Mask frame assembly for thin film deposition
A mask frame assembly for depositing a deposition material on a deposition substrate comprises a mask frame including an opening and frames surrounding the opening, and a mask coupled on the mask frame. A deformation prevention unit is formed on at least one region of the mask. Since the deformation prevention unit is formed on a peripheral portion of a deposition pattern in the mask, deformation of the mask in a vertical direction may be reduced. Accordingly, defective attaching of the mask to the substrate may be reduced.
1. A mask frame assembly for a thin film deposition, the mask frame assembly comprising:
a mask frame including an opening and frames surrounding the opening; and
a mask coupled to the mask frame, the mask comprising:
a plurality of deposition patterns which are separated from each other; and
a rib disposed between immediately adjacent deposition patterns and connecting the deposition patterns to each other, the rib comprising a first half-etched portion that is recessed from a surface of the rib and does not penetrate through the mask, the first half-etched portion of the rib having a rectangular shape and being enclosed by four sidewalls and a bottom wall of the rib, a thickness of the first half-etched portion being less than a thickness of another portion of the mask.
2. The mask frame assembly of claim 1 , wherein the first half-etched portion extends toward edges of the mask.
3. The mask frame assembly of claim 2 , wherein the first half-etched portion is formed by etching a second surface of the mask so as to have a thickness less than other portions of the mask, a first surface of the mask facing a deposition substrate and the second surface being an opposite the first surface.
4. The mask frame assembly of claim 1 , wherein the mask further comprises second half-etched portions disposed on opposite edges of the deposition patterns in a width direction of the deposition pattern.
5. The mask frame assembly of claim 4 , wherein the first half-etching portion and the second half-etched portions are formed by etching a second surface of the mask so as to have a thickness less than other portions of the mask, a first surface of the mask facing a deposition substrate and the second surface being opposite the first surface.
6. The mask frame assembly of claim 5 , wherein the first surface is a surface contacting the deposition substrate which is to be patterned.
7. The mask frame assembly of claim 1 , wherein opposite end portions of the mask are welded to frames which are arranged to face each other in a state where a tensile force is applied to the frames.
8. The mask frame assembly of claim 1 , wherein the mask frame comprises:
a plurality of first frames arranged so as to face each other in a first direction; and
a plurality of second frames arranged so as to face each other in a second direction;
wherein the plurality of first frames and the plurality of second frames are connected to each other so as to surround the opening of the mask frame.
9. The mask frame assembly of claim 8 , wherein the mask is disposed in parallel with the plurality of first frames, and is arranged successively relative to the plurality of second frames.
10. The mask frame assembly of claim 1 , wherein the mask comprises at least one partition mask disposed in a direction so as to cross the opening of the mask frame.