of the third oxide semiconductor layer.
7. The semiconductor device according to claim 1 , further comprising a gate electrode layer between the insulating surface and the first insulating layer.
8. The semiconductor device according to claim 1 , further comprising a gate electrode layer over the second insulating layer.
9. The semiconductor device according to claim 1 , further comprising:
a first gate electrode layer between the insulating surface and the first insulating layer, and
a second gate electrode layer over the second insulating layer.
10. The semiconductor device according to claim 1 , further comprising a third insulating layer over the second insulating layer,
wherein the third insulating layer is a nitride insulating film, and
wherein the second insulating layer is an oxide insulating film.
11. The semiconductor device according to claim 1 , wherein the energy level of the bottom of the conductive band of the second oxide semiconductor layer is continuously changed to an energy level of a bottom of a conductive band of the third oxide semiconductor layer at an interface between the second oxide semiconductor layer and the third oxide semiconductor layer.
12. The semiconductor device according to claim 11 ,
wherein the energy level of the bottom of the conductive band of the second oxide semiconductor layer is lower than the energy level of the bottom of the conductive band of the first oxide semiconductor layer, and
wherein the energy level of the bottom of the conductive band of the second oxide semiconductor layer is lower than the energy level of the bottom of the conductive band of the third oxide semiconductor layer.
13. A semiconductor device comprising:
a first insulating layer over an insulating surface;
a first oxide semiconductor layer over the first insulating layer;
a second oxide semiconductor layer over the first oxide semiconductor layer;
a third oxide semiconductor layer over the second oxide semiconductor layer;
a first electrode layer and a second electrode layer over the third oxide semiconductor layer; and
a second insulating layer over the third oxide semiconductor layer,
wherein the first oxide semiconductor layer, the second oxide semiconductor layer and the third oxide semiconductor layer comprise same constituent elements,
wherein a composition of the second oxide semiconductor layer is different from a composition of the first oxide semiconductor layer and a composition of the third oxide semiconductor layer,
wherein an energy level of a bottom of a conductive band of the first oxide semiconductor layer is continuously changed to an energy level of a bottom of a conductive band of the second oxide semiconductor layer at an interface between the second oxide semiconductor layer and the first oxide semiconductor layer, and
wherein a thickness of a region of the first insulating layer which overlaps with the first oxide semiconductor layer is larger than a thickness of a region of the first insulating layer which does not overlap with the first oxide semiconductor layer.
14. The semiconductor device according to claim 13 , wherein the energy level of the bottom of the conductive band of the second oxide semiconductor layer is lower than the energy level of the bottom of the conductive band of the first oxide semiconductor layer.
15. The semiconductor device according to claim 13 , wherein the third oxide semiconductor layer is in direct contact with outer side surfaces of the first oxide semiconductor layer.
16. The semiconductor device according to claim 13 wherein the third oxide semiconductor layer is in direct contact with outer side surfaces of the second oxide semiconductor layer.
17. The semiconductor device according to claim 13 , wherein a thickness of the first oxide semiconductor layer is smaller than a thickness of the second oxide semiconductor layer.
18. The semiconductor device according to claim 13 , wherein a thickness of the first oxide semiconductor layer is smaller than a thickness of the third oxide semiconductor layer.
19. The semiconductor device according to claim 13 , further comprising a gate electrode layer between the insulating surface and the first insulating layer.
20. The semiconductor device according to claim 13 , further comprising a gate electrode layer over the second insulating layer.
21. The semiconductor device according to claim 13 , further comprising:
a first gate electrode layer between the insulating surface and the first insulating layer, and
a second gate electrode layer over the second insulating layer.
22. The semiconductor device according to claim 13 , further comprising a third insulating layer over the second insulating layer,
wherein the third insulating layer is a nitride insulating film, and
wherein the second insulating layer is an oxide insulating film.
23. The semiconductor device according to claim 13 , wherein the energy level of the bottom of the conductive band of the second oxide semiconductor layer is continuously changed to an energy level of a bottom of a conductive band of the third oxide semiconductor layer at an interface between the second oxide semiconductor layer and the third oxide semiconductor layer.
24. The semiconductor device according to claim 23 ,
wherein the energy level of the bottom of the conductive band of the second oxide semiconductor layer is lower than the energy level of the bottom of the conductive band of the first oxide semiconductor layer, and
wherein the energy level of the bottom of the conductive band of the second oxide semiconductor layer is lower than the energy level of the bottom of the conductive band of the third oxide semiconductor layer.